Number | Date | Country | Kind |
---|---|---|---|
97480104 | Dec 1997 | EP |
Number | Name | Date | Kind |
---|---|---|---|
4901242 | Kotan | Feb 1990 | A |
5210041 | Kobayashi et al. | May 1993 | A |
5483636 | Saxena | Jan 1996 | A |
5511005 | Abbe et al. | Apr 1996 | A |
5625816 | Burdick et al. | Apr 1997 | A |
5654903 | Reitman et al. | Aug 1997 | A |
5787190 | Peng et al. | Jul 1998 | A |
5859964 | Wang et al. | Jan 1999 | A |
6090632 | Jeon et al. | Jul 2000 | A |
6185511 | Steffan et al. | Feb 2001 | B1 |
6192291 | Kwon | Feb 2001 | B1 |
Number | Date | Country |
---|---|---|
072004 | Dec 1995 | EP |
2126374 | Mar 1984 | GB |
Entry |
---|
Supervisory Run-to-Run Control of Polysilicon Gate Etch Using In Situ Ellipsometry, Stephanie Watts and Jerry A. Stefani, Member, IEEE, IEEE Transactions on Semiconductor Manufacutirng, 7 (1994) May, No.2, New York, US. |
Diagnostic Monitoring of Photoresist Ashing, Jerry A. Stefani, Lee M. Loewenstein, and Michael Sullivan,IEEE/SEMI Int'l Semiconductor Manufacturing Science Symposium, Jul. 19, 1993. |