Claims
- 1. A method for generating a trajectory to be followed by a motor-driven stage when processing microstructures at a laser-processing site, the method comprising:
receiving reference data which represent locations of microstructures to be processed at the site; determining a plurality of possible trajectories based on the data; estimating a change of temperature of at least one motor caused when the at least one motor drives the stage based on each of the possible trajectories; and determining a substantially optimum trajectory from the possible trajectories wherein positioning accuracy of the stage is maximized by following the substantially optimum trajectory.
- 2. The method as claimed in claim 1 wherein the at least one motor includes at least one coil and wherein the step of estimating is based on an estimated amount of energy dissipated in the at least one coil for each of the possible trajectories.
- 3. The method as claimed in claim 2 wherein the step of estimating includes the step of predicting temperature rise which results from energy dissipation in the at least one coil for each of the possible trajectories based on a model of thermal response for the at least one coil.
- 4. The method as claimed in claim 3 wherein each of the possible trajectories includes a plurality of motion segments and wherein the step of estimating includes the step of estimating energy dissipation in the at least one coil for each of the motion segments.
- 5. The method as claimed in claim 1 wherein the stage is an x-y stage.
- 6. The method as claimed in claim 5 wherein the step of estimating estimates changes of temperature of a plurality of motors caused when the motors drive the x-y stage based on each of the possible trajectories.
- 7. The method as claimed in claim 1 wherein the microstructures are located on a plurality of spaced-apart dice of a semiconductor wafer supported on the stage.
- 8. The method as claimed in claim 7 wherein the microstructures are conductive lines of the dice.
- 9. The method as claimed in claim 8 wherein the dice are semiconductor memory devices and wherein the conductive lines are to be ablated at the site to repair defective memory cells of the device.
- 10. The method as claimed in claim 1 wherein at least one of the possible trajectories has an acceleration/deceleration profile.
- 11. A subsystem for generating a trajectory to be followed by a motor-driven stage when processing microstructures at a laser-processing site, the subsystem comprising:
means for receiving reference data which represent locations of microstructures to be processed at the site; means for determining a plurality of possible trajectories based on the data; means for estimating a change of temperature of at least one motor caused when the at least one motor drives the stage based on each of the possible trajectories; and means for determining a substantially optimum trajectory from the possible trajectories wherein positioning accuracy of the stage is maximized by following the substantially optimum trajectory.
- 12. The subsystem as claimed in claim 11 wherein the at least one motor includes at least one coil and wherein the means for estimating estimates an amount of energy dissipated in the at least one coil for each of the possible trajectories.
- 13. The subsystem as claimed in claim 12 wherein the means for estimating includes a model of thermal response for the at least one coil to predict temperature rise which results from energy dissipation in the at least one coil for each of the possible trajectories.
- 14. The subsystem as claimed in claim 13 wherein each of the possible trajectories includes a plurality of motion segments and wherein the means for estimating estimates energy dissipation in the at least one coil for each of the motion segments.
- 15. The subsystem as claimed in claim 11 wherein the stage is an x-y stage.
- 16. The subsystem as claimed in claim 15 wherein the means for estimating estimates changes of temperature of a plurality of motors caused when the motors drive the x-y stage based on each of the possible trajectories.
- 17. The subsystem as claimed in claim 11 wherein at least one of the possible trajectories has an acceleration/deceleration path.
- 18. The subsystem as claimed in claim 11 wherein the microstructures are located on a plurality of spaced-apart dice of a semiconductor wafer supported on the stage.
- 19. The subsystem as claimed in claim 18 wherein the microstructures are conductive lines of the dice.
- 20. The subsystem as claimed in claim 19 wherein the dice are semiconductor memory devices and wherein the conductive lines are to be ablated at the site to repair defective memory cells of the devices.
Parent Case Info
[0001] CROSS-REFERENCE TO RELATED APPLICATIONS
[0002] This application claims the benefit of U.S. provisional application Ser. No. 60/204,275, filed May 16, 2000, entitled “Trajectory Generation and Link Optimization.” This application is a continuation-in-part of U.S. patent application Ser. No. 09/572,925, also filed May 16, 2000, entitled “Method and System for Precisely Positioning a Waist of a Material-Processing Laser Beam to Process Microstructures Within a Laser-Processing Site.”
Provisional Applications (1)
|
Number |
Date |
Country |
|
60204275 |
May 2000 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09572925 |
May 2000 |
US |
Child |
09858784 |
May 2001 |
US |