METHOD OF ADJUSTING PATTERN DENSITY

Abstract

A method of adjusting pattern density includes determining a reference pattern density, defining dummy generation fields and designed patterns, forming basic dummy patterns on the dummy generation fields, evaluating a total pattern density from a sum of a density of the designed patterns and a density of the basic dummy patterns, adjusting a size of the basic dummy patterns so that the total pattern density reaches the reference pattern density, and combining data of the adjusted dummy patterns with data of the designed patterns.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

Exemplary embodiments of the present disclosure can be understood in more detail from the following description taken in conjunction with the accompanying drawings of which:

FIG. 1 is a flow chart showing a method of adjusting pattern density in accordance with an exemplary embodiment of the present invention;

FIGS. 2 through 5 are plan views illustrating a method of adjusting a pattern density, according to an exemplary embodiment of the present invention;

FIG. 6 is a flow chart showing a method of adjusting a pattern density in accordance with an exemplary embodiment of the present invention; and

FIGS. 7 and 8 illustrate a method of adjusting a pattern density in accordance with an exemplary embodiment of the present invention.

Claims

1. A method of adjusting pattern density, comprising: determining a reference pattern density;defining dummy generation fields and designed patterns;forming basic dummy patterns on the dummy generation fields;evaluating a total pattern density from a sum of a density of the designed patterns and a density of the basic dummy patterns;adjusting a size of the basic dummy patterns so that the total pattern density reaches the reference pattern density; andcombining data of the adjusted dummy patterns with data of the designed patterns.

2. The method of claim 1, wherein defining the dummy generation fields and designed patterns comprises: enlarging the designed patterns in a predetermined rate and setting restrictive regions with spaces occupied by the enlarged designed patterns; anddefining an area not occupied by the designed patterns and the restrictive regions as the dummy generation fields.

3. The method of claim 2, wherein the restrictive regions include design-inhibited regions preliminarily defined during a procedure of design.

4. The method of claim 1, wherein the basic dummy patterns are spaced at a predetermined distance from boundaries of the dummy generation fields.

5. The method of claim 4, further comprising: establishing a maximum corrected size from a size of a basic dummy pattern; and isolating the basic dummy patterns from the boundaries of the dummy generation fields.

6. The method of claim 5, wherein the basic dummy patterns are isolated from each other.

7. The method of claim 1, wherein adjusting the size of basic dummy patterns comprises: evaluating a density of corrected dummy pattern by subtracting the designed pattern density from the reference pattern density;determining a size of the corrected dummy pattern from the corrected dummy pattern density; andadjusting the basic dummy pattern size to the corrected dummy pattern size.

8. The method of claim 7, wherein determining the corrected dummy pattern size comprises: evaluating a total area of the corrected dummy patterns from the corrected dummy pattern density;evaluating an area of the dummy pattern from dividing the total area of the corrected dummy patterns by a number of the dummy patterns; anddetermining a 2-dimensional size of the corrected dummy pattern from the dummy pattern area.

9. A method of adjusting pattern density, comprising: determining a reference pattern density;defining dummy generation fields and design patterns;forming basic dummy patterns on the dummy generation fields;dividing a chip area into a plurality of subareas;evaluating a total pattern density of each subarea from a sum of a density of the designed patterns and a density of the basic dummy patterns;adjusting a size of the basic dummy patterns so that the total pattern density of each subarea reaches the reference pattern density; andcombining data of the adjusted dummy patterns with data of the designed patterns.

10. The method of claim 9, wherein defining the dummy generation fields and design patterns comprises: enlarging the designed patterns in a predetermined rate and setting restrictive regions with spaces occupied by the enlarged designed patterns; anddefining an area not occupied by the restrictive regions and the designed patterns as the dummy generation fields.

11. The method of claim 10, wherein the restrictive regions include design inhibited regions preliminarily defined during a procedure of design.

12. The method of claim 9, which further comprises: establishing a maximum size corrected from a size of the basic dummy pattern; andisolating the basic dummy patterns from boundaries of the dummy generation fields.

13. The method of claim 12, wherein the basic dummy patterns are isolated from each other.

14. The method of claim 9, wherein adjusting the size of the basic dummy patterns comprises: evaluating a density of a corrected dummy pattern by subtracting the designed pattern density from the reference pattern density;determining a size of the corrected dummy pattern from a targeted density of the corrected dummy patterns; andadjusting the basic dummy pattern size to the corrected dummy pattern size.

15. The method of claim 14, wherein determining the corrected dummy pattern size comprises: evaluating a total area of the corrected dummy patterns from the corrected dummy pattern density;evaluating an area of the dummy pattern from dividing the total area of the corrected dummy patterns by a number of the dummy patterns; anddetermining a 2-dimensional size of the corrected dummy pattern from the dummy pattern area.