Claims
- 1. A method for extracting long-equivalent wavelength interferometric information from a wavelength-independent sum interferometer; the method comprising the steps of:
- a) preparing a non-linear sum two-wavelength interferogram;
- b) placing the interferogram prepared in step a) in a Fourier transform, spatial filter, inverse Fourier transform optical train; and
- c) detecting the output image of said optical train.
- 2. The method recited in claim 1 wherein step a) comprises the steps of the exposing the two-wavelength sum fringe pattern of said interferometer on a high resolution film with the exposure adjusted to fall in a non-linear portion of said film; and developing said film to produce a non-linear sum two-wavelength interferogram.
- 3. The method recited in claim 1 wherein step c) comprises the step of placing a CCD detector array in the optical path output of said optical train.
- 4. A method for use in topographically mapping a reflective surface; the method comprising the following steps:
- a) generating an interferometric fringe pattern from said surface with at least two distinct wavelengths of light reflected simultaneously from said surface;
- b) preparing a non-linear sum interferogram from said fringe pattern;
- c) obtaining an optical Fourier transform of said interferogram;
- d) spatially filtering out all frequency components of said Fourier transform except the components corresponding to the difference frequency between said two distinct wavelengths of light;
- e) obtaining an optical inverse Fourier transform of said spatially filtered Fourier transform; and
- f) detecting the optical inverse Fourier transform obtained in step e).
- 5. The method recited in claim 4 wherein step b) comprises the step of exposing said interferometric fringe pattern onto a high resolution film with the exposure thereof being such that the average irradiance of said pattern substantially coincides with the noise exposure level of said film.
- 6. The method recited in claim 4 wherein step b) comprises the step of exposing said interferometric fringe pattern onto a high resolution film with exposure thereof being such that the average irradiance of said pattern substantially coincides with the saturation exposure level of said film.
- 7. A method for extracting a non-ambiguous difference frequency fringe pattern from a two-wavelength optical interferometer; the method comprising the steps of:
- a) generating a non-linear sum interferogram from said interferometer;
- b) placing the interferogram generated in step a) in a Fourier transform, spatial filter, inverse transform optical train wherein said spatial filter comprises a pinhole having an aperture dimension for passing only said difference frequency component.
- 8. The method recited in claim 7 wherein step a) comprises the steps of exposing the optical output of said interferometer on a film at an exposure level adjusted to a non-linear exposure portion of said film; and developing said film.
- 9. The method recited in claim 8 wherein the average of said adjusted exposure level corresponds to the noise threshold of said film.
- 10. The method recited in claim 8 wherein the average of said adjusted exposure level corresponds to the saturation threshold of said film.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is an continuation-in-part of patent application Ser. No. 07/364,165 filed June 12, 1989.
ORIGIN OF INVENTION
The invention described herein was made in the performance of work under a NASA contract, and is subject to the provisions of Public Law 96-517 (35 USC 202) in which the Contractor has elected to retain title.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4832489 |
Wyant et al. |
May 1989 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
364165 |
Jun 1989 |
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