Claims
- 1. An apparatus for polishing chamfers of a semiconductor wafer having an orientation flat formed thereon, said apparatus includinga hollow, cup-like cylindrical hollow polishing buff adapted to be rotated on a shaft and having a cylindrical wall at an outer periphery thereof including first and second substantially cylindrical polishing surfaces on outer and inner sides of said cylindrical wall, respectively, wherein said first and second polishing surfaces are adapted to polish different chamfers of said semiconductor wafer, said first polishing surface on said outer side of said cylindrical wall being shaped to polish chamfers of said orientation flat of said wafer, and said second polishing surface on said inner side of said cylindrical outer-wall being shaped to polish chamfers at a periphery of said wafer other than said orientation flat, and wherein one of said first and second polishing surfaces includes a groove.
Priority Claims (2)
Number |
Date |
Country |
Kind |
4-053886 U |
Jul 1992 |
JP |
|
4-205275 |
Jul 1992 |
JP |
|
Parent Case Info
This application is a division of application Ser. No. 08/072,741, filed on Jun. 7, 1993 now U.S. Pat. No. 5,547,415.
US Referenced Citations (7)
Foreign Referenced Citations (6)
Number |
Date |
Country |
074767 |
Sep 1917 |
CH |
3838898 |
Nov 1988 |
DE |
4031163 |
Oct 1990 |
DE |
0216054 |
Apr 1987 |
EP |
0345586 |
Feb 1990 |
EP |
1020959 |
Jan 1989 |
JP |