Number | Name | Date | Kind |
---|---|---|---|
4543594 | Mohsen et al. | Sep 1985 | |
4689504 | Raghunathan et al. | Aug 1987 | |
4730129 | Kunitoki et al. | Mar 1988 | |
5252848 | Adler et al. | Oct 1993 | |
5278787 | Iwasa | Jan 1994 | |
5334880 | Abadeer et al. | Aug 1994 | |
5371394 | Ma et al. | Dec 1994 | |
5374843 | Williams et al. | Dec 1994 | |
5399917 | Allen et al. | Mar 1995 | |
5414364 | McCollum | May 1995 | |
5420450 | Yoneda et al. | May 1995 | |
5434531 | Allen et al. | Jul 1995 | |
5465054 | Erhart | Nov 1995 | |
5514980 | Pilling et al. | May 1996 | |
5574303 | Terasima et al. | Nov 1996 | |
5583454 | Hawkins et al. | Dec 1996 |
Entry |
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"Metal-to Metal Antifuses with Very Thin Silicon Dioxide Films", Zhang et al., pp. 310-312, IEEE, 1994. |
CMOS Technology and Devices, Masakazu, S., pp. 74-75, AT&T, 1988. |
VSLI Technology, 2nd Edition, Sze, S.M., pp. 466-513, AT&T, 1988. |