Claims
- 1. A method for forming semiconductor components having conductive traces thereon, comprising:providing a substrate including a plurality of columns, each of said columns including at least one semiconductor device component, adjacent columns of said plurality of columns each being separated by a street located therebetween; positioning groups of conductive traces on a surface of said substrate, a first group of said groups of conductive traces extending at least partially over a first column of said plurality of columns and a second group of said groups of conductive traces extending at least partially over a second column of said plurality of columns, said second column being located adjacent to said first column, said first and second groups being connected to a common tie bar, said common tie bar being at least partially located over said street between said adjacent columns; substantially simultaneously severing said common tie bar from said first and second groups of conductive traces; and severing said first and second columns from one another along said street.
- 2. The method of claim 1, wherein said substantially simultaneously severing is effected by cutting through at least a region of each of said first and second groups of conductive traces adjacent said common tie bar.
- 3. The method of claim 2, wherein said substantially simultaneously severing includes cutting at least partially through said substrate.
- 4. The method of claim 3, wherein said cutting at least partially through said substrate comprises scribing a surface of said substrate.
- 5. The method of claim 1, wherein said substantially simultaneously severing said common tie bar and said severing said first and second columns are effected substantially concurrently.
- 6. The method of claim 1, wherein said substantially simultaneously severing is effected with a wafer saw.
- 7. The method of claim 6, wherein said substantially simultaneously severing is effected with a wafer saw including two parallel saw blades.
- 8. The method of claim 7, wherein said severing said first and second columns is effected by laterally moving at least one of said two parallel saw blades to a position aligned with said street and raising the other of said two parallel saw blades out of contact with said substrate.
- 9. The method of claim 1, wherein said positioning groups of conductive traces comprises forming said groups of conductive traces on said substrate by electrodeposition.
CROSS REFERENCE TO RELATED APPLICATION
This application is a divisional of application Ser. No. 09/434,147, filed Nov. 4, 1999, pending, which is a continuation of application Ser. No. 09/270,539, filed Mar. 17, 1999, now U.S. Pat. No. 6,155,241, which is a divisional of application Ser. No. 09/069,561, filed Apr. 29, 1998, now U.S. Pat. No. 6,119,675, which is a divisional of application Ser. No. 08/747,299, filed Nov. 12, 1996, now U.S. Pat. No. 6,250,1992.
US Referenced Citations (49)
Foreign Referenced Citations (1)
Number |
Date |
Country |
2810054 |
Sep 1978 |
DE |
Continuations (1)
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Number |
Date |
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Parent |
09/270539 |
Mar 1999 |
US |
Child |
09/434147 |
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US |