The present invention relates to the structure of a sensor. More particularly, the invention relates to the structure of a MEMS sensor that puts MEMS technology to practical use.
MEMS (Micro Electro Mechanical Systems) technology that permits formation of mechanical structures on the semiconductor substrate is applied to diverse kinds of sensors and light application apparatuses.
Sensors created by application of MEMS technology (i.e., MEMS sensors) are manufactured using semiconductor processes. As such, MEMS sensors are often small in size and provide output signals of infinitesimally low output levels. Thus the MEMS sensor is generally equipped with a signal processing LSI at its subsequent stage.
Meanwhile, between the manufacturing process of MEMS sensors and that of semiconductors, there are few aspects of compatibility including deep RIE etching. Also different between them are the ways sacrifice layers are treated. Furthermore, juxtaposing a MEMS sensor chip and processing circuits can pose problems of taking up space. For this reason, the MEMS sensor chip and a signal processing LSI are often prepared as separate chips.
In such cases, the signal processing LSI is often overlaid on the MEMS sensor chip, as described in Patent Document 1 cited below.
Patent Document 1: JP-2009-53100-A
When overlaid one on the other as described in Patent Document 1, the MEMS sensor chip and the signal processing LSI chip are bonded together using such adhesive members as an adhesive agent or an adhesive sheet. Generally, the MEMS chip generates little heat; heat generation comes mostly from the signal processing LSI chip. The heat is therefore propagated to the MEMS chip via the adhesive member.
Also, if the MEMS chip and the signal processing LSI chip are bonded together in a manner randomly positioned to each other, the MEMS chip can develop a temperature gradient depending on where the heat generating part of the signal processing LSI is located. The temperature gradient on the MEMS chip translates into a temperature gradient in the sensing element, possibly resulting in thermally caused deterioration in performance.
Furthermore, the temperature gradient, if occurring in the MEMS sensor element, can make it difficult for a temperature sensor part in the sensor on the signal processing LSI to carry out temperature characteristic correction on the sensor itself.
An object of the present invention is to provide a MEMS sensor that reduces the effects caused by thermally triggered changes in temperature characteristics.
In achieving the above object, the present invention provides a MEMS sensor including a signal processing LSI equipped with a temperature sensor for measuring temperature of a sensor, and a MEMS sensor chip overlaid on the signal processing LSI, the MEMS sensor chip being mounted on a heat generating part of the signal processing LSI.
This patent application incorporates the content of the description and/or the drawings of Japanese Patent Application No. 2011-215901 to which this patent application claims priority.
The present invention provides a MEMS sensor that reduces the effects caused by thermally triggered changes in temperature characteristics.
The location from which heat is mostly generated when the signal processing LSI performs its signal processing operations can be known beforehand using simulation technology or the like. Given that knowledge, the present invention proposes positioning the MEMS sensor chip immediately over the heat generating part of the signal processing LSI and adjusting the positional relationship therebetween in such a manner that the temperature gradient of the MEMS sensor element as a whole is minimized and sensor performance is improved accordingly.
An embodiment of the present invention (first embodiment) is explained below using
In
If the MEMS sensor chip 2 is positioned anywhere over the signal processing LSI 1 as shown in
Also, the heat generating part 10 of the signal processing LSI 1 and the temperature measuring part 3 are positioned relative to each other as indicated in
Given the above-described structure, it is possible to reduce the temperature gradient on the MEMS sensor chip 2 and correct transient temperature characteristics so that the effects caused by thermally triggered changes in temperature characteristics may be decreased.
Another embodiment of the present invention (second embodiment) is explained next using
It is assumed that the heat generating part 10 and another heat generating part 11 are located over the signal processing LSI 1 as depicted in
Also, the heat generating part 10 and the other heat generating part 11 in
When the temperature gradient in the sensor element on the MEMS sensor chip is reduced in this manner, the effects caused by thermally triggered changes in temperature characteristics can be decreased.
A further embodiment of the present invention (third embodiment) is explained next using
This embodiment is explained using the case where the heat generating part 10 of the signal processing LSI 1 is smaller in size than the MEMS sensor chip 2.
A small-sized heat generating part 10 of the signal processing LSI 1 constitutes a small area for heat generation, often producing a temperature gradient in the sensor element on the MEMS sensor chip 2 through heat transmission. Thus the heat generating part 10 is divided as shown in
Even where the heat generating part 10 of the signal processing LSI 1 is smaller than the MEMS sensor chip 2, the above-described structure helps reduce the temperature gradient in the sensor element on the MEMS sensor chip and decrease the effects caused by thermally triggered changes in temperature characteristics.
An even further embodiment of the present invention (fourth embodiment) is explained next using
This embodiment is explained using the case where the heat generating part 10 of the signal processing LSI 1 differs considerably in shape from the MEMS sensor chip 2.
Suppose that the heat generating part 10 of the signal processing LSI 1 is shaped as depicted in
Even where the heat generating part 10 of the signal processing LSI 1 differs greatly in shape from the MEMS sensor chip 2, the above-described structure helps reduce the temperature gradient in the sensor element on the MEMS sensor chip and decrease the effects caused by thermally triggered changes in temperature characteristics.
A still further embodiment of the present invention (fifth embodiment) is explained next using
With this embodiment, it is assumed that the heat generating part 10 and the temperature measuring part 3 are laid out over the signal processing LSI 1 as shown in
In that case, the components are arranged so that the center 101 of the heat generating part 10 will coincide with the center 201 of the MEMS sensor element 20 as illustrated in
Meanwhile, the temperature detecting part 3 on the signal processing LSI 1 measures the temperature of the heat transmitted from the heat generating part 10 over the signal processing LSI 1. If the temperature of the sensor part of the MEMS sensor element 20 is assumed to take on a characteristic 50 over time, the semiconductor process layout is arranged in terms of thermal resistance and thermal capacity so that the temperature detected by the temperature detecting part 3 will take on a characteristic 51. Alternatively, the semiconductor process layout is arranged so that a characteristic 52 will appear in proportion to the characteristic 50.
The above-described structure helps decrease the effects caused by thermally triggered changes in temperature characteristics.
A yet further embodiment of the present invention (sixth embodiment) is explained next using
With this embodiment, it is assumed that the heat generating part 10 and the temperature measuring part 3 are laid out over the signal processing LSI 1 as shown in FIG. 9A. The calorific values from the heat generating part 10 are integrated per unit time. Reference numeral 101 denotes the center of the heat generating part calculated from the integrated values and from the area of the heat generating part. Meanwhile,
In that case, the components are arranged so that the center 101 of the heat generating part 10 will coincide with the center 201 calculated from the MEMS sensor elements 21, 22 and 23 as illustrated in
Meanwhile, the temperature detecting part 3 on the signal processing LSI 1 measures the temperature of the heat transmitted from the heat generating part 10 over the signal processing LSI 1. If the temperature of the sensor parts of the MEMS sensor elements 21, 22 and 23 is assumed to take on the characteristic 50 over time, the semiconductor process layout is arranged in terms of thermal resistance and thermal capacity so that the temperature detected by the temperature detecting part 3 will take on the characteristic 51. Alternatively, the semiconductor process layout is arranged so that the characteristic 52 will appear in proportion to the characteristic 50.
Although typical MEMS sensors practiced as the above embodiments of the present invention are sensors that detect such externally applied signals as those of acceleration and angular velocity, these sensors are not limitative of this invention. The present invention may also be applied to other sensors such as a MEMS sensor integrating an acceleration sensor with an angular velocity sensor, a MEMS sensor integrating a biaxial acceleration sensor with an angular velocity sensor, and a MEMS sensor integrating a triaxial acceleration sensor with an angular velocity sensor.
This patent application incorporates all above-cited publications, patents, and patent applications by reference.
Number | Date | Country | Kind |
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2011-215901 | Sep 2011 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2012/070420 | 8/10/2012 | WO | 00 | 2/20/2014 |