Number | Name | Date | Kind |
---|---|---|---|
5018074 | Griffith et al. | May 1991 | |
5326659 | Liu et al. | Jul 1994 | |
5411823 | Okamoto | May 1995 | |
5415952 | Haruki et al. | May 1995 | |
5436095 | Mizuno et al. | Jul 1995 | |
5468578 | Rolfson | Nov 1995 | |
5487962 | Rolfson | Jan 1996 | |
5537648 | Liebmann et al. | Jul 1996 | |
5538833 | Ferguson et al. | Jul 1996 | |
5553274 | Liebmann | Sep 1996 | |
5576126 | Rolfson | Nov 1996 | |
5609813 | Allison et al. | Mar 1997 | |
5636131 | Liebmann et al. | Jun 1997 | |
5670281 | Dai | Sep 1997 | |
5671152 | Lavin et al. | Sep 1997 | |
5672450 | Rolfson | Sep 1997 |
Number | Date | Country |
---|---|---|
5-107726 | Apr 1993 | JPX |
Entry |
---|
Levenson, Marc, Extending the Lifetime of Optical Lithography Technologies with Wavefront Engineering, Dec. 1994, Jpn J. Appl. Phys. vol. 33 (1994) pp. 6765-6772. |
Waas, T., et al., Automatic Generation of Phase Shift Mask Layouts; 1994; Microelectronic Engineering 23, pp. 139-142. |