Claims
- 1. (Cancelled)
- 2. The motion control system of claim 1, said actuators are selected from the group consisting of a voice coil motor and electroactive stack actuator.
- 3. The motion control system of claim 1, said sensors selected from the group consisting of LVDT, accelerometer, laser interferometer, capacitive displacement sensor.
- 4. The motion control system of claim 1, said circuit comprising a digital signal processor.
- 5. The motion control system of claim 1, said circuit comprising:
at least one digital signal processor, at least one analog to digital converter, and at least one digital to analog converter.
- 6. The motion control system of claim 1, said circuit comprising a control technique.
- 7. The control technique of claim 6, said control technique selected from the group of linear quadratic gaussian, H-infinity, and mu-synthesis.
- 8. The motion control system of claim 1, wherein said actuators stabilize said wafer stage base to closely follow a commanded input.
- 9. An motion control system for use with a lithography system, said motion control system comprising:
a wafer stage; at least two actuators for controlling motion; at least two sensors for detecting at least one parameter of displacement of said wafer base and producing at least two signals in response thereto; a signal conditioner; and a single board computer wherein, upon the detection of said at least one parameter of displacement by said sensors, said sensors feed a signal to said signal conditioner, said signal conditioner feeds a signal to said single board computer, and said single board computer commands said actuators to command said wafer stage to track a commanded position.
- 10. The motion control system of claim 9, wherein said actuators are selected from the group consisting of voice coil motor and electroactive stack actuator.
- 11. The motion control system of claim 9, wherein said sensors are selected from the group consisting of LVDT, accelerometer, laser interferometer, capacitive displacement sensor.
- 12. The motion control system of claim 9, wherein said wafer stage is commanded to track a commanded position within 0.19 seconds.
- 13. A motion control system of claim 1, wherein said circuit comprises a processor programmed with a control algorithm derived from a mode based state-space model.
- 14. A system as in claim 13, wherein said state-space model is derived using a finite element model with fictitious masses.
- 15. A system as in claim 13, wherein said processor is an element of a linear quadratic Gausian controller.
- 16. The method of motion control comprising:
applying induced strain to an elastic portion of an operating machine utilizing at least one induced strain actuator, controlled by a computer processor programmed based upon a state space model; wherein the state-space model is generated from a dynamic analysis of a simulation of the motion of the elastic portion of the operating machine occurring during the operation of the operating machine.
- 17. The method of claim 16 further comprising:
the dynamic analysis includes utilization of state-space equations of motion to facilitate the integration of control systems and response simulation employing a synthesis tool.
- 18. The method of claim 16 further comprising:
wherein the state-pace model is a reduced-order state-space model based upon a selected subset of elements from a Finite Element Model (“FEM”) including natural vibration modes within a selected excitation frequency range and selected modes for modal analysis.
- 19. The method of claim 17 further comprising:
wherein the state-pace model is a reduced-order state-space model based upon a selected subset of elements from a Finite Element Model (“FEM”) including natural vibration modes within a selected excitation frequency range and selected modes for modal analysis.
- 20. The method of claim 16 further comprising:
the dynamic analysis includes utilization f state-space equations of motion to facilitate the integration of control systems and response simulation employing a synthesis tool.
- 21. The method of claim 17 further comprising:
the dynamic analysis includes utilization f state-space equations of motion to facilitate the integration of control systems and response simulation employing a synthesis tool.
- 22. The method of claim 18 further comprising:
the dynamic analysis includes utilization f state-space equations of motion to facilitate the integration of control systems and response simulation employing a synthesis tool.
- 23. The method of claim 19 further comprising:
the dynamic analysis includes utilization f state-space equations of motion to facilitate the integration of control systems and response simulation employing a synthesis tool.
- 24. The method of claim 20, further comprising:
employing fictitious masses and complementary static load analysis to improve the model's accuracy and/or efficiency.
- 25. The method of claim 21, further comprising:
employing fictitious masses and complementary static load analysis to improve the model's accuracy and/or efficiency.
- 26. The method of claim 22, further comprising:
employing fictitious masses and complementary static load analysis to improve the model's accuracy and/or efficiency.
- 27. The method of claim 23, further comprising:
employing fictitious masses and complementary static load analysis to improve the model's accuracy and/or efficiency.
- 28. The method of claim 16, further comprising:
utilizing at least one electroactive actuator and high accuracy representation of the structure surrounding the actuator derived utilizing fictitious masses.
- 29. The method of claim 28 further comprising:
utilizing fictitious mass modal coupling to include the effects of local deformation around selected grid points on the elastic portion.
- 30. The method of claim 29, further comprising:
utilizing sets of low-frequency modes generated by a standard mode analysis procedure.
- 31. The method of claim 30, further comprising utilizing a fictitious mass matrix in a finite element model.
- 32. The method of claim 31, further comprising:
generating cleaned eigenvalues from FEM modes by removing the effects of the fictitious masses, and utilizing the eigenvalues when local response near the fictitious mass point if of interest.
- 33. The method of claim 16, further comprising:
utilizing electroactive elastic strain actuators to provide elastic vibration damping.
Parent Case Info
[0001] This application is a continuation-in-part of U.S. application Ser. No. 09/968,180 filed Oct. 1, 2001 and U.S. application Ser. No. 09/803,320 filed Mar. 3, 2001 which claims the benefit of U.S. application Ser. No. 09/491,969, filed Jan. 27, 2000, which claims the benefit of U.S. application Ser. No. 60/117,671, filed Jan. 28, 1999, and is a continuation-in-part of U.S. application Ser. No. 09/261,475, filed Feb. 26, 1999, which is a continuation-in-part of U.S. application Ser. No. 08/943,645, filed Oct. 3, 1997, now U.S. Pat. No. 6,069,433, which is a continuation of U.S. application Ser. No. 08/188,145, filed Jan. 27, 1994, the disclosures of each of which are hereby incorporated by reference. This application is also entitled to the benefit of Provisional Patent application No. 60/278,810.
Provisional Applications (2)
|
Number |
Date |
Country |
|
60117671 |
Jan 1999 |
US |
|
60278810 |
Mar 2001 |
US |
Divisions (1)
|
Number |
Date |
Country |
Parent |
10104443 |
Mar 2002 |
US |
Child |
10817313 |
Apr 2004 |
US |
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
09803320 |
Mar 2001 |
US |
Child |
10104443 |
Mar 2002 |
US |
Parent |
09491969 |
Jan 2000 |
US |
Child |
09803320 |
Mar 2001 |
US |