Masks having proximity correction features Preparation thereof

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G03F1/36

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/36Masks having proximity correction features Preparation thereof

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Integrated circuit layout generation method
- Patent number 12,361,199
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ke-Ying Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for forming photomask
- Patent number 12,353,122
- Issue date Jul 8, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Chun-Liang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor manufacturing apparatus and semiconductor manufacturi...
- Patent number 12,353,123
- Issue date Jul 8, 2025
- Winbond Electronics Corp.
- Kazuhiro Segawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for manufacturing photomask and semiconductor...
- Patent number 12,340,163
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chin-Min Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for reticle enhancement technology of a design...
- Patent number 12,340,164
- Issue date Jun 24, 2025
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithographic mask optimization method and system without borde...
- Patent number 12,339,581
- Issue date Jun 24, 2025
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device having power rail with non-linear edge
- Patent number 12,340,165
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Chan Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization using a non-uniform illumination intensity profile
- Patent number 12,339,583
- Issue date Jun 24, 2025
- ASML Holding N.V.
- Janardan Nath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chip deviation correction method for maskless exposure machine
- Patent number 12,326,657
- Issue date Jun 10, 2025
- SKYBULL TECHNOLOGY CO., LTD.
- Ta Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern layout and the forming method thereof
- Patent number 12,309,993
- Issue date May 20, 2025
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography and method of fabricating semiconductor device using th...
- Patent number 12,306,531
- Issue date May 20, 2025
- Samsung Electronics Co., Ltd.
- Wooseok Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical imaging method, device and system for photolithography system
- Patent number 12,306,543
- Issue date May 20, 2025
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask design method and storage medium thereof
- Patent number 12,298,661
- Issue date May 13, 2025
- Kioxia Corporation
- Taiki Kimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,298,673
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for reticle enhancement technology
- Patent number 12,287,567
- Issue date Apr 29, 2025
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full-chip cell critical dimension correction method and method of m...
- Patent number 12,282,249
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Kisung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 12,278,204
- Issue date Apr 15, 2025
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing integrated circuit
- Patent number 12,271,107
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu-Ting Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parallel mask rule checking on evolving mask shapes in optical prox...
- Patent number 12,271,676
- Issue date Apr 8, 2025
- NVIDIA Corporation
- Kumara Narasimha Sastry Kunigal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inverse lithography and machine learning for mask synthesis
- Patent number 12,265,325
- Issue date Apr 1, 2025
- Synopsys, Inc.
- Amyn A. Poonawala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 12,265,334
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reticle enhancement technology of a design...
- Patent number 12,248,242
- Issue date Mar 11, 2025
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 12,242,183
- Issue date Mar 4, 2025
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing semiconductor mark, and semiconductor mark
- Patent number 12,230,584
- Issue date Feb 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chuang Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shifter circuit, phase shifter layout and method of forming t...
- Patent number 12,229,488
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsien Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting mask pattern, apparatus for correcting mask p...
- Patent number 12,216,979
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuping Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and method of fabricating a sem...
- Patent number 12,210,290
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and mask manufacturing method o...
- Patent number 12,204,241
- Issue date Jan 21, 2025
- Samsung Electronics Co., Ltd.
- Kangmin Jung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device with deep trench isolation mask layout
- Patent number 12,206,002
- Issue date Jan 21, 2025
- SK keyfoundry Inc.
- Yang Beom Kang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF EXTRACTING SUB-RESOLUTION ASSIST FEATURE (SRAF) PRINTING...
- Publication number 20250224665
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Mijin KWON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR OPTIMIZING SOURCE MASK AND LITHOGRAPHY SYSTEM INCLUDING...
- Publication number 20250224664
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Sungmin NAM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR OPTIMIZING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20250224666
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Min-Cheol KANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR TEST STRUCTURE GENERATION BASED ON LITHOGRAPHIC SIMUL...
- Publication number 20250217561
- Publication date Jul 3, 2025
- Intel Corporation
- Brian Hendrik Miller
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REUSE OF RESOLUTION ENHANCEMENT TECHNIQUE (RET) DATA IN RET PROCESS...
- Publication number 20250216766
- Publication date Jul 3, 2025
- Intel Corporation
- Kshitij Auluck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FULL-SHOT LAYOUT CORRECTION METHOD AND MASK MANUFACTURING METHOD IN...
- Publication number 20250208498
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Donggon WOO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING INTEGRATED CIRCUIT
- Publication number 20250199394
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SIMULATION METHOD AND OPTICAL PROXIMITY EFFECT CORRECTI...
- Publication number 20250200241
- Publication date Jun 19, 2025
- KIOXIA Corporation
- Shoji MIMOTOGI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS
- Publication number 20250189881
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Ya LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFTER CIRCUIT, PHASE SHIFTER LAYOUT AND METHOD OF FORMING T...
- Publication number 20250190677
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsien LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, SYSTEM AND ELECTRONIC APPARATUS FOR MASK FEATURE OPTIMIZATION
- Publication number 20250180980
- Publication date Jun 5, 2025
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR PROXIMITY CORRECTION FOR LITHO-ETCHING-LITH...
- Publication number 20250172865
- Publication date May 29, 2025
- Samsung Electronics Co., Ltd.
- Yang Woo Heo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF MANUFACTURING MAS...
- Publication number 20250155794
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Kyeonghwan KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGN OF CURVED MASK LAYERS BASED ON LEVELSET FUNCTIONS
- Publication number 20250138412
- Publication date May 1, 2025
- Synopsys, Inc.
- Moongyu Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT
- Publication number 20250139814
- Publication date May 1, 2025
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRANSMISSION GATE MANUFACTURING METHOD
- Publication number 20250117567
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Lun CHIEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK OPTIMIZATION PREFERENTIALLY ACCOUNTING FOR OVERLAP REGIONS
- Publication number 20250102899
- Publication date Mar 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR MAKING SEMICONDUCTOR-BASED INTEGRATED CIRCUITS
- Publication number 20250093765
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YU-HAO CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPC METHOD AND MASK MANUFACTURING METHOD INCLUDING OPC METHOD
- Publication number 20250076749
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Yeojin NA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS
- Publication number 20250068051
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OV...
- Publication number 20250068053
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LA...
- Publication number 20250068052
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM FOR GENERATING L...
- Publication number 20250044678
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- CHUN-YAO KU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE WITH DEEP TRENCH ISOLATION MASK LAYOUT
- Publication number 20250048712
- Publication date Feb 6, 2025
- SK keyfoundry Inc.
- Yang Beom KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING ME...
- Publication number 20250036022
- Publication date Jan 30, 2025
- Samsung Electronics Co., Ltd.
- Sanghwa Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS...
- Publication number 20250028235
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Heungsuk OH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250020993
- Publication date Jan 16, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION M...
- Publication number 20250004361
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Woo-Yong Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks having proximity correction features Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Integrated circuit layout generation method

Method for forming photomask

Semiconductor manufacturing apparatus and semiconductor manufacturi...

Photomask and method for manufacturing photomask and semiconductor...

Methods and systems for reticle enhancement technology of a design...

Photolithographic mask optimization method and system without borde...

Semiconductor device having power rail with non-linear edge

Optimization using a non-uniform illumination intensity profile

Chip deviation correction method for maskless exposure machine

Pattern layout and the forming method thereof

Lithography and method of fabricating semiconductor device using th...

Optical imaging method, device and system for photolithography system

Mask design method and storage medium thereof

Method of manufacturing photo masks

Method and system for reticle enhancement technology

Full-chip cell critical dimension correction method and method of m...

Pattern decomposition lithography techniques

Method of manufacturing integrated circuit

Parallel mask rule checking on evolving mask shapes in optical prox...

Inverse lithography and machine learning for mask synthesis

Optical proximity correction and photomasks

Methods and systems for reticle enhancement technology of a design...

Method and system for determining a charged particle beam exposure...

Enforcing mask synthesis consistency across random areas of integra...

Method for manufacturing semiconductor mark, and semiconductor mark

Phase shifter circuit, phase shifter layout and method of forming t...

Method for correcting mask pattern, apparatus for correcting mask p...

Optical proximity correction method and method of fabricating a sem...

Optical proximity correction method and mask manufacturing method o...

Semiconductor device with deep trench isolation mask layout

Patents Applicationslast 30 patents

METHOD OF EXTRACTING SUB-RESOLUTION ASSIST FEATURE (SRAF) PRINTING...

DEVICE FOR OPTIMIZING SOURCE MASK AND LITHOGRAPHY SYSTEM INCLUDING...

METHOD FOR OPTIMIZING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...

SEMICONDUCTOR TEST STRUCTURE GENERATION BASED ON LITHOGRAPHIC SIMUL...

REUSE OF RESOLUTION ENHANCEMENT TECHNIQUE (RET) DATA IN RET PROCESS...

FULL-SHOT LAYOUT CORRECTION METHOD AND MASK MANUFACTURING METHOD IN...

METHOD OF MANUFACTURING INTEGRATED CIRCUIT

LITHOGRAPHY SIMULATION METHOD AND OPTICAL PROXIMITY EFFECT CORRECTI...

LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

PHASE SHIFTER CIRCUIT, PHASE SHIFTER LAYOUT AND METHOD OF FORMING T...

METHOD, SYSTEM AND ELECTRONIC APPARATUS FOR MASK FEATURE OPTIMIZATION

SYSTEMS AND METHODS FOR PROXIMITY CORRECTION FOR LITHO-ETCHING-LITH...

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF MANUFACTURING MAS...

DESIGN OF CURVED MASK LAYERS BASED ON LEVELSET FUNCTIONS

OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT

TRANSMISSION GATE MANUFACTURING METHOD

MASK OPTIMIZATION PREFERENTIALLY ACCOUNTING FOR OVERLAP REGIONS

METHODS FOR MAKING SEMICONDUCTOR-BASED INTEGRATED CIRCUITS

OPC METHOD AND MASK MANUFACTURING METHOD INCLUDING OPC METHOD

MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS

MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OV...

MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LA...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM FOR GENERATING L...

SEMICONDUCTOR DEVICE WITH DEEP TRENCH ISOLATION MASK LAYOUT

OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING ME...

OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS...

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION M...