TREA

the air gaps being formed by pores in the dielectric

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  • CPC
  • H01L2221/1047
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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00

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H01L2221/1047the air gaps being formed by pores in the dielectric
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