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Grinolds et al., "Reliability and Performance of Submicron LDD NMOSFET's With Buried-As N-Impurity Profiles", IEDM 1985, pp. 246-249. |
Bampi et al., "Modified LDD Device Structures for VLSI", IEDM, 1985, pp. 234-237. |
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"Effects of Device Processing on Hot-Electron Induced Device Degradation", by Fu-Chieh Hsu and Kuang Yi Chiu; Hewlett-Packard Laboratories; pp. 108-109. |
"Profiled Lightly Doped Drain (PLDD) Structure for High Reliable NMOS-FET's", Y. Toyoshima, N. Nihira, and K. Kanzaki; pp. 118-119. |