Number | Name | Date | Kind |
---|---|---|---|
5242770 | Chen et al. | Sep 1993 | A |
5288569 | Lin | Feb 1994 | A |
5354632 | Dao et al. | Oct 1994 | A |
5670281 | Dai | Sep 1997 | A |
5786113 | Hashimoto et al. | Jul 1998 | A |
5821014 | Chen et al. | Oct 1998 | A |
5827623 | Ishida et al. | Oct 1998 | A |
5914202 | Nguyen et al. | Jun 1999 | A |
Number | Date | Country |
---|---|---|
4-342255 | Nov 1992 | JP |
5-27413 | Feb 1993 | JP |
5-88356 | Apr 1993 | JP |
Entry |
---|
IBM Technical Disclosure Bulletin, Abolafia et al., “Dual-Density Mask for Photoresist”, vol. 19, No. 12, May 1977, p.4539. |
IBM Technical Disclosure Bulletin, Hance, C.R., “Low Density Mask Technique for High Reduction Photography”, vol. 8, No. 12, May 1966, pp. 1798-1799. |