Number | Name | Date | Kind |
---|---|---|---|
4513905 | Nowicki et al. | Apr 1985 | |
5232522 | Doktycz et al. | Aug 1993 |
Number | Date | Country |
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598422 | May 1994 | EPX |
59-55016 | Mar 1984 | JPX |
Entry |
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"Deposition and Properties of Reactively Sputtered Ruthenium Dioxide Films", Keizo Sakiyama et al., J. Electrochem. Soc., 140(3):834-839 (1993). |
"Barrier Metals for ULSI: Deposition and Manufacturing", Dipanker Pramanik et al., Solid State Technology, pp. 73-76, 79 and 82, Jan. 1993. |