Claims
- 1. A method of electronic processing of an imagewise exposed photoconductive material imaging element employing pulsed radiation and radio frequency photoconductivity apparatus having a sample capacitor with a gap, comprising the steps of:
a) placing the imagewise exposed photoconductive material imaging element in an electromagnetic field adjacent the sample capacitor; b) scanning the element through the gap in the sample capacitor with a pulsed, focused beam of radiation; c) directly measuring the photoelectron response of the element and recording the resulting signals from the radio frequency photoconductivity apparatus; and d) advancing the element past the capacitor and repeating steps b) and c); wherein the photoconductive material imaging element comprises photoconductive particles which contain deep electron trapping agents which in an unfilled state effectively decrease the photoconductivity of the photoconductor particles, and wherein imagewise exposure of the photoconductive particles of the element fill deep electron traps and increase the photoconductivity of exposed particles relative to unexposed particles, such that increased imagewise exposure in the photoconductive material results in an increased photoconductivity signal obtained in step c).
- 2. The method claimed in claim 1, wherein the photoconductive material imaging element includes a planar support and a silver halide emulsion imaging layer comprising silver halide grains which have not been chemically sensitized to optimize formation of latent image Agn0 centers upon imagewise exposure and which are doped with a deep electron trapping agent dopant.
- 3. The method of claim 2, wherein the silver halide grains comprise tabular grains with the long dimensions of the tabular grains primarily oriented parallel to the plane of the support, and the element is arranged with respect to the capacitor in a way such that the electromagnetic field lines generated by the capacitor are parallel to the plane of the support.
- 4. The method of claim 3, wherein the average grain size equivalent circular diameter of the tabular grains is at least 2 μm.
- 5. The method of claim 3, wherein the average grain size equivalent circular diameter of the tabular grains is at least 3 μm.
- 6. The method of claim 3, wherein the average grain size equivalent circular diameter of the tabular grains is at least 4 μm.
- 7. The method of claim 3, wherein the capacitor comprises plates provided with a slot through which the imaging element is located.
- 8. The method of claim 7, wherein the capacitor plates are coplanar.
- 9. The method of claim 2, wherein the silver halide grains of the imaging layer are doped with a K3RhCl6, (NH4)2Rh(Cl5)H2O, K2RuCl6, K2Ru(NO)Br5, K2Ru(NS)Br5, K2OsCl6, Cs2Os(NO)Cl5, or K2Os(NS)Cl5 deep electron trapping agent dopant.
- 10. The method of claim 2, wherein the silver halide grains of the imaging layer are doped with RhCl6−3 complex.
- 11. The method of claim 2, wherein the photoconductive material element comprises a plurality of layers of photoconductive material sensitive to a plurality of wavelengths of light, and wherein the step of scanning the element includes separately scanning the element with corresponding wavelengths of light.
- 12. The method of claim 11, wherein the photoconductive material element is sensitive to red, green, and blue wavelengths of light, and the element includes a film base, a red and green sensitive emulsion layer over the film base, a yellow filter layer over the red and green sensitive emulsion layer, and a blue sensitive emulsion layer over the yellow filter layer.
- 13. The method of claim 2, wherein the photoconductive material element further comprises a silver ion complexing agent present in reactive association with the silver halide grains at a concentration of at least 0.5 mmol per mole of silver halide for minimizing Agn0 latent image formation during imagewise exposure.
- 14. The method of claim 2, wherein the photoelectron response is measured at ambient temperature.
- 15. The method of claim 1, wherein the capacitor comprises plates provided with a slot through which the imaging element is located.
- 16. The method of claim 15, wherein the capacitor plates are coplanar.
- 17. The method of claim 1, wherein the photoconductive material element comprises a plurality of layers of photoconductive material sensitive to a plurality of wavelengths of light, and wherein the step of scanning the element includes separately scanning the element with corresponding wavelengths of light.
- 18. The method of claim 1, wherein the photoelectron response is measured at ambient temperature.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] Reference is made to copending, commonly assigned, concurrently filed U.S. Ser. No. ______ (Kodak Docket No. 83856), the disclosure of which is incorporated by reference herein in its entirety, which is directed towards silver halide imaging elements which may be useful in the method of the present invention.