Vibration

Industry

CPC
G03F7/709

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/709Vibration

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 12,360,467
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance of modules for light sources used in semiconductor phot...
- Patent number 12,360,466
- Issue date Jul 15, 2025
- Cymer, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal apparatus
- Patent number 12,354,867
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Chian Huang
- B08 - CLEANING
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,353,142
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle of protecting from particle attacks
- Patent number 12,353,143
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yao-Tang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly with coating and methods of use
- Patent number 12,346,023
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process tool for dry removal of photoresist
- Patent number 12,346,035
- Issue date Jul 1, 2025
- Lam Research Corporation
- Dries Dictus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chamber device, gas laser device, and electronic device manufacturi...
- Patent number 12,347,995
- Issue date Jul 1, 2025
- Gigaphoton Inc.
- Junichi Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, lithographic apparatus and method
- Patent number 12,346,032
- Issue date Jul 1, 2025
- ASML Netherlands B.V.
- Rob Johan Theodoor Rutten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly with coating and methods of use
- Patent number 12,346,020
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating pellicle structure
- Patent number 12,346,022
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of removing particles from pellicle
- Patent number 12,346,034
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Kang Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method and substrate treatment system
- Patent number 12,339,593
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yuya Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Amorphous or nanocrystalline molybdenum nitride and silicon nitride...
- Patent number 12,339,477
- Issue date Jun 24, 2025
- Lawrence Livermore National Security, LLC
- Catherine Burcklen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithographic system provided with a deflection apparatus for changi...
- Patent number 12,332,570
- Issue date Jun 17, 2025
- ASML Holding N.V.
- Ronald Peter Albright
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-performance EUV microscope with free form illumination system
- Patent number 12,332,188
- Issue date Jun 17, 2025
- ESOL, Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Method for maintaining a projection exposure apparatus, service mod...
- Patent number 12,332,576
- Issue date Jun 17, 2025
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
POD cleaning device
- Patent number 12,330,192
- Issue date Jun 17, 2025
- STI Co., Ltd.
- Young Soo Park
- B08 - CLEANING
Information Patent Grant
Extreme ultraviolet light source device and protection method for r...
- Patent number 12,321,107
- Issue date Jun 3, 2025
- USHIO DENKI KABUSHIKI KAISHA
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Device for detecting a temperature, installation for producing an o...
- Patent number 12,321,106
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Michael Stolz
- G01 - MEASURING TESTING
Information Patent Grant
Inner pod holding device conducive to reducing dust contamination a...
- Patent number 12,306,550
- Issue date May 20, 2025
- GUDENG EQUIPMENT CO., LTD.
- Yin-Feng Chan
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,298,676
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Injae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure apparatus for semiconductor lithography with a...
- Patent number 12,298,675
- Issue date May 13, 2025
- Carl Zeiss SMT GmbH
- Philipp Gaida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a pellicle for a lithographic apparatus, a...
- Patent number 12,298,663
- Issue date May 13, 2025
- ASML Netherlands B.V.
- Mária Péter
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 12,292,695
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid purging system, projection system, illumination system, litho...
- Patent number 12,292,696
- Issue date May 6, 2025
- ASML Netherlands B.V.
- José Nilton Fonseca Junior
- G02 - OPTICS
Information Patent Grant
Damping arrangement for vibration damping of an element in an optic...
- Patent number 12,287,587
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Marwene Nefzi
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method and apparatus for removing contamination
- Patent number 12,287,589
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chih Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an EUV lithography apparatus, and EUV lithogra...
- Patent number 12,287,588
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Moritz Becker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...
- Publication number 20250231501
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tao-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20250231399
- Publication date Jul 17, 2025
- Carl Zeiss SMT GMBH
- Eric EVA
- G02 - OPTICS
Information Patent Application
ELECTRICAL CONNECTOR FOR HIGH POWER IN A VACUUM ENVIRONMENT AND METHOD
- Publication number 20250233353
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Johannes Wilhelmus DAMEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20250234445
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20250224662
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Paul Alexander VERMEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250224667
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM
- Publication number 20250216803
- Publication date Jul 3, 2025
- CYMER, LLC
- Sean Marcus Buczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCE MASK DEFECT IMPACT BY CONTAMINATION DECOMPOSE
- Publication number 20250216804
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...
- Publication number 20250218718
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250216802
- Publication date Jul 3, 2025
- Samsung Electronics Co., LTD
- Injae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELE...
- Publication number 20250208525
- Publication date Jun 26, 2025
- CYMER, LLC
- Mohammad Amin KHAMEHCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY SUBSTRATE WITH PURGE FLOW DIRECTION
- Publication number 20250208526
- Publication date Jun 26, 2025
- Entegris, Inc.
- Huaping Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE CLAMPING MODULE
- Publication number 20250199420
- Publication date Jun 19, 2025
- GUDENG EQUIPMENT CO., LTD.
- YU-LIN CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20250191952
- Publication date Jun 12, 2025
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PURGE SYSTEMS FOR A LASER SOURCE
- Publication number 20250189905
- Publication date Jun 12, 2025
- CYMER, LLC
- Gamaralalage G Padmabandu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
- Publication number 20250181001
- Publication date Jun 5, 2025
- ASML Holding N.V.
- Daniel Paul RODAK
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250180999
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsieh-Yu WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...
- Publication number 20250175589
- Publication date May 29, 2025
- Carl Zeiss SMT GMBH
- Senthil Lakshmanan
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES
- Publication number 20250172886
- Publication date May 29, 2025
- CYMER, LLC
- Spencer Ryan Williams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Ultra-Stable Multi-Directional Low-Frequency Actuator
- Publication number 20250172192
- Publication date May 29, 2025
- SHANGHAI UNIVERSITY
- Zeqi LU
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
FLUID FILTRATION FOR SEMICONDUCTOR PROCESSING
- Publication number 20250161840
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chia Pao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...
- Publication number 20250166983
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR
- Publication number 20250155796
- Publication date May 15, 2025
- NIPPON LIGHT METAL COMPANY, LTD.
- Takeshi OSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20250155817
- Publication date May 15, 2025
- SEMES CO., LTD.
- Ki Sang EUM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
- Publication number 20250155828
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Publication number 20250147424
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...
- Publication number 20250147439
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Han LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250147440
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dynamic generation of layout adaptive packaging

Maintenance of modules for light sources used in semiconductor phot...

Particle removal apparatus

Semiconductor processing tool and methods of operation

Reticle of protecting from particle attacks

Optical assembly with coating and methods of use

Process tool for dry removal of photoresist

Chamber device, gas laser device, and electronic device manufacturi...

System, lithographic apparatus and method

Optical assembly with coating and methods of use

Method of fabricating pellicle structure

Method and system of removing particles from pellicle

Developing method and substrate treatment system

Amorphous or nanocrystalline molybdenum nitride and silicon nitride...

Lithographic system provided with a deflection apparatus for changi...

High-performance EUV microscope with free form illumination system

Method for maintaining a projection exposure apparatus, service mod...

POD cleaning device

Extreme ultraviolet light source device and protection method for r...

Method for generating EUV radiation

Device for detecting a temperature, installation for producing an o...

Inner pod holding device conducive to reducing dust contamination a...

Substrate processing apparatus

Projection exposure apparatus for semiconductor lithography with a...

Method of manufacturing a pellicle for a lithographic apparatus, a...

EUV wafer defect improvement and method of collecting nonconductive...

Fluid purging system, projection system, illumination system, litho...

Damping arrangement for vibration damping of an element in an optic...

Method and apparatus for removing contamination

Method for operating an EUV lithography apparatus, and EUV lithogra...

Patents Applicationslast 30 patents

EUV WAFER DEFECT IMPROVEMENT AND METHOD OF COLLECTING NONCONDUCTIVE...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

ELECTRICAL CONNECTOR FOR HIGH POWER IN A VACUUM ENVIRONMENT AND METHOD

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

PELLICLE FOR EUV LITHOGRAPHY

APPARATUS AND METHOD FOR A LITHOGRAPHIC APPARATUS

PASSIVE DUST TRAP, ILLUMINATION SYSTEM, AND LITHOGRAPHY SYSTEM

REDUCE MASK DEFECT IMPACT BY CONTAMINATION DECOMPOSE

CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...

SUBSTRATE PROCESSING APPARATUS

APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELE...

PHOTOLITHOGRAPHY SUBSTRATE WITH PURGE FLOW DIRECTION

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

RETICLE CLAMPING MODULE

PELLICLE REMOVAL TOOL

GAS PURGE SYSTEMS FOR A LASER SOURCE

SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TE...

STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES

Ultra-Stable Multi-Directional Low-Frequency Actuator

FLUID FILTRATION FOR SEMICONDUCTOR PROCESSING

RESIDUAL GAS ANALYSER, PROJECTION EXPOSURE APPARATUS COMPRISING A R...

OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR

SUBSTRATE TREATING APPARATUS

EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM

LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT

CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS