Method for calculating a model spectrum

Abstract

With technical surfaces, in particular in semiconductor manufacture, it is a regular requirement to determine the reflection coefficient. For this purpose, a model spectrum of an object of a plurality of wavelengths and a defined number of intermediate points is calculated. To increase the calculating speed, the defined number of intermediate points is calculated prior to the execution of the calculation.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

Further advantages and advantageous embodiments of the present invention will be described with reference to the accompanying drawings, in which:

FIG. 1 schematically shows the sequence of method steps according to a first embodiment of the invention;

FIG. 2 schematically shows the sequence of process steps according to a second embodiment of the invention.

Claims

1. A method for calculating a model spectrum of an object, having a multilayer system, comprising the steps of: calculating the model spectrum with a plurality of wavelengths and a defined number of model intermediate points (Nmod), andcalculating prior to the execution of the calculation of the model spectrum, the defined number (Nmod) of model intermediate points.

2. The method according to claim 1, wherein the defined number (Nmod) of model intermediate points is determined by checking whether or not the measured spectrum is sufficiently smooth, at least patially.

3. The method according to claim 2, wherein for determining the defined number (Nmod) of model intermediate points, a smoothness value (A) is determined, wherein the value of the difference of the values of two neighboring intermediate points is determined for all intermediate points and divided by the average value of the spectrum.

4. The method according to claim 2, wherein for determining the defined number (Nmod) of model intermediate points, a smoothness value (A) is determined, wherein the maximum of the difference of the values of two neighboring intermediate points is determined for all intermediate points.

5. The method according to claim 1, wherein for determining the defined number (Nmod) of model intermediate points, the optical thicknesses Ñ·d of the multilayer system are determined beforehand.

6. The method according to claim 5, wherein for all layers of the multilayer system, without the substrate and without the ambient, the mean value of the dispersion n within the predetermined analysis range is calculated and the optical layer thickness is calculated, in particular together with the nominal value of the layer thickness,subsequently the sum of all optical layer thicknesses is formed.

7. The method according to claim 6, wherein it is determined by the user, how many model intermediate points there should be per period (SPmod) and it is calculated with the equation SNmod=SPmod/Δλ, how many model intermediate points should be provided per nm (SNmod), wherein Δλ is the wavelength difference.

8. The method according to claim 7, wherein the wavelength difference Δλ is determined with the equation

9. The method according to claim 8, wherein the obtained value (SNmod) for the number of intermediate points per nm is rounded up to an integer, then reduced by one, and then, by forming the reciprocal (DSmod) of this number, the greatest distances are determined that the intermediate points need to be apart from each other, without obtaining any noticeable errors.