Claims
- 1. A method for producing plano-convex convergence lenses, which comprises:providing a semiconductor wafer with a main surface; producing a plurality of convex projections on the main surface of the semiconductor wafer; applying a metal layer to the entire main surface of the semiconductor wafer; providing a diaphragm on each one of the plurality of convex projections by structuring the metal layer; and forming a plurality of individual piano-convex convergence lenses with a diaphragm by slicing through the semiconductor wafer between each one of the plurality of convex projections.
- 2. The method according to claim 1, which comprises using a photographic technique and etching to perform the step of producing a plurality of convex projections and using a photographic technique and etching to perform the step of providing a diaphram.
Priority Claims (1)
Number |
Date |
Country |
Kind |
197 41 702 |
Sep 1997 |
DE |
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CROSS-REFERENCE TO RELATED APPLICATION
This is a division of U.S. application Ser. No. 09/533,562, filed Mar. 22, 2000, which was a continuation of copending International application No. PCT/DE98/02767, filed Sep. 17, 1998, which designated the United States.
US Referenced Citations (8)
Foreign Referenced Citations (4)
Number |
Date |
Country |
36 34 187 |
Apr 1988 |
DE |
41 33 220 |
Apr 1993 |
DE |
43 07 986 |
Sep 1994 |
DE |
0 425 858 |
May 1991 |
EP |
Non-Patent Literature Citations (2)
Entry |
Patent Abstracts of Japan No. 02-127605 (Mitsuru), dated May 16, 1990. |
Patent Abstracts of Japan N. 61-248490 (Hiroyoshi), dated Nov. 5, 1986. |
Continuations (1)
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Number |
Date |
Country |
Parent |
PCT/DE98/02767 |
Sep 1998 |
US |
Child |
09/533562 |
|
US |