Masks having proximity correction features Preparation thereof

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CPC
G03F1/36

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/36Masks having proximity correction features Preparation thereof

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Transmission gate structure
- Patent number 12,169,679
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Lun Chien
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask correction method, mask correction device for double patternin...
- Patent number 12,147,155
- Issue date Nov 19, 2024
- United Microelectronics Corp.
- Min-Cheng Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask and manufacturing method of semiconductor device
- Patent number 12,147,157
- Issue date Nov 19, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a semiconductor layout and a semiconductor st...
- Patent number 12,147,156
- Issue date Nov 19, 2024
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Random weight initialization of non-volatile memory array
- Patent number 12,135,497
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Cheng Chi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing optical proximity correction and method of ma...
- Patent number 12,111,567
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Na-rak Choi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transition cells for advanced technology processes
- Patent number 12,106,031
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Hsu Chuang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask topology optimization method and system for surface plasmon ne...
- Patent number 12,092,960
- Issue date Sep 17, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for inverse optical proximity correction of super-resolution...
- Patent number 12,085,846
- Issue date Sep 10, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout correction method
- Patent number 12,078,924
- Issue date Sep 3, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Tingting Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
IC device layout method
- Patent number 12,079,559
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor structure, device, and method
- Patent number 12,067,341
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting semiconductor mask pattern and semiconductor...
- Patent number 12,055,849
- Issue date Aug 6, 2024
- United Microelectronics Corp.
- Sheng-Lun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of preparing photo mask data and manufacturing a photo mask
- Patent number 12,056,431
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Zhiru Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming mask including curvilinear shape and method of fo...
- Patent number 12,044,961
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 12,019,973
- Issue date Jun 25, 2024
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Power rail with non-linear edge
- Patent number 12,019,969
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Chan Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Geometric mask rule check with favorable and unfavorable zones
- Patent number 12,019,974
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 11,995,391
- Issue date May 28, 2024
- Samsung Electronics Co., Ltd.
- Yongdeok Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Isolation circuit between power domains
- Patent number 11,995,390
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Yu Lu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of modeling a mask having patterns with arbitrary angles
- Patent number 11,994,796
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity effect correction method and apparatus, device an...
- Patent number 11,988,954
- Issue date May 21, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jin Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modifying segments and vertices of mask shapes for mask synthesis
- Patent number 11,977,324
- Issue date May 7, 2024
- Synopsys, Inc.
- Yung-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition method
- Patent number 11,977,335
- Issue date May 7, 2024
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 11,977,327
- Issue date May 7, 2024
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for modeling of a design in reticle enhancement technology
- Patent number 11,972,187
- Issue date Apr 30, 2024
- D2S, Inc.
- P. Jeffrey Ungar
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...
- Publication number 20240419084
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- HEUNGSUK OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
- Publication number 20240413024
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Sangchul YEO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20240402587
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Joong Un Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20240402588
- Publication date Dec 5, 2024
- Samsung Electronics Co., Ltd.
- Young-Ah KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
- Publication number 20240370635
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION
- Publication number 20240369940
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IC DEVICE
- Publication number 20240370628
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRANSITION CELLS FOR ADVANCED TECHNOLOGY PROCESSES
- Publication number 20240370634
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Hsu CHUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LAYOUT CORRECTION METHOD AND MASK MANUFACTURING METHOD USING THE SAME
- Publication number 20240362395
- Publication date Oct 31, 2024
- Samsung Electronics Co., Ltd.
- Yangwoo Heo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK
- Publication number 20240362396
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Zhiru YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...
- Publication number 20240353749
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20240353748
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul YEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN METHOD OF PHOTOMASK STRUCTURE
- Publication number 20240337920
- Publication date Oct 10, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Kuei Yu Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEV...
- Publication number 20240329518
- Publication date Oct 3, 2024
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCOTR DEVICE HAVING POWER RAIL WITH NON-LINEAR EDGE
- Publication number 20240330564
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Chan YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS PROXIMITY CORRECTION METHOD BASED ON MACHINE LEARNING, OPTI...
- Publication number 20240319580
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Jaeyong Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMAL SCANNER MAPS AND FIELD LAYOUTS
- Publication number 20240319579
- Publication date Sep 26, 2024
- International Business Machines Corporation
- Allen Gabor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...
- Publication number 20240319581
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GEOMETRIC MASK RULE CHECK WITH FAVORABLE AND UNFAVORABLE ZONES
- Publication number 20240311545
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR GENERATING MASK PATTERN
- Publication number 20240310718
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Ayman HAMOUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20240295808
- Publication date Sep 5, 2024
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...
- Publication number 20240289532
- Publication date Aug 29, 2024
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING LOCALIZED IMAGE PREDICTION ERRORS TO IMPROVE A MACHINE...
- Publication number 20240288764
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Ayman HAMOUDA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHODS OF MANUFACTU...
- Publication number 20240280891
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- Heejun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOID...
- Publication number 20240280892
- Publication date Aug 22, 2024
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING ROUNDED CONTOURS FOR LITHOGRAPHY RELATED PATTERNS
- Publication number 20240272543
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Wen LYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks having proximity correction features Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Transmission gate structure

Method of manufacturing semiconductor devices

Mask correction method, mask correction device for double patternin...

Photomask and manufacturing method of semiconductor device

Method of fabricating a semiconductor layout and a semiconductor st...

Random weight initialization of non-volatile memory array

Mask defect prevention

Method for performing optical proximity correction and method of ma...

Transition cells for advanced technology processes

Mask topology optimization method and system for surface plasmon ne...

Method for inverse optical proximity correction of super-resolution...

Layout correction method

IC device layout method

Semiconductor structure, device, and method

Method for correcting semiconductor mask pattern and semiconductor...

Methods of preparing photo mask data and manufacturing a photo mask

Method of forming mask including curvilinear shape and method of fo...

Method of manufacturing photo masks

Method for reticle enhancement technology of a design pattern to be...

Power rail with non-linear edge

Geometric mask rule check with favorable and unfavorable zones

Etch processing system having reflective endpoint detection

Semiconductor device and method of fabricating the same

Isolation circuit between power domains

Method of modeling a mask having patterns with arbitrary angles

Optical proximity effect correction method and apparatus, device an...

Modifying segments and vertices of mask shapes for mask synthesis

Pattern decomposition method

Enforcing mask synthesis consistency across random areas of integra...

Methods for modeling of a design in reticle enhancement technology

Patents Applicationslast 30 patents

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...

PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD

METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...

METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDU...

MASK DEFECT PREVENTION

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD

PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION

IC DEVICE

TRANSITION CELLS FOR ADVANCED TECHNOLOGY PROCESSES

LAYOUT CORRECTION METHOD AND MASK MANUFACTURING METHOD USING THE SAME

METHODS OF PREPARING PHOTO MASK DATA AND MANUFACTURING A PHOTO MASK

METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...

METHOD OF MANUFACTURING PHOTO MASKS

DESIGN METHOD OF PHOTOMASK STRUCTURE

PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEV...

SEMICONDUCOTR DEVICE HAVING POWER RAIL WITH NON-LINEAR EDGE

PROCESS PROXIMITY CORRECTION METHOD BASED ON MACHINE LEARNING, OPTI...

OPTIMAL SCANNER MAPS AND FIELD LAYOUTS

MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...

GEOMETRIC MASK RULE CHECK WITH FAVORABLE AND UNFAVORABLE ZONES

METHOD FOR GENERATING MASK PATTERN

PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN...

DETERMINING LOCALIZED IMAGE PREDICTION ERRORS TO IMPROVE A MACHINE...

OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHODS OF MANUFACTU...

METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOID...

DETERMINING ROUNDED CONTOURS FOR LITHOGRAPHY RELATED PATTERNS