Masks having proximity correction features Preparation thereof

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G03F1/36

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/36Masks having proximity correction features Preparation thereof

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor mark, and semiconductor mark
- Patent number 12,230,584
- Issue date Feb 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chuang Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shifter circuit, phase shifter layout and method of forming t...
- Patent number 12,229,488
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsien Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting mask pattern, apparatus for correcting mask p...
- Patent number 12,216,979
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuping Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and method of fabricating a sem...
- Patent number 12,210,290
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and mask manufacturing method o...
- Patent number 12,204,241
- Issue date Jan 21, 2025
- Samsung Electronics Co., Ltd.
- Kangmin Jung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device with deep trench isolation mask layout
- Patent number 12,206,002
- Issue date Jan 21, 2025
- SK keyfoundry Inc.
- Yang Beom Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for making semiconductor-based integrated circuits
- Patent number 12,197,123
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yu-Hao Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compensation method and system for exposure alignment
- Patent number 12,197,122
- Issue date Jan 14, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Sheng'an Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask synthesis using tensor-based computing platforms
- Patent number 12,181,793
- Issue date Dec 31, 2024
- Synopsys, Inc.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and method of manufacturing ext...
- Patent number 12,181,792
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Narak Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmission gate structure
- Patent number 12,169,679
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Lun Chien
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask correction method, mask correction device for double patternin...
- Patent number 12,147,155
- Issue date Nov 19, 2024
- United Microelectronics Corp.
- Min-Cheng Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask and manufacturing method of semiconductor device
- Patent number 12,147,157
- Issue date Nov 19, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a semiconductor layout and a semiconductor st...
- Patent number 12,147,156
- Issue date Nov 19, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Random weight initialization of non-volatile memory array
- Patent number 12,135,497
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Cheng Chi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing optical proximity correction and method of ma...
- Patent number 12,111,567
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Na-rak Choi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transition cells for advanced technology processes
- Patent number 12,106,031
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Hsu Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask topology optimization method and system for surface plasmon ne...
- Patent number 12,092,960
- Issue date Sep 17, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for inverse optical proximity correction of super-resolution...
- Patent number 12,085,846
- Issue date Sep 10, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout correction method
- Patent number 12,078,924
- Issue date Sep 3, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Tingting Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
IC device layout method
- Patent number 12,079,559
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor structure, device, and method
- Patent number 12,067,341
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting semiconductor mask pattern and semiconductor...
- Patent number 12,055,849
- Issue date Aug 6, 2024
- United Microelectronics Corp.
- Sheng-Lun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of preparing photo mask data and manufacturing a photo mask
- Patent number 12,056,431
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Zhiru Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming mask including curvilinear shape and method of fo...
- Patent number 12,044,961
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Power rail with non-linear edge
- Patent number 12,019,969
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Chan Yang
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM FOR GENERATING L...
- Publication number 20250044678
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- CHUN-YAO KU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE WITH DEEP TRENCH ISOLATION MASK LAYOUT
- Publication number 20250048712
- Publication date Feb 6, 2025
- SK keyfoundry Inc.
- Yang Beom KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING ME...
- Publication number 20250036022
- Publication date Jan 30, 2025
- Samsung Electronics Co., Ltd.
- Sanghwa Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS...
- Publication number 20250028235
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Heungsuk OH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20250020993
- Publication date Jan 16, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION M...
- Publication number 20250004361
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Woo-Yong Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK
- Publication number 20240427229
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Katsuyoshi KODERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PHOTOMASK, LAYOUT PATTERN AND SYSTEM FOR PATTERNI...
- Publication number 20240427230
- Publication date Dec 26, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Joey Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND MASK MANUFACTURING METHOD B...
- Publication number 20240427231
- Publication date Dec 26, 2024
- Samsung Electronics Co., Ltd.
- Byungje Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...
- Publication number 20240419084
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- HEUNGSUK OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
- Publication number 20240413024
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Sangchul YEO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20240402587
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Joong Un Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20240402588
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Young-Ah KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
- Publication number 20240370635
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IC DEVICE
- Publication number 20240370628
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION
- Publication number 20240369940
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSITION CELLS FOR ADVANCED TECHNOLOGY PROCESSES
- Publication number 20240370634
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Hsu CHUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LAYOUT CORRECTION METHOD AND MASK MANUFACTURING METHOD USING THE SAME
- Publication number 20240362395
- Publication date Oct 31, 2024
- Samsung Electronics Co., Ltd.
- Yangwoo Heo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK
- Publication number 20240362396
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zhiru YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...
- Publication number 20240353749
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20240353748
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul YEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN METHOD OF PHOTOMASK STRUCTURE
- Publication number 20240337920
- Publication date Oct 10, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Kuei Yu Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEV...
- Publication number 20240329518
- Publication date Oct 3, 2024
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCOTR DEVICE HAVING POWER RAIL WITH NON-LINEAR EDGE
- Publication number 20240330564
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Chan YANG
- G06 - COMPUTING CALCULATING COUNTING

Masks having proximity correction features Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for manufacturing semiconductor mark, and semiconductor mark

Phase shifter circuit, phase shifter layout and method of forming t...

Method for correcting mask pattern, apparatus for correcting mask p...

Optical proximity correction method and method of fabricating a sem...

Optical proximity correction method and mask manufacturing method o...

Semiconductor device with deep trench isolation mask layout

Methods for making semiconductor-based integrated circuits

Compensation method and system for exposure alignment

Mask synthesis using tensor-based computing platforms

Optical proximity correction method and method of manufacturing ext...

Transmission gate structure

Method of manufacturing semiconductor devices

Mask correction method, mask correction device for double patternin...

Photomask and manufacturing method of semiconductor device

Method of fabricating a semiconductor layout and a semiconductor st...

Random weight initialization of non-volatile memory array

Mask defect prevention

Method for performing optical proximity correction and method of ma...

Transition cells for advanced technology processes

Mask topology optimization method and system for surface plasmon ne...

Method for inverse optical proximity correction of super-resolution...

Layout correction method

IC device layout method

Semiconductor structure, device, and method

Method for correcting semiconductor mask pattern and semiconductor...

Methods of preparing photo mask data and manufacturing a photo mask

Method of forming mask including curvilinear shape and method of fo...

Method of manufacturing photo masks

Method for reticle enhancement technology of a design pattern to be...

Power rail with non-linear edge

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD AND NON-TRANSITORY COMPUTER-READABLE MEDIUM FOR GENERATING L...

SEMICONDUCTOR DEVICE WITH DEEP TRENCH ISOLATION MASK LAYOUT

OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND MASK MANUFACTURING ME...

OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS...

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION M...

MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK

METHOD OF FORMING PHOTOMASK, LAYOUT PATTERN AND SYSTEM FOR PATTERNI...

OPTICAL PROXIMITY CORRECTION METHOD AND MASK MANUFACTURING METHOD B...

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...

PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD

METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...

METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...

MASK DEFECT PREVENTION

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD

IC DEVICE

PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION

TRANSITION CELLS FOR ADVANCED TECHNOLOGY PROCESSES

LAYOUT CORRECTION METHOD AND MASK MANUFACTURING METHOD USING THE SAME

METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK

METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...

METHOD OF MANUFACTURING PHOTO MASKS

DESIGN METHOD OF PHOTOMASK STRUCTURE

PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEV...

SEMICONDUCOTR DEVICE HAVING POWER RAIL WITH NON-LINEAR EDGE