BRIEF DESCRIPTION OF THE DRAWINGS
The patent or application file contains at least one drawing executed in color. Copies of this patent or patent application publication with color drawing(s) will be provided by the Office upon request and payment of the necessary fee.
The subject invention is schematically shown in the drawing and will be described in the following with reference to the figures, in which:
FIG. 1 is a schematic representation of a system for detecting defects on wafers or disk-like substrates;
FIG. 2
a is a representation of the type of recording of the images or image data of a wafer;
FIG. 2 is a schematic plan view of a wafer;
FIG. 3 is a view of a wafer on a display of the system and for comparison a real recorded image of the wafer;
FIG. 4 is a view of the surface of the wafer wherein the difference to a threshold value has been formed; and
FIG. 5 is a false-color image of the surface of the wafer in a black and white representation.
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 shows a system 1 for detecting defects on wafers. System 1 comprises, for example, at least one cartridge element 3 for the semiconductor substrates or wafers. In a measuring unit 5, images or image data are recorded of the individual wafers. A transportation mechanism 9 is provided between cartridge element 3 for the semiconductor substrates or wafers and measuring unit 5. System 1 is surrounded by housing 11, wherein housing 11 defines a base 12. In system 1, further a computer 15 is incorporated for recording and processing images and image data of the individual measured wafers. System 1 is equipped with a display 13 and a keyboard 14. Keyboard 14 enables the user to input data for controlling the system or to input parameters for evaluating the image data of the individual wafers. A plurality of user interfaces are shown to the user on display 13.
FIG. 2
a shows a schematic representation of the manner in which the images and/or image data are detected from a wafer 16. Wafer 16 is placed on a stage 20 traversable within housing 11 in a first direction X and a second direction Y. The first and second directions X, Y are at right angles to each other. An image recorder 22 is provided above the surface 17 of wafer 16, wherein the field of view of image recorder 22 is smaller than the overall surface 17 of wafer 16. To be able to image the whole surface 17 of wafer 16 with the aid of image recorder 22, wafer 16 is scanned in a meandering fashion. The sequentially recorded image fields are then assembled to a total image of surface 17 of a wafer 16. This is also carried out by computer 15 provided in housing 11. For relative movement between stage 20 and image recorder 22, in the present exemplary embodiment, an X-Y-scanning stage is used, able to be traversed in the coordinate directions X and Y. Camera 22 is fixedly installed facing stage 20. On the other hand, stage 20 can of course also be fixedly installed while the image recorder 22 would then have to be moved across wafer 16 for imaging. A combination of the movement of image recorder 22, such as a camera, in one direction and of stage 20 in a direction vertical to it, is also possible. Wafer 16 is illuminated by an illumination device 23 for illuminating at least those portions on wafer 16 which correspond to the field of view of image recorder 22. Due to the concentrated illumination, which can also be pulsed with the aid of a flash lamp, imaging is also possible on the fly, i.e. wherein stage 20 or image recorder 22 are traversed without stopping for the imaging process. In this way a large wafer throughput is possible. It is of course also possible to stop the relative movement between stage 20 and image recorder 22 for each frame, and also to illuminate wafer 16 over its entire surface 17. Stage 20, image recorder 22 and illumination device 23 are controlled by computer 15. The frames can be stored by computer 15 in a memory 15a and retrieved from there as necessary.
FIG. 2
b is a plan view of a wafer 16 placed on a stage 20. Wafer 16 has a center point 25. Layers are applied to wafer 16, which are then structured in a further process step. A structured wafer comprises a great number of structured elements.
FIG. 3 is a view of a wafer 30 shown on display 13 of system 1 and for comparison the real recorded image 32 of wafer 30. For this purpose display 13 is essentially divided into a first area 34, a second area 36 and a third area 38. First area 34 shows the image of wafer 30 as it is recorded by camera 22. Second area 36 shows wafer 30 in a plan view, wherein areas of possible defects are indicated by circles or elliptical elements. In recorded image 32 of wafer 30, defects or areas with defects are not directly discernible. All that is discernible is a bright patch at a position 39 at the edge 37 of wafer 30, indicating a defect. Further it is possible to choose between four different representations of the recorded image of wafer 30 in first area 34. The front view of an image of wafer 30 can be shown and viewed on display 13 by means of a first tab 41. The user can switch over to a view of the back of wafer 30 by means of second tab 42 to view an image of the back of wafer 30. The user can select a color shift for the recorded image of wafer 30 by means of the third tab 43. A color representation of the signal-to-noise ratio of the surface of wafer 30 can be chosen by the user with the aid of a fourth tab 44.
In the third area 38, the user of system 1 can obtain alphanumeric information on the possible defects on the surface of wafer 30.
FIG. 4 is a view of the surface of wafer 30, wherein the difference to a threshold value has been formed. In first area 34 a color image of the surface of wafer 30 is shown to the user. The colors for display are taken from a palette 50 also shown in the first area 34 next to the colored resulting image 49 of wafer 30. In the embodiment shown palette 50 is graded from red 51 to white 52 to green 53. Palette 50 therefore facilitates a visualization of the signal-to-noise ratio. The color red 51 indicates that the threshold value has been exceeded. The color white 52 indicates that the threshold value has not been exceeded. The color green 53 indicates that the area or measuring value in question is quite remote from the chosen threshold value.
The color representation using the palette is only one of various possibilities of representation. It is understood that palette 50 described in the present embodiment having the colors red, white and green should not be construed as limiting the invention. To give an illustration of the measuring values obtained by camera 22 from the surface of wafer 30 a color value is associated with each measuring value. This color representation is visually shown to the user in first area 34 of the display.
The resulting image is now generated by associating a certain color value with an area on the surface of the disk-like object in which the optical measuring values are within a predetermined interval. This is done over the entire surface of the disk-like substrate. The result is an image having the same size as the recorded image. By suitably choosing the palette 50, i.e. the association rule between each measuring value and color, illustrative representations of the determined optical measuring values can be obtained which can be promptly and quickly visually recognized by a user.
In the embodiment shown in FIG. 4 the difference between a measuring value and the threshold value is used as the measuring value. As mentioned above, a gradation from green to white to red is used as the palette, so that the signal-to-noise ratio can be very well visualized. Green areas 55 arise where the measuring value is remote from the threshold value, red areas 56 indicate regions on the surface of wafer 30, where the measuring value exceeds the threshold values or the threshold. With this kind of representation the determination of threshold values is simplified and it is not necessary to incrementally change the thresholds before errors can be detected.
Where the measuring method according to the present invention is sufficiently sensitive that defects are detected which are not easily discernible in the optically recorded image, feedback to the recorded image is important. Since the resulting image and the recorded image have the same size it is easy to switch over between the two views and so to evaluate the measurement.
FIG. 5 shows a false-color image of the surface of wafer 30 in black and white. In analogy to palette 40 in FIG. 4, palette 60 in FIG. 5 shows a change of black and white symbols. The symbols indicating that the threshold value is exceeded are located in top area 61 of palette 60. In the middle area 62 of palette 60, there is no exceeded threshold value, and the areas of the disk-like object have no defects. In the bottom area 63 of palette 60, the symbols indicate that the measuring value is remote from the threshold value. In analogy to palette 60, in resulting image 64 of wafer 30, the areas are indicated with the corresponding symbols, so that a user can easily recognize the areas in which there is a possible defect.