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5162262 | Ajika et al. | Nov 1992 | |
5342652 | Foster et al. | Aug 1994 | |
5403779 | Joshi et al. | Apr 1995 | |
5418180 | Brown | May 1995 | |
5472912 | Miller | Dec 1995 | |
5565708 | Ohsaki et al. | Oct 1996 | |
5567483 | Foster et al. | Oct 1996 | |
5585673 | Joshi et al. | Dec 1996 | |
5593511 | Foster et al. | Jan 1997 | |
5608247 | Brown | Mar 1997 | |
5610106 | Foster et al. | Mar 1997 | |
5614756 | Forouhi et al. | Mar 1997 | |
5654233 | Yu | Aug 1997 | |
5688382 | Besen et al. | Nov 1997 | |
5688718 | Shue | Nov 1997 | |
5723362 | Inoue et al. | Mar 1998 | |
5780356 | Kim | Jul 1998 | |
5789321 | Ohshita | Aug 1998 | |
5833817 | Tsai et al. | Nov 1998 | |
5851917 | Lee | Dec 1998 | |
5912508 | Iacoponi | Jun 1999 |
Entry |
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Danek et al., "Resistivity reduction and chemical stabilization of organometallic chemical vapor deposited titanium nitride rf plasma"; Appl. Phys. Lett. 68(7), Feb. 12, 1996 pp. 1015-1016. |