Alternating PSM

Industry

CPC
G03F1/30

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/30Alternating PSM

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Phase shift mask for EUV lithography and manufacturing method for t...
- Patent number 12,025,912
- Issue date Jul 2, 2024
- SK hynix Inc.
- Tae Joong Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making semiconductor device and semiconductor device
- Patent number 11,763,061
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alternating phase shift mask
- Patent number 11,635,679
- Issue date Apr 25, 2023
- Seagate Technology LLC
- Dan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Critical dimension (CD) uniformity of photoresist island patterns u...
- Patent number 11,573,494
- Issue date Feb 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jesmin Haq
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device
- Patent number 11,443,093
- Issue date Sep 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography method and apparatus
- Patent number 11,429,027
- Issue date Aug 30, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and electronic component manufacturing method
- Patent number 11,385,537
- Issue date Jul 12, 2022
- Beijing Boe Display Technology Co., Ltd.
- Xiaoxiang Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid power rail structure
- Patent number 11,133,254
- Issue date Sep 28, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-An Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Memory system having write assist circuit including memory-adapted...
- Patent number 10,872,659
- Issue date Dec 22, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yangsyu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alternating phase shift mask
- Patent number 10,859,903
- Issue date Dec 8, 2020
- Seagate Technology LLC
- Dan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Critical dimension (CD) uniformity of photoresist island patterns u...
- Patent number 10,831,104
- Issue date Nov 10, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jesmin Haq
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and fabrication method therefor
- Patent number 10,816,891
- Issue date Oct 27, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device having write assist circuit including memory-adapted transis...
- Patent number 10,553,275
- Issue date Feb 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yangsyu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Critical dimension (CD) uniformity of photoresist island patterns u...
- Patent number 10,520,818
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jesmin Haq
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for quickly establishing lithography process condition by a...
- Patent number 10,409,170
- Issue date Sep 10, 2019
- Shanghai Huali Microelectronics Corporation
- Qiaoli Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,394,118
- Issue date Aug 27, 2019
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method of manufacturing phase shift mask, phase shift m...
- Patent number 10,088,744
- Issue date Oct 2, 2018
- Hoya Corporation
- Hiroaki Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,048,580
- Issue date Aug 14, 2018
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing mask blank and transfer mask
- Patent number 10,042,247
- Issue date Aug 7, 2018
- Hoya Corporation
- Takahiro Hiromatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method of forming patterns using the same
- Patent number 9,977,324
- Issue date May 22, 2018
- Samsung Display Co., Ltd.
- DongEon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for forming the same
- Patent number 9,651,857
- Issue date May 16, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,541,823
- Issue date Jan 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, process for production of photomask, and chromium-...
- Patent number 9,488,907
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Transmission balancing for phase shift mask with a trim mask
- Patent number 9,482,965
- Issue date Nov 1, 2016
- Seagate Technology LLC
- Dan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor fabrication utilizing grating and trim masks
- Patent number 9,436,092
- Issue date Sep 6, 2016
- Newport Fab, LLC
- George Talor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, method of forming asymmetric pattern, method of m...
- Patent number 9,390,934
- Issue date Jul 12, 2016
- Hitachi High-Technologies Corporation
- Kazuyuki Kakuta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmission balancing for phase shift mask with a trim mask
- Patent number 9,341,939
- Issue date May 17, 2016
- Seagate Technology LLC
- Dan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for manufacturing photomask, and method for...
- Patent number 9,188,852
- Issue date Nov 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask
- Patent number 9,091,931
- Issue date Jul 28, 2015
- Toppan Printing Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240337919
- Publication date Oct 10, 2024
- HOYA CORPORATION
- Kenta TSUKAGOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR T...
- Publication number 20240310717
- Publication date Sep 19, 2024
- SK HYNIX INC.
- Tae Joong HA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR T...
- Publication number 20220397818
- Publication date Dec 15, 2022
- SK HYNIX INC.
- Tae Joong HA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND APPARATUS
- Publication number 20220365438
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Critical Dimension (CD) Uniformity of Photoresist Island Patterns U...
- Publication number 20210055659
- Publication date Feb 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jesmin Haq
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Critical Dimension (CD) Uniformity of Photoresist Island Patterns U...
- Publication number 20200142313
- Publication date May 7, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jesmin Haq
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20190302604
- Publication date Oct 3, 2019
- HOYA CORPORATION
- Yasutaka HORIGOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20180321582
- Publication date Nov 8, 2018
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR QUICKLY ESTABLISHING LITHOGRAPHY PROCESS CONDITION BY A...
- Publication number 20180307143
- Publication date Oct 25, 2018
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Qiaoli Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK
- Publication number 20170285460
- Publication date Oct 5, 2017
- HOYA CORPORATION
- Takahiro HIROMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME
- Publication number 20170192348
- Publication date Jul 6, 2017
- SAMSUNG DISPLAY CO., LTD.
- DongEon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20170075213
- Publication date Mar 16, 2017
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING PHASE SHIFT MASK, PHASE SHIFT M...
- Publication number 20170068155
- Publication date Mar 9, 2017
- HOYA CORPORATION
- Hiroaki SHISHIDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK WITH REDUCED SHADO...
- Publication number 20170052441
- Publication date Feb 23, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSMISSION BALANCING FOR PHASE SHIFT MASK WITH A TRIM MASK
- Publication number 20160124299
- Publication date May 5, 2016
- SEAGATE TECHNOLOGY LLC
- Dan Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD FOR FORMING THE SAME
- Publication number 20150177612
- Publication date Jun 25, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK, METHOD OF FORMING ASYMMETRIC PATTERN, METHOD OF M...
- Publication number 20140302679
- Publication date Oct 9, 2014
- Hitachi High-Technologies Corporation
- Kazuyuki Kakuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESOLUTION ENHANCING TECHNOLOGY USING PHASE ASSIGNMENT BRIDGES
- Publication number 20140173534
- Publication date Jun 19, 2014
- Mentor Graphics Corporation
- Chih-Hsien Nail Tang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCING EDGE DIE REFLECTIVITY IN EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20140051015
- Publication date Feb 20, 2014
- International Business Machines Corporation
- Emily E. GALLAGHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomasks, Methods Of Forming A Photomask, And Methods Of Photolit...
- Publication number 20130323627
- Publication date Dec 5, 2013
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...
- Publication number 20130309601
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD FOR FORMING THE SAME
- Publication number 20130280644
- Publication date Oct 24, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Fabrication Utilizing Grating and Trim Masks
- Publication number 20130256844
- Publication date Oct 3, 2013
- NEWPORT FAB, LLC DBA JAZZ SEMICONDUCTOR
- George Talor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...
- Publication number 20130230796
- Publication date Sep 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS
- Publication number 20130130163
- Publication date May 23, 2013
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHO...
- Publication number 20130122428
- Publication date May 16, 2013
- SAMSUNG DISPLAY CO., LTD.
- Jong-Kwang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20120251930
- Publication date Oct 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yosuke Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK LAYOUT FORMATION
- Publication number 20120089953
- Publication date Apr 12, 2012
- INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD...
- Publication number 20120058421
- Publication date Mar 8, 2012
- Elpida Memory, Inc.
- Masahito HIROSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Alternating PSM

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Phase shift mask for EUV lithography and manufacturing method for t...

Method of making semiconductor device and semiconductor device

Alternating phase shift mask

Critical dimension (CD) uniformity of photoresist island patterns u...

Semiconductor device

Photolithography method and apparatus

Phase shift mask and electronic component manufacturing method

Hybrid power rail structure

Memory system having write assist circuit including memory-adapted...

Alternating phase shift mask

Critical dimension (CD) uniformity of photoresist island patterns u...

Photomask and fabrication method therefor

Photomask and methods for manufacturing and correcting photomask

Device having write assist circuit including memory-adapted transis...

Critical dimension (CD) uniformity of photoresist island patterns u...

Method for quickly establishing lithography process condition by a...

Photomask and methods for manufacturing and correcting photomask

Mask blank, method of manufacturing phase shift mask, phase shift m...

Photomask and methods for manufacturing and correcting photomask

Mask blank, method for manufacturing mask blank and transfer mask

Phase shift mask and method of forming patterns using the same

Mask and method for forming the same

Photomask blank

Photomask blank, process for production of photomask, and chromium-...

Transmission balancing for phase shift mask with a trim mask

Semiconductor fabrication utilizing grating and trim masks

Phase shift mask, method of forming asymmetric pattern, method of m...

Transmission balancing for phase shift mask with a trim mask

Photomask blank, method for manufacturing photomask, and method for...

Photomask blank and method for manufacturing photomask

Patents Applicationslast 30 patents

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR T...

PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR T...

PHOTOLITHOGRAPHY METHOD AND APPARATUS

Critical Dimension (CD) Uniformity of Photoresist Island Patterns U...

Critical Dimension (CD) Uniformity of Photoresist Island Patterns U...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

METHOD FOR QUICKLY ESTABLISHING LITHOGRAPHY PROCESS CONDITION BY A...

MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK AND TRANSFER MASK

PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

MASK BLANK, METHOD OF MANUFACTURING PHASE SHIFT MASK, PHASE SHIFT M...

EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK WITH REDUCED SHADO...

TRANSMISSION BALANCING FOR PHASE SHIFT MASK WITH A TRIM MASK

MASK AND METHOD FOR FORMING THE SAME

PHASE SHIFT MASK, METHOD OF FORMING ASYMMETRIC PATTERN, METHOD OF M...

RESOLUTION ENHANCING TECHNOLOGY USING PHASE ASSIGNMENT BRIDGES

REDUCING EDGE DIE REFLECTIVITY IN EXTREME ULTRAVIOLET LITHOGRAPHY

Photomasks, Methods Of Forming A Photomask, And Methods Of Photolit...

PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR...

MASK AND METHOD FOR FORMING THE SAME

Semiconductor Fabrication Utilizing Grating and Trim Masks

PHOTOMASK BLANK, PROCESS FOR PRODUCTION OF PHOTOMASK, AND CHROMIUM-...

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHO...

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK

MASK LAYOUT FORMATION

PHASE SHIFT MASK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD...