Number | Date | Country | Kind |
---|---|---|---|
3103177 | Jan 1981 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
4208241 | Harshbarger et al. | Jun 1980 | |
4214946 | Forget et al. | Jul 1980 |
Entry |
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H. Mader, "Anisotropic Plasma Etching of Polysilicon with CF.sub.4 ", ECS Spring Meeting (1980) pp. 274-276. |
C. J. Mogob et al., "Anisotropic Plasma Etching of Polysilicon", J. Voc. Sci. Technol., vol. 17 (May/Jun. 1980), pp. 721-730. |
R. A. Gdula, "SF.sub.6 RIE of Polysilicon", ECS Fall Meeting (1979) pp. 1524-1526. |
N. Endo et al., "1 .mu.m MOS Process Using Inisotropic Dry Etching", IEEE Trans-Actions on Electron Devices, vol. ED-27 (Aug., 1980) pp. 1346-1351. |