This application claims priority to Japanese Patent Application No. 2018-100326 filed on May 25, 2018. The entire disclosure of Japanese Patent Application No. 2018-100326 is incorporated herein by reference.
The present disclosure relates to a method for manufacturing a light emitting module.
Light emitting modules have been known for which a light emitting device such as an LED (Light Emitting Diode), etc., that uses a semiconductor light emitting element (hereafter also called a “light emitting element”) is mounted on a wiring board.
This kind of light emitting module is formed by mounting the light emitting device on solder, etc., that is mounted on a wiring board, after which by fusing the solder by heating using a reflow furnace, etc., the wiring board and the light emitting device are joined (Japanese Laid-Open Patent Application Publication No. 2003-318530, for example).
The solder contains flux, and the flux contains a volatile component such as a solvent, etc. When heat is applied during joining, a reduction reaction occurs between an oxide film of a metal subject to joining and the flux. There are cases when moisture that was generated during this reduction reaction, or the volatile component such as the solvent in the flux, etc., remains within the solder. This remaining moisture or volatile component is a void, and by this kind of voids being formed, there are cases when a problem such as a decrease in joining properties, etc., occurs.
An embodiment of the present invention includes the following configuration.
A method for manufacturing a light emitting module comprising: providing a light emitting device having an upper surface including a light emitting surface, and a lower surface for which an external connection terminal is exposed with the external connection terminal being spaced apart from an edge part of the lower surface of the light emitting device; placing a joining member on a wiring of a wiring board, the joining member containing solder particles and flux containing at least one of a solvent and an active agent; mounting the light emitting device on the joining member on the wiring board; performing a first heating process in which the wiring board, the joining member, and the light emitting device are heated for a first heating time in a first temperature range that is higher than a prescribed temperature, and lower than a fusing point of the solder particles, the prescribed temperature being in a range from about 10° C. lower than a boiling point of the at least one of the solvent and the active agent to the boiling point; and after the first heating process, performing a second heating process in which the wiring board, the joining member and the light emitting device are heated for a second heating time in a second temperature range higher than the fusing point of the solder particles, the second heating time being shorter than the first heating time.
Accordingly, when joining the wiring board and the light emitting device using a fusible joining member that uses flux that contains solder particles, and at least one of a solvent and an active agent, it is possible to suppress the formation of voids within the joining member.
A mode for embodying the present invention is explained hereafter while referring to the drawings. However, the mode shown hereafter shows an example of the method for manufacturing a light emitting module for realizing in specific form the technical concept of the present invention, and the present invention is not limited to the method for manufacturing a light emitting module according to the following embodiment.
The method for manufacturing the light emitting module 100 like that described above includes a step of joining the light emitting device 10 and the wiring board 20 using the joining member 30 that contains flux and solder particles. The flux has rosin (resin) as a main component, and further contains at least one of an active agent, a solvent, a thixotropic agent (wax), etc. This step of joining the light emitting device 10 includes a step of heating and fusing the joining member 30, and in more detail, includes a first heating step and a second heating step. The first heating step is a step for heating in a first temperature range that is higher than a prescribed temperature around the boiling point of the solvent or the active agent contained in the flux and lower than the fusing point of the solder particles. The prescribed temperature is a temperature in a range from about 10° C. lower than the boiling point to the boiling point in consideration of temperature variations, etc. inside a heating equipment such as a reflow furnace. The second heating step is a step for, after the first heating step is performed, heating at a second temperature range that is higher than the fusing point of the solder particles. Also, a heating time T1 of the first heating step is longer than a heating time T2 of the second heating step. Said another way, the heating time T2 of the second heating step is shorter than the heating time T1 of the first heating step. With a method of heating using this kind of temperature profile, it is possible to suppress the formation of voids within the joining member 30.
Before the heating step, the joining member 30 contains a flux 32 and solder particles 31 as shown in
The void formed within the joining member is formed when gas generated by volatilization of the solvent, active agent, etc., contained in the flux by heating, or water generated by the reduction reaction between the flux and the oxide film of the metal that is subject to joining, is enclosed in the fused solder component. In other words, if flux is not contained to begin with, voids are not formed even if the solder material is fused. However, by the solder material containing flux, during heating, there is an effect exhibited of being able to remove and clean the oxide film, etc., of the solder particles surface and the surface of the metal that is subject to joining. By doing this, it is possible to do joining without a special condition such as having the environment during joining be a reducing atmosphere, etc. In other words, by containing flux, it is possible to join a metal material of wiring, etc., and the solder material in a normal atmosphere, or in a nitrogen atmosphere with nitrogen gas introduced in to a normal atmosphere.
With the method of this embodiment, by making the heating time long for the first heating step in which the solvent or active agent in the flux is volatilized without fusing the solder, first, cleaning of the wiring and external connection terminal surface, as well as the solder particles is performed by the flux, and it is possible to volatilize most of the solvent or active agent. With this first heating step, the solder particles are held in particle form without fusing. In other words, because the solvent or active agent in the flux is volatilized in a state held in a gap between the solder particles, the volatile component is easily discharged to outside via the gap between the solder particles.
Also, at the stage when the temperature is raised further and reaches the second temperature range that is higher than the fusing point of the solder material, the amount of the volatile component of the solvent or active agent in the flux remaining in the joining member is small, so enclosing of the volatile component of the solvent or the active agent on the interior when the solder particles are fused does not occur easily. In other words, voids are not formed easily.
As described above, in the first heating step, in a state with a discharge route for the volatile component of the solvent or the active agent contained in the flux ensured, the heating time is made longer so that sufficient cleaning of the wiring surface or the solder particles surface, etc. by the flux is possible. Also, in the subsequent second heating step, an oxide that is newly generated by fusing of the solder particles, for example the oxide of the metal that is subject to joining such as wiring, etc., is heated in the second temperature range for which the heating time is shorter, and by doing an oxidation reduction reaction with the residual flux, cleaning is done. By performing the heating step of the joining member with this kind of temperature profile, it is possible to have no generation of connection defects due to the oxide film, etc., and to suppress the occurrence of voids.
Furthermore, by making the heating time of the first heating step long, in a state when the content of the volatile component of the solvent or the active agent has become lower, it is preferable to have the temperature of the second heating step be higher than the fusing point of the solder material, and to have the heating time T2 be shorter. Furthermore, it is possible to have the temperature of the second heating step be a temperature that is lower than the temperature that is approximately 10° C. to 20° C. higher than the fusing point of the solder material. This is preferable because by doing this, it is possible to more efficiently suppress the occurrence of voids.
Typically, to suppress the occurrence of voids, a temperature profile is recommended that heats for a long time at a temperature range that exceeds the fusing point of the solder component. The temperature profile of the embodiment is effective when joining the light emitting device comprising the kind of external connection terminal described later, and is significantly different from the typical temperature profile.
Following is a detailed description of each step of the method for manufacturing a light emitting module.
The light emitting device 10 is a member that is the light source of the light emitting module 100, and comprises an upper surface 101 that comprises a light emitting surface, a lower surface 102 that includes a lower surface 142 of the external connection terminal 14, and a side surface 103 between the upper surface 101 and the lower surface 102. As shown in
The lower surface 102 of the light emitting device 10 is configured by a lower surface 132 of the substrate 13, and the lower surface 142 of the external connection terminal 14. The external connection terminal 14 is placed separated from the edge part of the lower surface 102 of the light emitting device 10. Said another way, the external connection terminal 14 is placed further to the inside than the outer circumference of the lower surface 102 of the light emitting device 10.
For example, as shown in
The percentage of the lower surface 102 of the light emitting device 10 occupied by the lower surface 142 of the external connection terminal 14 is 10% to 70%. In this way, when the lower surface 142 of the external connection terminal 14 occupies a small surface area of the lower surface 102 of the light emitting device 10, since the amount of the joining member 30 is small to begin with, compared to cases when a large amount of the joining member is used, the effect of one void on the joining strength is great. For that reason, by performing the heating step with the temperature profile of this embodiment, it is possible to suppress a decrease in joining strength.
Also, a width W2 of the lower surface 132 of the substrate 13 between the edge part of the lower surface 102 of the light emitting device 10 and the lower surface 142 of the external connection terminal 14 is 20% to 70% of the width W1 of the lower surface 102 of the light emitting device 10. Also, a length L2 of the lower surface 132 of the substrate 13 between the edge part of the lower surface 102 of the light emitting device 10 and the lower surface 142 of the external connection terminal 14 is 10% to 35% of the length L1 of the lower surface 102 of the light emitting device 10. In this way, the lower surface 142 of the external connection terminal 14 is placed inward from the edge part of the lower surface 102 of the light emitting device 10, so the path through which the volatile component such as the solvent or the active agent contained in the flux or the water generated by the reduction reaction of the flux and the oxide film of the metal subject to joining, etc., is discharged is long. In such a case, compared to a case when the external connection terminal contacts the edge part in the lower surface of the light emitting device, or when placed in the vicinity of the edge part, the volatile component such as the solvent or the active agent contained in the flux, etc., or water, etc., is not easily discharged to outside. For that reason, voids are formed easily. By performing the heating step with the temperature profile of this embodiment, before the solder particles are fused, much of the flux 32 is volatilized, so it is possible to make it harder for voids to form when the solder particles are fused.
The lower surface 132 of the substrate 13 and the lower surface 142 of the external connection terminal 14 are roughly flush, or the lower surface 132 of the substrate 13 and the lower surface 142 of the external connection terminal 14 can be provided with a height difference of approximately 50 μm or less. As described above, when the lower surface 142 of the external connection terminal 14 is positioned substantially inward at the lower surface 102 of the light emitting device 10, the surface area for which the upper surface of the wiring board 20 and the lower surface 132 of the substrate 13 face opposite becomes large. Also, when an insulating film 23 of resist, etc., is formed on the wiring 22, an upper surface 231 of that insulating film 23 faces opposite the lower surface 132 of the substrate 13 at an extremely close distance. For that reason, furthermore, though the structure is such that the volatile component such as flux is not easily discharged to the outside, by performing the heating step with the temperature profile of this embodiment, it is possible to make it difficult for voids to be formed.
In
Furthermore, as the light emitting device, in addition to the light emitting device 10 comprising the package 12 like that described above, it is also possible to use a light emitting device 10A like that shown in
With the light emitting device 10A as well, the same as with the light emitting device 10 shown in
The step for placing the joining member on the wiring board can be performed before, at the same time, or after the step for providing the light emitting device.
The wiring board 20 comprises the base 21, and the wiring 22 placed on the upper surface of the base 21. Furthermore, it is also possible to comprise the insulating film 23 such as of resist, etc., that covers so that a portion of the wiring 22 is exposed. The wiring 22 comprises a mounting region exposed from the insulating film 23 at the position at which the light emitting device 10 is mounted. The mounting region can be a region of a size that is 100% to 150% with respect to the surface area of the lower surface 142 of the external connection terminal 14 of the light emitting device 10, and can have approximately the same shape. The wiring 22 surrounding this mounting region is covered by the insulating film 23. The wiring board 20 can use as the base 21 the base 21 having insulation properties such as ceramic, glass epoxy, paper phenol, etc., for example. Alternatively, as the base 21, it is also possible to use an electrically conductive base 21 using a metal such as aluminum, etc., and in that case, an insulation layer is provided between the electrically conductive base 21 and the wiring 22. Also, the shape of the wiring board 20 can be rectangular, circular, etc., for example. As the material of the wiring 22, it is possible to use Cu or Ag, for example. Furthermore, it is possible to use Au plating, solder plating, etc., on the surface of the wiring 22. Also, the wiring 22 may comprise water-soluble flux instead of the plating described above. For the insulating film 23, it is possible to use epoxy resin, silicone, etc., for example. The thickness of the insulating film 23 is preferably lower than the height of the joining member 30 after joining, and can be 5 μm to 30 μm, for example.
As shown in
As shown in
Next, the first heating step is performed. The first heating step is a step for heating in a first temperature range which is a temperature around the boiling point of the solvent or the active agent contained in the flux 32 or greater, and lower than the fusing point of the solder particles 31. First, as shown in
Next, the wiring board 20 and the light emitting device 10 placed thereon with the joining member 30 interposed are placed inside a heating equipment, and the first heating step is performed according to the temperature profile shown in
For example, when using flux for which the boiling point of the solvent or the active agent is approximately 200° C., and solder material for which the fusing point is approximately 220° C., the first temperature range is preferably a temperature range that is higher than 190° C. and lower than 220° C. Also, the heating time T1 of the first heating step can be 40 seconds to 100 seconds, for example.
Next, the second heating step is performed. The second heating step is the step for heating at the second temperature range that is higher than the fusing point of the solder particles 31. The first heating step and the second heating step are performed successively within the same heating equipment. The time it takes for the second heating step of heating in the second temperature range is heating time T2.
For example, when using solder material with a fusing point of approximately 220° C., the second temperature range is preferably a temperature range between 220° C. or greater and lower than 240° C. Also, the heating time T2 of the second heating step can be 20 seconds to 50 seconds, for example.
In this way, the heating time T1 of the first heating step is longer than the heating time T2 of the second heating step. By doing this, it is possible to suppress the formation of voids within the joining member 30 between the light emitting device 10 and the wiring board 20.
The overall heating time including the heating times T1 and T2 can be adjusted according to the amount of the joining member, etc. For example,
Number | Date | Country | Kind |
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2018-100326 | May 2018 | JP | national |