Tegal News Release (Prompt database No. 96:610238 Oct. 8, 1996) Oct. 8, 1996. |
An article entitled "Platinum Metal Etching in a Microwave Oxygen Plasma," J. Appl. Phys. 68 (5), Sep. 1, 1990, pp. 2415-2423, by Chou et al. |
An article entitled "Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance Plasmas," Jpn. J. Appl. Phys., vol. 32 (1993), pp 6102-6108, by Nishikawa et al. |
An article entitled "High-Temperature Etching of PZT/Pt/TiN Structure by High-Density ECR Plasma," Jpn. J. Appl. Phys., vol. 34 (1995), pp. 767-770, by Yokoyama et al. |
An article entitled "Control of Etch Slope During Etching of Pt in Ar/Cl.sub.2 /O.sub.2 Plasmas," Jpn. J. Appl. Phys., vol. 35 (1996), pp. 2501-2504 by Yoo et al. |
An article entitled "High-K Dielectric Materials for DRAM Capacitors," Semiconductor International, Nov. 1996, pp. 109-116, by Kotecki. |
A paper entitled "New Insight into the Reactive Ion Etching of Fence-Free Patterned Platinum Structures" at the 43rd Symposium of AVS, Oct. 1996, Philadelphia, PA, by Milkove et al. |
An article entitled "The Etching of Platinum Electrodes for PZT Based Ferroelectric Devices," Electrochemical Society Proceedings, vol. 96-12 (1996), pp. 515-520, by Keil et al. |
An article entitled "Patterning of Pt thin films using Si0/sub 2/ mask in a high density plasma," Journal of the Korean Institute of Telematics and Electronics, Mar. 1997, by Lee et al. |
An article entitled "The study on the etching mechanism of Pt thin film by inductive coupled plasma," Journal of the Korean Institute of Telematics and Electronics, Jun. 1997, by Kwang-Ho Kwon et al. |
An article entitled "High Temperature Etching of PZT/PT/TiN Structure by High Density ECR Plasma," International Conference on Solid State Devices and Materials, Aug. 1994, by Yokoyama et al. |
An article entitled "A Novel Method of Dry Etching fence-Free Pt Electrodes for Gbit DRAMS," 1997, p. 7C by Xing et al. |
An article entitled "Process Integration of the Stacked Ferroelectric Capacitor Cell," Proceedings of the Symposium on Semiconductors and Integrated Circuits Technology, 1997 Vo. 52p. 159.164, date: Jan. 1992, by Kazuya et al. |
An article entitled "Reactive ion etch study for producing patterned platinum structures," Proceedings of the 1996 8.sup.th International Symposium on Integrated Ferroelectrics 16 (1-4) pt. 3 1997, pp. 109-138, by Farrell et al. |
An article entitled "Etching of platinum and high dielectric constant films" Oyo Butsuri, 1994 vo. 63, No. 11. 1139-1142, by Teruo et al. |
Tegal News Release, Business Wire published Jul. 10, 1996. |
An article entitled "Study on Fence-Free Platinum Etching Using Chlorine-Based Gases in Inductiveley Coupled Plasma," J. Electrochem. Soc.,144(11):L294-L296 (1997) by Chung, C.W. et al. |
An article entitled "Plasma Etch of Ferroelectric Capacitors in FeRAMs and DRAMs," Semiconductor International, pp. 102-108 (Sep. 1997) by DeOrnellas, S. et al. |
An article entitled "The Etching of Platinum Electrodes for PZT Based Ferroelectric Devices," Electrochemical Society Proceedings, 96-12:515-521 (1996) by Keil., D. et al. |
An article entitled "High-temperature Etching of PZT/Pt/TiN Structure by High-Density ECR Plasma," Jpn. J. Appl. Phys., 34:767-770 (1995) by Yokoyama, S. et al. |