This application generally relates to optical measurement methods, and more particularly relates to measuring methods and apparatuses utilizing ellipsometric techniques on semiconductor devices and wafer surfaces and other materials.
The ellipsometric technique is a powerful multi-functional light division technology, used to obtain characteristics information about target surfaces by detecting electromagnetic waves. The characteristics information may include reflectivity, thickness, refractive index, extinction parameters, polarization, surface microstructure, particles, defects, and roughness of the target surface or the thin film surface, and so on. Because the ellipsometric technique is a highly sensitive, non-destructive, and no-contact measurement technique, it is widely used in a variety of fields from basic research to industrial applications, including semiconductor physics, microelectronics, and various areas of biology.
Existing ellipsometric measurement technology works as follows: A light source emits light which passes through a first polarizing plate (often called the polarizer) to generate a polarized light. Then the polarized light illuminates a target surface. The polarized light changes its polarization state after interacting with the target surface. The light then passes through a second polarizer (often called the analyzer), and then enters a detecting device. The ellipsometric technology analyzes light intensity, phase, and polarization states of the light reflected by the target samples, and accordingly obtains the characteristics information that is detected by the electromagnetic waves as they interact with the target surface. This technique works even if the thickness of the target is shorter than the wavelength of the detecting light, e.g., a thickness that is equal or even less than a single atomic layer.
In general, ellipsometry is a technique based on light mirror reflection, in which the incident angle is equal to the reflection azimuthal angle, and the incident light path and the reflected light path are in the same plane (called the incident plane). In the text to follow, the components of the electric field of the polarized light that are parallel with and perpendicular to this incident plane are respectively defined as “p” and “s” components of the polarized light. The polarization state of the polarized light upon interaction with the target surface can change due to various mechanisms, including reflection, transmission, diffraction, and so on. In this application, without loss of generality, the main conditions for reflection are introduced. Because in existing ellipsometry techniques, each measurement can only obtain one set of experimental data, these techniques generally use a rotating ellipsometry method. According to this method, a first motor rotates the polarizer to change the polarizer's azimuthal angle. Similarly, a second motor rotates the second polarizer (the analyzer) to change the analyzer azimuthal angle. Based on all the polarizer azimuthal angles, a set of data can be obtained, and accordingly the characteristics of the target surface can be determined. Therefore, since the existing techniques require a set of data, these techniques suffer some shortcomings, such as long data measuring time, method complexity, and expensive hardware.
Various embodiments address problems, such as long time data measuring, complex measuring method and expensive measuring hardware caused by rotating the polarizer. In various embodiments, the ellipsometric technique polarizes the light from the light source in a certain azimuthal angle, and then the polarized light is directed onto the target surface. After being reflected by the target surface, the light characteristics could be interpreted based on some relationship information. Finally, based on the obtained light intensity of the reflected light, the characteristics information of the target surface could be determined. In the traditional systems, when conducting the measurement, there always exist deviations in the polarized azimuthal angle, the incident angle, and the analyzed azimuthal angle. To avoid such deviation, various embodiments provide a reference surface for calibration before the measurement for the target surface's characteristics begins.
In the following detailed description, the character, target, and advantages will be shown better. In the drawings, same or similar drawings stand for same or similar steps or units or devices.
a shows variations of the Fourier coefficients as a function of the thickness of the target in accordance with an embodiment.
b shows variations of the Fourier coefficients as a function of the thickness of the target in accordance with an embodiment.
a shows the variations in ellipsometry parameters as a function of the thickness of the target in accordance with an embodiment.
b shows the variations in ellipsometry parameters as a function of the thickness of the target in accordance with an embodiment.
Based on
In
Consistent with an embodiment, light source 101 may be a He—Ne laser for which the output wavelength is 632.8 nm. However, light source 101 can use other types of light sources as known by persons of ordinary skill in the art, for example, high-power red LED light sources.
In
In step S11, polarizer 103 polarizes a single wavelength light at a fixed polarizer azimuthal angle P to generate a single wavelength polarized light.
Then, the polarized light goes through second condenser hole 104. Second condenser hole 104 only allows one polarized light passed through polarizer 103, and blocks the rest of polarized lights in order to avoid their impact on the measurement.
In step S12, the polarized light is incident at the incident angle θ onto target surface 105. As known by persons of ordinary skill in the art, without second condenser hole 104, the light path of the polarized light passed through polarizer 103 may be quite different from the light path of the polarized light passed through second condenser hole 104 as shown in
The illuminated polarized light is reflected by target surface 105 and reaches analyzer 107. After the reflection, the nature of the polarized light changes due to the target surface 105, and acquires the characteristic information of the target surface. In the step S13, analyzer 107 analyzes the characteristics light reflected by the target surface 105 in the fixed analyzer azimuthal angle A. Analyzer 107 separates the p component and the s component of the characteristic light and provides them to the detection-processing device 108.
In step S14, detection-processing device 108 receives and detects the light intensity of the p component and the s component of the characteristics light, obtains light intensity information corresponding to the target surface 105, and obtains the phase difference between the p component and the s component. Detection-processing device 108 provides the obtained light intensity information to calculation device 109, which has an electromagnetic connection with the detection-processing device 108 and is not shown in
Finally, in step S15, calculating device 109 determines the thickness of the target surface 105 based on the light intensity of the p and s components of the characteristic light. As can be understood by persons of ordinary skill in the art, there are several ways to determine the thickness information, not limited by ways shown in this embodiment. Consistent with an embodiment, the principles of the determination are as follows.
The basic formula for the intensity of the output light after passing through polarizer 103 and analyzer 107 is,
In equation (1), P=π/4, A=0, π/2, tan Ψ is the amplitude ratio of the p and s components of the light, and Δ is the phase difference between the p and s components of the characteristics light. Light intensities Iout(π/4,0) and Iout(π/4,π/2) can be used to calculate the Fourier coefficient
and to further calculate the ellipsometry parameters tan Ψ, that is:
Moreover,
is the first-order Fourier coefficient of the output light intensity.
In various embodiments, variation of the Fourier coefficients as a function of the thickness of the target can be determined in advance.
b shows the variations in the Fourier coefficients when the wavelength of the output light is 632.8 nm, the incident angle of the polarized light is 75.55 degrees, and when the thickness of the surface varies in the range of 0 to 50 nm.
a shows the variations in the ellipsometry parameters tan Ψ and Cos(Δ) as a function of the thickness of the target. In
b shows the variations of the ellipsometry parameters tan Ψ and Cos(Δ) as a function of the thickness of the target, when the wavelength of the output light is 632.8 nm, the incident angle of the polarized light is 75.55 degrees, and when the thickness of the surface varies in the range of 0 to 50 nm.
During the measurement process, the Fourier coefficient can be calculated based on equation (2). When all the azimuthal angles, including the polarized azimuthal angle, analyzer azimuthal angle, and the incident angle between the polarized light and the target surface are determined, and when the wavelength of the laser and also the refractive index of the target surface are known, all the Fourier coefficients α,β are thus known. Thus a control method can be used to find the specific Fourier coefficient within the range of values from the known Fourier coefficients that is most similar to the measured Fourier coefficients. Accordingly, the thickness of the target surface can be deduced to be equal to the thickness corresponding to the specific Fourier coefficient.
In theory, the Fourier coefficients α,β are functions of the thickness, the polarized light incident angle θ, the wavelength, light constants of the material of the target surface, the polarizer azimuthal angle and the analyzer azimuthal angle. In particular, the thickness, the polarized light incident angle θ, the wavelength, and light constants of the material of the target surface affect the ellipsometry parameters and the ellipsometry parameters in turn affect the Fourier coefficients. When using a fixed wavelength light source, and because the light constants of the material are fixed, their effects on the measurement can be ignored. Thus, the thickness of the target surface is the only factor that determines the Fourier coefficients α,β. Based on this principle, in a single range, Fourier coefficients vary with the thickness and each Fourier coefficient is a monotonic function of the thickness. Thus, according to the relationship between the Fourier coefficients and the thickness, the thickness can be calculated.
This exemplary embodiment describes the relationship between the Fourier coefficients and the ellipsometry parameters and the thickness when the light source 101 outputs light with the wavelength 632.8 nm, and the incident angle of the polarized light is 75.55 degrees. As is widely understood by the persons of ordinary skill in the art, when the light wavelength and the incident angle are different, the relationship will change between the Fourier coefficients α,β on the one hand, and the ellipsometry parameters and the thickness on the other hand, but the principles of this disclosure will still be applicable.
Because, in addition to being related to the thickness of the target surface, each Fourier coefficient has a one-to-one relationship with the reflectivity, refractive index, extinction coefficient, polarization, surface microstructure, particles, defects and other surface roughness features as well, the methods of this disclosure are not limited to finding the thickness of the target surface, and other characteristics of the surface can also be measured. Persons of ordinary skill in the art can understand that methods and systems of this disclosure can also used to measure other kinds of target surfaces and their characteristic information. Thus, for the sake of brevity, methods are not described for other situations.
The above-described embodiments show the measurement method when the fixed polarized azimuthal angle P and the fixed analyzer azimuthal angle A are all in the ideal state, that is P=π/4, A=0,π/2, and when θ=75.55 degrees. In the process of real measurement, due to the deviation in the measuring device and the light path, this condition is difficult achieve. Thus, when there is a deviation in polarized azimuthal angle, incident angle, or the fixed analyzer azimuthal angle, a calibration action must be taken on the deviation azimuthal angle, to determine the actual fixed polarized azimuthal angle, the incident angle, and the fixed analyzer azimuthal angle and, based on those actual values, to obtain the real thickness of the target surface.
To perform calibration, the method 500 of measuring the thickness of the target surface, shown in
The calibration process for the polarized azimuthal angle, the analyzer azimuthal angle, and the incident angle shown is shown in
The calibration process works as follows. Supposing there is an azimuthal angle deviation between the polarizer and the analyzer, these angles are denoted as P+δP, A+δA, where δP represents the deviation between the actual azimuthal angle and the current theoretical value (e.g., π/4), and where δA represents the deviation between the actual analyzer azimuthal angle A and the current theoretical value (e.g., 0 and π/2). In this case, the output light intensity after passing through polarizer 103 and analyzer 107 is determined by the following equation:
in which,
represents the theoretical Fourier coefficients, and Δ is the phase difference between the p and s components of the characteristic light.
The theoretical value of the polarized azimuthal angle is P=π/4, its deviation is δP, the theoretical value of the analyzer azimuthal angle is A=0,π/2, and its deviation is δA. Therefore, the two light intensities are,
I1=I(0)=I01(1+α′ cos 2λA+β′ sin 2δA)
I2=I(π/2)=I01(1−α′ cos 2δA−β′ sin 2δA) (4)
Based on equation (4), the light intensity can be calculated as: I01=(I1+I2)/2
After normalization, the intensities are determined as:
I1′=1+α′ cos 2δA+β′ sin 2δA
I2′=1−α′ cos 2δA−β′ sin 2 δA (5)
Thus, the objective function is
where, {right arrow over (t)} is the thickness of the surface, θ is the incident angle, δP is the deviation of the polarizer azimuthal angle of the polarizer 103, δA is the deviation of the analyzer azimuthal angle of the analyzer 107, {right arrow over (n)} is the refractive index of the reference surface, {right arrow over (k)} is the extinction coefficient for the reference surface, and λ is the wavelength. In equation (6), I′ij is the normalized obtained light intensity and Iijtheory is the theoretically calculated light intensity. Further, in the sums of equation (6), the index i runs over the p and s components, and the index j runs over various the reference surfaces uses for calibration.
Considering the calibration equation (6), supposing that m reference surfaces with different known thicknesses are used for calibration, and that the wavelength of the used light is constant, then {right arrow over (n)},{right arrow over (k)} will also be constant. Thus X has 2m variables. After removing the linear dependencies among related variables, there remains m variables that could be used. There are 3 unknown variables including the variation in the polarized azimuthal angle δP, the incident angle θ and the analyzer azimuthal angle δA. Using the basic calculating method, all the unknown parameters could be found only when m>3.
If one or more of the variables: polarizer 103, azimuthal angle P+δP, incident angle θ, and the analyzer azimuthal angle A+δA are known, then in the calibration step, remaining variables will be calibrated. Since the number of unknown parameters is high, then the required number of nonlinear equations and then the corresponding measurements on the reference surface time is reduced.
The above description and the related theory explained the principle of the calibration method provided by this disclosure. The following description addresses the steps in the calibration process, with reference to
In equation (6), the variables include the thickness of the reference surface {right arrow over (t)}, the deviation of the fixed polarizer azimuthal angle δP, the incident angle θ, the fixed polarizer azimuthal angle deviation δA, the refractive index {right arrow over (n)} of the reference surface 105′, the light extinction coefficient {right arrow over (k)} of the reference surface 105′, and the wavelength λ. Using numerical approximation methods, assuming the light intensity of the detected p and s components and the square of the sum of their corresponding theoretical light intensity deviation to be determined, equation (6) provides a nonlinear equation for finding the thickness of the reference surface 105′.
Still referring to
When it is possible to determine all the unknown parameters according to one or more nonlinear equations corresponding to one or more reference surfaces, the method shown in
The calculating method could be the non-linear optimization method L-M, or could be any other method that could analyze the non-linear equations. The detailed calculation method depends on the available method. In some embodiments, the calculation process is performed by the calibration device 110. In some embodiments, the calibration device 110 could be a micro-processor that runs a program to perform the calibration process. Alternatively, in some other embodiments, the calibration device could be a corresponding firmware, ASIC, or DSP devices.
Independent of the above-described steps S201 to S205, and similar to steps S11 to S14 of
After determining the fixed polarized azimuthal angle P+δP, the incident angle θ, and the fixed analyzer azimuthal angle A+δA, the known light parameters of the reference surface 105′, that is, {right arrow over (n)} and {right arrow over (k)}, and the detected azimuthal angle parameters, are inserted into equation (6) and, using the L-M method, the thickness is determined. Other nonlinear functions could also be used to determine the thickness, and the specific method does not change the focus of this disclosure. The calculating process could be completed by the calculating device 109. In various embodiments, calculating device 109 can be a microprocessing device performing the process for conducting the calibration process, or a firmware, ASIC, or DSP devices.
In the second embodiment, one or more dividers are installed between the surface and the analyzer along the light path. The one or more dividers divide the characteristics light reflected off the surface. The divided lights are polarized at a fixed azimuthal angle and their light intensities are detected. According to the light intensity of the p and s components of all the divided lights, the characteristic information of the target surface is determined.
In the embodiment shown in
First, at the start of the method, light source 601 emits light, the emitted light goes through first condenser hole 602, is focused hole 602, and then illuminates polarizer 603. In step S31, polarizer 603 polarizes a single wavelength light at a fixed polarizer azimuthal angle P to generate a polarized light. Then, the polarized light goes through second condenser hole 604. Second condenser hole 604 only allows one polarized light passed through polarizer 603, and blocks the rest of polarized lights in order to avoid their impact on the measurement. Thus, in step S32, the polarized light is incident at the incident angle θ onto target surface 605. As known by persons of ordinary skill in the art, without condenser hole 604, the light path of the polarized light pass through polarizer 603 may be quite different from the light path of the polarized light passed through second condenser as shown in
The illuminated polarized light is reflected by target surface 605 as a result of which the nature of this polarized light changes. In step S33, light divider 606 divides the characteristics light, which is reflected by the target surface, to generate the corresponding characteristic lights L1 and L2, and then divided light L1 and L2 reach two analyzers 607a and 607b.
In step S34, first analyzer 607a analyzes characteristics light L1 at the fixed analyzer azimuthal angle, separates the p1 and s1 components, which are the p and s component of the L1, and then provides p1 and s1 to second detection-processing device 608a. Second analyzer 607b analyzes characteristics light L2 at the fixed analyzer azimuthal angle, separates the p2 and s2 components, which are the p and s components of light L2, and then provides p2 and s2 to second detection-processing device 608b.
In step S35, first and second detection-processing devices 608a and 608b receive and detect the light intensity of the p1 and s1, and p2 and s2 components, obtain the light intensity information corresponding to the target surface, and obtain the phase difference between the p1 and s1 components, and the phase difference between the p2 and s2 components. First and second detection processing devices 608a and 608b then provide the obtained light intensity information to calculation device 609, which has electromagnetic connections with first and second detection-processing devices 608a and 608b, and is not shown in
Finally, in step S36, calculating device 609, using the light intensity of the p1 and s1 components and the p2 and s2 components, determines the thickness of the target surface using a predetermined method. It can be understood by persons of ordinary skill in the art that there are several ways to determine the thickness information, and the method is not limited to those detailed in this embodiment. Consistent with an embodiment, the principles of this determination method are as follows.
The basic equation for the intensity of the output light after passing through the polarizer and the analyzer is
For the light passing through the analyzer 607a, P=π/4, A=A1=0,π/2, tan Ψ is the amplitude ratio of the p and s components of the light, and A is the phase difference between the p and s components. Light intensities I(π/4,0)out and I(π/4, π/2)out can be used to calculate the Fourier coefficient
and to further calculate the ellipsometric parameters tan Ψ, that is:
For the light passing through analyzer 607b, P=π/4, A=A2=±π/4, which, from equation (7), results in light intensities I(π/4,π/4)out I(π/4,−π/4)out. Moreover,
stands for the first-order Fourier coefficient. Therefore,
Consistent with an embodiment, the Fourier coefficient can be calculated in advance. The variations of the Fourier coefficients α,β for different thicknesses are similar to those discussed for the first embodiment. When the incident angle θ is 75.55 degrees, the helium-neon laser outputs the incident light of 632.8 nm wavelength, the variations of the Fourier coefficients and of the ellipsometry parameters are similar to those shown in
The above-described embodiments show the measurement method when the fixed polarized azimuthal angle P and the fixed analyzer azimuthal angles A1 and A2 are all in the ideal state, that is P=π/4,A1=0,π/2,A2=±π/4, and when θ=75.55 degrees. In the process of real measurement, due to the deviation in the measuring device and the light path, this condition is difficult to achieve. Thus, when there is a deviation in polarized azimuthal angle P, incident angle θ, or the fixed analyzer azimuthal angles A1 and A2, a calibration action must be taken to determine the deviation in the fixed polarized azimuthal angle P and the incident angle θ, and based on the determined fixed polarized azimuthal angle P and the incident angle θ, to obtain the thickness of the target surface.
To perform calibration, a method of measuring the thickness of the target surface, shown in
Below is described the method of calibration for the polarized azimuthal angle, the analyzer azimuthal angle, and the incident angle. Based on the obtained azimuthal angles and on the obtained light intensities of the p and s components, the thickness is measured.
In
Before the calibration, first target surface 605 in
in which
represents the theoretical Fourier coefficients, and Δ is the phase deviation between the p and s component for the characteristic light.
The theoretical value of the polarized azimuthal angle is P=π/4, its deviation is δP, the theoretical value of the analyzer 607a azimuthal angle A1 is 00/90°, its deviation is δA1, the theoretical value of the analyzer 607b azimuthal angle A2 is 45°/−45°, and its deviation is δA1. Therefore, the 4 light intensities are
I1=I(0)=I01(1+α′ cos 2δA1+β′ sin 2δA1)
I2=I(π/2)=I01(1−α′ cos 2δA1−β′ sin 2δA1)
I3=I(π/4)=I02(1−α′ sin 2δA2+β′ cos 2δA2)
I4=I(−π/4)=I02(1+α′ sin 2δA2−β′ cos 2δA2)
After the normalization, the light intensities are determined as:
Thus the objective function is,
in which {right arrow over (t)} is the thickness of the surface, θ is the incident angle, δP is the deviation of the polarizer azimuthal angle of polarizer 3, δA1 is the deviation of the analyzer azimuthal angle for first analyzer 607a, δA2 is the deviation of the analyzer azimuthal angle for second analyzer 607b, {right arrow over (n)} is the refractive index of the reference surface, {right arrow over (k)} is the extinction coefficient for the reference surface, and λ is the wavelength. In equation (13), I′ij is the normalized obtained light intensity and Iijtheory is the theoretically calculated light intensity. Further, in the sums in equation (13), the index i runs over the p1 and s1, p2, and s2 components, and the index j runs over various reference surfaces used for calibration.
Considering calibration equation (6), supposing that m reference surfaces with different known thicknesses are used for calibration, and that the wavelength of the used light is constant, then {right arrow over (n)}, {right arrow over (k)} will also be constant. Thus, X has 4m variables. After removing the linear dependencies among related variables, there remains 2m variables that could be used. There are m+4 unknown variables including the variations δP, δA1, δA2, the incident angle θ, and m unknown thicknesses of the reference target surfaces. Using the basic calculating method, all the unknown parameters could be found only when 2m>m+4, that is m>4.
If one or more of polarizer 603 azimuthal angle P+δP, incident angle θ, and analyzer azimuthal angles A1+δA1 and A2+δA2 of the first and second analyzers 607a and 607b are known, then in the calibration step, the remaining variables can be calibrated. Since the number of unknown parameters is not high, then the required number of nonlinear equations and then the corresponding measurements on the reference surface time is reduced.
Above, the calibration and its supporting theory were described in accordance with the embodiments. The following detailed description describes the steps in the calibration process, in reference to
In step S401, polarizer 603 polarizes the light at the fixed polarized azimuthal angle P+δP to generate the polarized light. In step S402, the polarized light illuminates the known reference surface 605′ at the incident angle θ and is reflected off the surface as characteristic light. In step S404, light divider 606 divides the characteristics light to generate divided characteristic lights L1 and L2.
In step S404, analyzers 607a and 607b analyze characteristic lights L1 and L2 at fixed analyzed azimuthal angles A1+δA1 and A2+δA2, respectively, and analyze the p1 and s1, and p2 and s2, components of characteristic light L1 and L2.
In step S405, first and second detection-processing devices 608a and 608b detect the light intensity of the p1 and s1, and p2 and s2, components to obtain the light intensity information corresponding to reference surface 605′.
In equation (13), the variables include the thickness of the reference surface 605′, the fixed polarizer azimuthal angle P+δP, the incident angle θ, the fixed analyzer azimuthal angle A1+δA1 and A2+δA2, the refractive index {right arrow over (n)} of the reference surface 605′, the light extinction coefficient {right arrow over (k)} of the reference surface 605′, and the wavelength λ. Using numerical approximation methods, assuming the light intensity of the detected p and s components and the square of the sum of the corresponding theoretical light intensity deviation to be determined, equation (13) provides a nonlinear equation for finding the thickness of the reference surface 605′.
In step S406, based on the relationship between the foresaid function number and the unknown parameters number, and based on the nonlinear equations corresponding to the reference surface 605′, it is decided whether it is possible to determine all the unknown parameters, that is, the fixed polarized azimuthal angle P+δP, the incident angle θ, and the fixed analyzer azimuthal angles A1+δA1 and A2+δA2. If all of them could not be determined, the reference surface 605′ will be replaced with another reference surface 605″, and steps S401 to S406 will be repeated, until all the above-listed unknown parameters, that is, azimuthal angle parameters in the fixed polarized azimuthal angle P+IP, the incident angle θ and fixed analyzer azimuthal angles A1+δA1 and A2+δA2 can be determined by solving a plurality of nonlinear equations corresponding to the plurality of reference surfaces.
When it is possible to determine all the unknown azimuthal angle parameters according to one or more nonlinear equation (13) corresponding to one or more reference surfaces, the method moves to step S407. In step S407, based on one or more nonlinear equations corresponding to one or more reference surfaces, and using the relationships between the light intensity and surface characteristics information, derived from nonlinear optimization theory methods, all of the unknown parameters are determined, that is, the polarized azimuthal angle P+δP, the incident angle θ, and the fixed analyzer azimuthal angles A1+δA1 and A2+δA2 are determined. The calculating method could be the non-linear optimization method L-M, or could be any other method that could analyze the non-linear equations. The detailed calculation method depends on the available method. Consistent with an embodiment, calibration device 611 performs the calculating process.
Independent of the above-described steps S401 to S407 and steps S31 to S35, the calibration process also includes steps S31′ to S35′, as shown in
After determining the fixed polarized azimuthal angle P+δP, the incident angle θ, and the fixed analyzer azimuthal angles A1+δA1 and A2+δA2, in step S36′, the known light parameters of the reference surface 605, that is, {right arrow over (n)} and {right arrow over (k)}, and the detected azimuthal angle parameters, are inserted into equation (13), and using the L-M method the thickness is determined. In some embodiments, the calculating process is performed by the calculating device 609. Of course, other nonlinear functions could be used to determine this thickness, and the detailed determination method is not the focus of this disclosure.
In another embodiment, the ellipsometry measurement device stores one or more characteristic information and the ellipsometric parameters, such as P and A in a measurement database. Specifically, after the system calibration with above method, the obtained characteristic information of several target surfaces in the same conditions and their corresponding ellipsometric parameters are stored along with their corresponding relationship. In another embodiment, the corresponding relationship may be conducted from the outside. Then, when the characteristic information of the target surface by the electromagnetic waves, the azimuthal angle of the ellipsometric measurement remain constant, use the obtained corresponding ellipsometric parameters corresponding to the current target surface, based on the corresponding relationship between the ellipsometric parameters and the characteristic information pre-reserved in the database, the characteristic information could be obtained from this corresponding relationship by the obtained ellipsometric parameters.
The above description is a method, after using the target reflection change the ellipsometric state of the incident light, after the measurement for the characteristic information of the reflected characteristic light, of the characteristic information confirmation. This invention is not limited to the method of using the target reflection change the ellipsometric state of the incident light, besides, the using the target transmittance or diffraction change the ellipsometric state of the incident light, to get the corresponding characteristic light information then get the target characteristics.
It is understood that the disclosed embodiments are not limited to light reflection techniques, light transmission techniques, or light diffraction techniques. It is to be understood that this invention can be used to obtain polarized light characteristics via reflection, transmission, or diffraction, and then based on the obtained light characteristics to obtain the characteristic information of the target surface by electromagnetic waves. Using general techniques of this disclosure, the calibration and measurement steps of the ellipsometric measurement method can be improved. The methods of the invention are not limited of one of above-disclosed embodiments, and all kinds of variations or modifications could be applied to arrive at the scope of the following claims.
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2008 1 0042435 | Sep 2008 | CN | national |
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PCT/CN2009/073713 | 9/3/2009 | WO | 00 | 3/2/2011 |
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WO2010/025672 | 3/11/2010 | WO | A |
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