The present disclosure relates to a method for fabricating the vapor chamber, more particularly to a method for fabricating the vapor chamber.
A vapor chamber and a heat pipe can be applied to dissipate heat. Thermal conduction of a heat pipe occurs in one dimension while thermal conduction of a vapor chamber occurs in two dimensions. Therefore, the vapor chamber is a more effective heat dissipation device to dissipate heat generated by a heat source in an electronic product. Generally, the vapor chamber includes a main body and a capillary structure, the main body has a chamber that can accommodate working fluid, and the capillary structure is disposed in the chamber. The main body can be divided into two parts—an evaporation part and a condensation part. The working fluid absorbs heat and will be vaporized to gaseous form in the evaporation part, the working fluid in gaseous form diffuses into the condensation part and will be condensed into liquid state and then returns to the evaporation part via the capillary structure and thus forming a cooling cycle of the working fluid.
However, with the increasing demand for lightweight and small electronic products, the internal space for accommodating electrical components is very limited. Therefore, how to develop a vapor chamber that can catch up the trend is an important topic in the field. Conventionally, the main body of the vapor chamber is too thin to have a sufficient structural strength. The vapor chamber is often heated over 90° C., and the high temperature will evaporate most of the working fluid and thus increasing the internal pressure of the vapor chamber to exceed a limit. By that time, the vapor chamber will be deformed or even cracked by the internal pressure. To prevent this, some put support posts in the chamber to reinforce the structural strength of the vapor chamber. And the posts also can enhance the heat conduction of the vapor chamber. However, the vapor chamber with the supporting posts is easily cracked during the manufacturing process.
The present disclosure provides a method for fabricating the vapor chamber that are able to improve the fabrication quality and heat transfer of the vapor chamber.
According to one aspect of the present disclosure, a method for fabricating a vapor chamber includes the following steps. Positioning a capillary structure on a first cover. Forming an accommodation space, a flow channel, and a plurality of posts on a first surface of a second cover. Covering the first cover with the second cover. Positioning the first cover and the second cover such that the plurality of posts are spaced apart from the capillary structure by a distance. Pressure welding the first cover and the second cover so as to form a chamber between the first cover and second cover and a passage connected to the chamber and to pressure weld the plurality of posts with the capillary structure.
According to the method for fabricating the vapor chamber discussed above, the plurality of posts are pressure welded to the capillary structure such that the heat can be conducted not only via the capillary structure but also via the posts, thereby enhancing the heat conduction of the vapor chamber.
Furthermore, the pressure welding can be performed at a certain temperature and pressure so as to ensure that the posts to be fully pressure welded to the capillary structure and can accurately control the change in thickness of the posts. Therefore, the vapor chamber is prevented from being cracked during pressure welding and thus enhancing the fabrication quality of the vapor chamber.
The present disclosure will become more fully understood from the detailed description given hereinbelow and the accompanying drawings which are given by way of illustration only and thus are not intending to limit the present disclosure and wherein:
In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the disclosed embodiments. It will be apparent, however, that one or more embodiments may be practiced without these specific details. In other instances, well-known structures and devices are schematically shown in order to simplify the drawing.
Please refer to
This embodiment provides a vapor chamber 20. The vapor chamber 20 is, for example, in a thin-plate shape and has a thickness of, for example, less than 0.5 millimeters. The vapor chamber 20 includes an upper cover 22, a lower cover 26, and a capillary structure 28.
The upper cover 22 and the lower cover 26 may be made of oxygen-free copper, copper alloy containing silicon, or copper alloy plate containing aluminum. The upper cover 22 includes a cover part 23 and a plurality of posts 25. The cover part 23 has an accommodation space 24. The posts 25 are located in the accommodation space 24 and protrude from the cover part 23. The lower cover 26 and the cover part 23 of the upper cover 22 are in contact with each other by pressure welding so as to form a chamber S therebetween, wherein the pressure welding includes, for example, resistance-welding, friction welding, cold welding, and diffusion bonding. The capillary structure 28 is, for example, copper mesh or copper fiber paper and is located in the chamber S. Further, one end of each post 25 is pressure welded to the capillary structure 28, which is disposed on the lower cover 26, such that the posts 25 are able to reinforce the structural strength of the vapor chamber 20. Furthermore, there is a sealing structure 30 located at an edge of the vapor chamber 20 for preventing working fluid from leaking from the chamber S. The sealing structure 30 is formed by pressure welding. The processes of fabricating the vapor chamber 20 are described below.
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The first cover 100 and the second cover 200 are very thin, such that, if the pressure welding was not performed under some specific conditions, the first cover 100 and the second cover 200 may be cracked and the posts 260 may not be fully pressure welded to the capillary structure 28. In detail, if the first cover 100 and the second cover 200 have a too small change in thickness during the pressure welding or if the chamber S is expanded outward by a large external force, the posts 260 may not be fully pressure welded to the capillary structure 28. In such a case, the posts 260 will not be able to perfectly maintain the gap between the first cover 100 and the second cover 200. On the contrary, if the pressure welding is not properly controlled to cause a large change in thickness of the first cover 100 and the second cover 200, the first cover 100 and the second cover 200 may experience too large stress and got penetrated or damage by the posts 260.
Therefore, in order to improve the quality of the pressure welding, in this embodiment, some conditions are given below:
Assume that a predetermined change in thickness is 0.03 mm, the change in thickness refers to the amount of compressing a post 260 which has been heated. In parameters set 1, the pressure welding is performed at a temperature of 680° C. and at a pressure of 25 kg/cm2. In parameters set 2, the pressure welding is performed at a temperature of 700° C. and at a pressure of 20 kg/cm2. In parameters set 3, the pressure welding is performed at a temperature of 750° C. and at a pressure of 18 kg/cm2. In parameters set 4, the pressure welding is performed at a temperature of 800° C. and at a pressure of 15 kg/cm2. In parameters set 5, the pressure welding is performed at a temperature of 850° C. and at a pressure of 10 kg/cm2.
It is noted that the parameters sets 1 to 5 are exemplary and the disclosure is not limited thereto. In some other embodiments, the pressure welding can be performed at a temperature and pressure by referring to different parameters. For example, the pressure welding can be performed at a temperature of 680° C. (shown in parameters set 1) and a pressure of 18 kg/cm2 (shown in parameters set 3) or a pressure of 10 kg/cm2 (shown in parameters set 5). Alternatively, the pressure welding can be performed at a pressure of 10 kg/cm2 (shown in parameters set 5) and a temperature of 680° C. (shown in parameters set 1) or a temperature of 800° C. (shown in parameters set 4).
The predetermined change of 0.03 mm in thickness is also exemplary and the disclosure is either not limited thereto. In some other embodiments, the change in thickness of the first cover 100 and the second cover 200 can be altered according to different requirements.
In addition, in the above table, the first period refers to the duration which the pressure welding is performed at a constant temperature, the second period refers to the duration which the pressure welding is performed at a constant pressure and decreasing temperature, and the third period refers to the duration which the pressure welding is performed at a decreasing temperature and pressure. For example, in the first period, the pressure welding is performed at a temperature of 680° C. and a pressure of 25 kg/cm2, wherein the 680° C. must be constant for 300 seconds. Then, in the second period, the pressure is fixed but the temperature is decreased down to a range between 300° C. and 400° C. And then, the third period is performed after the second period.
Then, the aperture size of the passage C is enlarged. As shown in
Preferably, a leak detection process may be performed on the degassing tube 400, the first cover 100, and the second cover 200, after they had been pressure welded together, in order to ensure the quality of pressure welding. In addition, an annealing process may be performed on the degassing tube 400, the first cover 100, and the second cover 200, after they had been pressure welded together, in order to release the stress caused by the pressure welding process and to enhance their mechanical reliability.
Then, the degassing tube 400 can be connected to a degassing equipment for drawing gas from the chamber S, and then the degassing tube 400 can be connected to an injecting equipment for injecting working fluid into the chamber S.
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According to the method for fabricating the vapor chamber discussed above, the plurality of posts are pressure welded to the capillary structure, such that the heat can be conducted not only via the capillary structure but also via the posts, thereby enhancing the heat conduction of the vapor chamber.
Furthermore, the pressure welding performed under the conditions provided above can ensure that the posts to be fully pressure welded to the capillary structure and can accurately control the change in thickness of the posts. Therefore, the vapor chamber is prevented from being cracked during pressure welding and thus enhancing the fabrication quality of the vapor chamber.
The embodiments are chosen and described in order to best explain the principles of the present disclosure and its practical applications, to thereby enable others skilled in the art best utilize the present disclosure and various embodiments with various modifications as are suited to the particular use being contemplated. It is intended that the scope of the present disclosure is defined by the following claims and their equivalents.
Number | Date | Country | Kind |
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201910528348.0 | Jun 2019 | CN | national |
This patent application is a divisional patent application of U.S. patent application Ser. No. 16/837,125 filed on Apr. 1, 2020 and entitled “VAPOR CHAMBER AND METHOD FOR FABRICATING THE SAME”, which is a non-provisional application claims priority under 35 U.S.C. § 119(a) on Patent Application No(s). 201910528348.0 filed in China, P.R.C. on Jun. 18, 2019, the entire contents of which are hereby incorporated by reference.
Number | Name | Date | Kind |
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20090260785 | Wang | Oct 2009 | A1 |
20180202723 | Huang | Jul 2018 | A1 |
Number | Date | Country |
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WO-2018198353 | Nov 2018 | WO |
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English translation WO2018198353 (Year: 2018). |
Number | Date | Country | |
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20230251044 A1 | Aug 2023 | US |
Number | Date | Country | |
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Parent | 16837125 | Apr 2020 | US |
Child | 18134526 | US |