“Shipley Claims Porous Low K Dielectric Breakthrough,” Press Release Mar. 17, 2003. |
R.D. Miller et al., “Phase-Separated Inorganic-Organic Hybrids for Microelectronic Applications,” MRS Bulletin, Oct. 1997, pp. 44-48. |
Jin et al., “Nanoporous Silica as an Ultralow-k Dielectric,” MRS Bulletin, Oct. 1997, pp. 39-42. |
Cleemput et al., “Dielectric Films With Low Dielectric Constants,” Application Ser. No.: 09/727,796, filed Nov. 30, 2000. |
Asoh et al., “Fabrication of Ideally Ordered Anodic Porous Alumina with 63 nm Hole Periodocity Using Sulfuric Acid,” J. Vac. Sci. Technol. B 19(2), Mar./Apr. 2001, pp. 569-572. |
Asoh et al., “Conditions for Fabrication of Ideally Ordered Anodic Porous Alumina Using Pretextured AI,” Journal of the Electrochemica Society, 148 (4) B152-B156 (2001) pp. B152-B156. |
Holland et al., “Nonlithographic Technique for the Production of Large Area High Density Gridded Field Sources,” J. Vac. Sci. Technol. B 17(2), Mar./Apr. 1999, pp. 580-582. |
Masuda et al. “Highly Ordered Nanochannel-Array Architecture in Anodic Alumina,” App. Phys. Lett. 71(19), Nov. 1997, pp. 2770-2772. |
Clube et al., White Paper from Holotronic Technologies SA; downloaded from www.hdotronic.com/whitepaper/fine-patt.pdf on Mar. 12, 2002. |
Meli et al., “Self-Assembled Masks for the Transfer of Nanometer-Scale Patterns into Surfaces: Characterization by AFM and LFM” Nano Letters, vol. 2, No. 2, 2002, 131-135. |