Claims
- 1. A method of forming a flexible circuit board for ink jetting, comprising of:
providing an insulation tape; forming conductive traces on the insulation tape; and after the conductive traces are formed on the insulation tape, forming a photo-polymer layer that fills between the conductive traces, wherein the photo-polymer layer has holes formed therein so that parts of the conductive traces are not covered by the photo-polymer layer to form a plurality of uncovered contacts that are exposed by the holes.
- 2. The method according to claim 1, wherein the insulation tape comprises a polymer film.
- 3. The method according to claim 2, wherein a material of the polymer film comprises at least one of polyimide (PI), Teflon, polyamide, polymethyl methacrylate, polycarbonate, polyester, and polyamide polyethylene-terephthalate copolymer.
- 4. The method according to claim 2, wherein a material of the polymer film is polyimide (PI).
- 5. The method according to claim 1, wherein the forming the conductive traces comprises of:
forming an adhesive layer on the insulation tape; adhering a conductive layer on the adhesive layer; and defining the pattern of the conductive layer to form the conductive traces.
- 6. The method according to claim 5, wherein a material of the conductive layer is copper.
- 7. The method according to claim 5, wherein a material of the conductive layer is gold.
- 8. The method according to claim 5, wherein a thickness of the conductive layer is about 10 μm to 50 μm.
- 9. The method according to claim 1, wherein the photo-polymer layer is formed by coating.
- 10. The method according to claim 1, wherein the photo-polymer layer is formed by one of screen printing, spray coating, curtain coating and roller coating.
- 11. The method according to claim 1, wherein the photo-polymer layer is made of solder mask.
- 12. The method according to claim 1, wherein the photo-polymer layer is made of polyimide.
- 13. The method according to claim 1, wherein the forming a photo-polymer layer comprises coating, exposing, developing and post-curing.
- 14. The method according to claim 13, wherein the photo-polymer layer is made of solder mask and the solder mask comprises a main agent and a hardener with a ratio of about 7:3.
- 15. The method according claim 13, wherein the exposing is performed with an exposure energy of about 280˜420 mJ/cm2.
- 16. The method according to claim 13, wherein the post-curing is performed at a hot air convention oven at about 150 ? for about 50 min.
Priority Claims (1)
Number |
Date |
Country |
Kind |
90109954 |
Apr 2001 |
TW |
|
Parent Case Info
[0001] This application is a continuation of application Ser. No. 10/128,354, filed Apr. 24, 2002, pending.
Continuations (1)
|
Number |
Date |
Country |
Parent |
10128354 |
Apr 2002 |
US |
Child |
10733199 |
Dec 2003 |
US |