This application claims priority to U.S. Provisional Application No. 60/203,538 entitled “Method and System for Detecting Metal Contamination on a Semiconductor Wafer,” filed May 10, 2000.
Number | Name | Date | Kind |
---|---|---|---|
3495269 | Mutschler et al. | Feb 1970 | A |
3496352 | Jugle | Feb 1970 | A |
4599558 | Castellano, Jr. et al. | Jul 1986 | A |
4734721 | Boyer et al. | Mar 1988 | A |
4812756 | Curtis et al. | Mar 1989 | A |
5485091 | Verkuil | Jan 1996 | A |
5594247 | Verkuil et al. | Jan 1997 | A |
5644223 | Verkuil | Jul 1997 | A |
5650731 | Fung et al. | Jul 1997 | A |
5661408 | Kamieniecki et al. | Aug 1997 | A |
5742658 | Tiffin et al. | Apr 1998 | A |
5767693 | Verkuil | Jun 1998 | A |
5773989 | Edelman et al. | Jun 1998 | A |
5834941 | Verkuil | Nov 1998 | A |
5852232 | Samsavar et al. | Dec 1998 | A |
5866806 | Samsavar et al. | Feb 1999 | A |
5948972 | Samsavar et al. | Sep 1999 | A |
5955661 | Samsavar et al. | Sep 1999 | A |
6011404 | Ma et al. | Jan 2000 | A |
6060709 | Verkuil et al. | May 2000 | A |
6072320 | Verkuil | Jun 2000 | A |
6091257 | Verkuil et al. | Jul 2000 | A |
6097196 | Verkuil et al. | Aug 2000 | A |
6104206 | Verkuil | Aug 2000 | A |
6121783 | Horner et al. | Sep 2000 | A |
6191605 | Miller et al. | Feb 2001 | B1 |
6201999 | Jevtic | Mar 2001 | B1 |
6202029 | Verkuil et al. | Mar 2001 | B1 |
6224638 | Jevtic et al. | May 2001 | B1 |
6267005 | Samsavar et al. | Jul 2001 | B1 |
6569691 | Jastrzebski et al. | May 2003 | B1 |
Number | Date | Country |
---|---|---|
9857358 | Dec 1998 | WO |
Entry |
---|
Cosway et al., Manufacturing Implementation of Corona Oxide Silicon (COS) Systems for Diffusion Furnace Contamination Monitoring, 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings, Cambridge, MA, USA, Sep. 10-12.* |
Miller, “A New Approach for Measuring Oxide Thickness,” Semiconductor International, Jul. 1995, pp. 147-148. |
Numerical Recipies in C, The Art of Scientific Computing, 2nd Ed., © Cambridge University Press 1988, 1992, p. 683. |
Weinberg, “Tunneling of Electrons from Si into Thermally Grown SiO2,” Solid-State Electronics, 1977, vol. 20, pp. 11-18. |
Verkuil, “Rapid Contactless Method for Measuring Fixed Oxide Charge Associated with Silicon Processing,” IBM Technical Disclosure Bulletin, vol. 24, No. 6, 1981, pp. 3048-3053. |
“Contactless Photovoltage vs. Bias Method for Determining Flat-Band Voltage,” IBM Technical Disclosure Bulletin, vol. 32, vol. 9A, 1990, pp. 14-17. |
“Contactless Electrical Equivalent Oxide Thickness Measurement,” IBM Technical Disclosure Bulletin, vol. 29, No. 10, 1987, pp. 4622-4623. |
Number | Date | Country | |
---|---|---|---|
60/203538 | May 2000 | US |