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G03F7/70725

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70725control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate level sensing in a lithographic apparatus
- Patent number 12,339,594
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Martin Jules Marie-Emile De Nivelle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposing apparatus and method for manufacturing article
- Patent number 12,326,666
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Takashi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system, lithographic apparatus, method for positioning and de...
- Patent number 12,287,586
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Stef Marten Johan Janssens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support for an optical element
- Patent number 12,271,117
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavelength tracking system, method to calibrate a wavelength tracki...
- Patent number 12,247,883
- Issue date Mar 11, 2025
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G01 - MEASURING TESTING
Information Patent Grant
Method of using wafer stage
- Patent number 12,242,199
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus and a method of manufacturing a device
- Patent number 12,242,200
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 12,216,410
- Issue date Feb 4, 2025
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vertical motion protection method and device based on dual-stage mo...
- Patent number 12,169,367
- Issue date Dec 17, 2024
- Tsinghua University
- Kaiming Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus and article manufacturing method
- Patent number 12,140,876
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Tsutomu Terao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate stage and substrate processing system using the same
- Patent number 12,111,582
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer stage and method of using
- Patent number 12,092,958
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method of manufacturing ar...
- Patent number 12,072,638
- Issue date Aug 27, 2024
- Canon Kabushiki Kaisha
- Kazuki Ota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus lithographic apparatus measurement method
- Patent number 11,914,307
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Bas Johannes Petrus Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,914,308
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanoscale positioning apparatus with large stroke and multiple degr...
- Patent number 11,911,896
- Issue date Feb 27, 2024
- WUXI FRIEDRICH MEASUREMENT AND CONTROL INSTRUMENTS CO., LTD
- Fengwei Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Object table, a stage apparatus and a lithographic apparatus
- Patent number 11,880,144
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Sander Jeroen Hermanussen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a manufacturing apparatus and associated app...
- Patent number 11,860,549
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Wolter Siemons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system, lithographic apparatus, method for positioning and de...
- Patent number 11,860,552
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Stef Marten Johan Janssens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of unloading an object from a support table
- Patent number 11,846,879
- Issue date Dec 19, 2023
- ASML Netherland B.V.
- Giovanna De Simone
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method of manufacturing ar...
- Patent number 11,835,869
- Issue date Dec 5, 2023
- Canon Kabushiki Kaisha
- Kazuki Ota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus and device manufacturing method
- Patent number 11,774,857
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a position of a first object relative to a se...
- Patent number 11,774,865
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Thijs Adriaan Cornelis Van Keulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 11,762,299
- Issue date Sep 19, 2023
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate stage, substrate processing system using the same, and me...
- Patent number 11,747,741
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for industrial scale continuous holographic litho...
- Patent number 11,687,004
- Issue date Jun 27, 2023
- Photia Incorporated
- Joseph Bernhardt Geddes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,669,021
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Koen Jacobus Johannes Maria Zaal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure machine
- Patent number 11,662,667
- Issue date May 30, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Bo Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-field control of a lithographic process and associated apparatus
- Patent number 11,662,666
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Rowin Meijerink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...
- Publication number 20250237964
- Publication date Jul 24, 2025
- David John McGee
- G02 - OPTICS
Information Patent Application
EXPOSURE EQUIPMENT
- Publication number 20250208519
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Jisu KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WARPAGE DETERMINATION SYSTEM
- Publication number 20250199421
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Efthymios STRATIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USING WAFER STAGE
- Publication number 20250199415
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME
- Publication number 20250164897
- Publication date May 22, 2025
- SAMSUNG DISPLAY CO., LTD.
- Jungwoong Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY RETICLE STAGE ACTUATORS
- Publication number 20250155825
- Publication date May 15, 2025
- Massachusetts Institute of Technology
- Charles Byron Seaberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY RETICLE STAGE DRIVE SYSTEM
- Publication number 20250155826
- Publication date May 15, 2025
- Massachusetts Institute of Technology
- Charles Byron Seaberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTUATED PHOTOLITHOGRAPHY RETICLE STAGE
- Publication number 20250155827
- Publication date May 15, 2025
- Massachusetts Institute of Technology
- Charles Byron Seaberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR PROCESSING A SUBSTRATE IN ONE PR...
- Publication number 20250138439
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- YOUNG HO HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20250130505
- Publication date Apr 24, 2025
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS CONTROLLER SYSTEM
- Publication number 20250116944
- Publication date Apr 10, 2025
- ASML NETHERLANDS B.V.
- Bas Johannes Petrus ROSET
- G05 - CONTROLLING REGULATING
Information Patent Application
PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20250102925
- Publication date Mar 27, 2025
- Canon Kabushiki Kaisha
- SHIORI OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS, STAGE APPARATUS, AND ARTICLE MANUFACTURING M...
- Publication number 20250076774
- Publication date Mar 6, 2025
- Canon Kabushiki Kaisha
- Naosuke Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM
- Publication number 20250068087
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250060681
- Publication date Feb 20, 2025
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING
- Publication number 20240419088
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Akshay Dipakkumar HARLALKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS STAGE COUPLING
- Publication number 20240402622
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Johannes Petrus Martinus Bernardus VERMEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV LITHOGRAPHY SYSTEM AND METHOD
- Publication number 20240393696
- Publication date Nov 28, 2024
- The Regents of the University of California
- Alexander Groisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND ARTICLE MANUFACTURING METHOD
- Publication number 20240393683
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- KENJI YAEGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20240385524
- Publication date Nov 21, 2024
- SEMES CO., LTD.
- Hee Man AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE
- Publication number 20240377762
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Huan CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC...
- Publication number 20240361706
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240361707
- Publication date Oct 31, 2024
- Canon Kabushiki Kaisha
- JUNICHI MOTOJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS
- Publication number 20240353764
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Kyung Chin YI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...
- Publication number 20240329541
- Publication date Oct 3, 2024
- National Cheng Kung University
- YUNG-CHUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20240310739
- Publication date Sep 19, 2024
- Seoul National University R&DB Foundation
- Kyoungwhan OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROMAGNETIC MOTOR SYSTEM, POSTION CONTROL SYSTEM, STAGE APPARAT...
- Publication number 20240313684
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate level sensing in a lithographic apparatus

Exposing apparatus and method for manufacturing article

Method for controlling a lithographic apparatus and associated appa...

Stage system, lithographic apparatus, method for positioning and de...

Support for an optical element

Wavelength tracking system, method to calibrate a wavelength tracki...

Method of using wafer stage

Lithography apparatus and a method of manufacturing a device

Exposure apparatus and method of manufacturing article

Vertical motion protection method and device based on dual-stage mo...

Processing apparatus and article manufacturing method

Substrate stage and substrate processing system using the same

Wafer stage and method of using

Exposure apparatus, exposure method, and method of manufacturing ar...

Inspection apparatus lithographic apparatus measurement method

Lithographic apparatus

Nanoscale positioning apparatus with large stroke and multiple degr...

Object table, a stage apparatus and a lithographic apparatus

Method for controlling a manufacturing apparatus and associated app...

Stage system, lithographic apparatus, method for positioning and de...

Method of unloading an object from a support table

Exposure apparatus, exposure method, and method of manufacturing ar...

Lithography apparatus and device manufacturing method

Method of controlling a position of a first object relative to a se...

Exposure apparatus and method of manufacturing article

Substrate stage, substrate processing system using the same, and me...

System and method for industrial scale continuous holographic litho...

Lithographic apparatus and device manufacturing method

Exposure machine

Sub-field control of a lithographic process and associated apparatus

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR LASER LITHOGRAPHIC FABRICATION OF SURFACE...

EXPOSURE EQUIPMENT

SUBSTRATE WARPAGE DETERMINATION SYSTEM

METHOD OF USING WAFER STAGE

STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME

PHOTOLITHOGRAPHY RETICLE STAGE ACTUATORS

PHOTOLITHOGRAPHY RETICLE STAGE DRIVE SYSTEM

ACTUATED PHOTOLITHOGRAPHY RETICLE STAGE

SUBSTRATE PROCESSING APPARATUS FOR PROCESSING A SUBSTRATE IN ONE PR...

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE

LITHOGRAPHIC APPARATUS CONTROLLER SYSTEM

PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

LITHOGRAPHY APPARATUS, STAGE APPARATUS, AND ARTICLE MANUFACTURING M...

MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM

A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING

LITHOGRAPHIC APPARATUS STAGE COUPLING

UV LITHOGRAPHY SYSTEM AND METHOD

SUBSTRATE PROCESSING SYSTEM AND ARTICLE MANUFACTURING METHOD

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE

A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD

LITHOGRAPHY APPARATUS

CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...

ELECTROMAGNETIC MOTOR SYSTEM, POSTION CONTROL SYSTEM, STAGE APPARAT...