Whitcomb, Selective, Anisotropic Etching of SiO.sub.2 and PSG, May 9-14, 1982, Conference Abstract, Electrochemical Society, Montreal, Canada, pp. 339-340. |
7th Symposium on Dry Process, Institute of Electrical Engineers, Oct. 1985, "Si Surface Treatment Using Deep UV Irradiation". |
The Dictionary of Super-LSI, Science Form Company, Ltd., Mar. 31, 1988, p. 677 (English language translation). |
Appl. Phys. Lett. 46 (6), 15 Mar. 1985, p. 589. |
"The Removal Method of Carbon Contamination by R.I.E.", Extended Abstracts (The 48th Autumn Meeting, 1987) of The Japan Society of Applied Physics, No. 2, 19a-M-7, p. 562. |