This application is a continuation-in-part of commonly owned, application Ser. No. 09/932,063, filed Aug. 17, 2001 now allowed, which in turn claims the benefit of Provisional Application Ser. No. 60/269,026, filed Feb. 15, 2001, the disclosures of both of which are incorporated by reference herein in their entirety.
Number | Name | Date | Kind |
---|---|---|---|
4491628 | Ito et al. | Jan 1985 | A |
4980264 | Chiong et al. | Dec 1990 | A |
5071730 | Allen et al. | Dec 1991 | A |
5443690 | Takechi et al. | Aug 1995 | A |
5492793 | Breyta et al. | Feb 1996 | A |
5783082 | DeSimone et al. | Jul 1998 | A |
5866304 | Nakano et al. | Feb 1999 | A |
5868856 | Douglas et al. | Feb 1999 | A |
5944996 | DeSimone et al. | Aug 1999 | A |
5976264 | McCullough et al. | Nov 1999 | A |
6024801 | Wallace et al. | Feb 2000 | A |
6042997 | Barclay et al. | Mar 2000 | A |
6067728 | Farmer et al. | May 2000 | A |
6200393 | Romack et al. | Mar 2001 | B1 |
6200943 | Romack et al. | Mar 2001 | B1 |
6228826 | DeYoung et al. | May 2001 | B1 |
6240936 | DeSimone et al. | Jun 2001 | B1 |
6242165 | Vaartstra | Jun 2001 | B1 |
6258766 | Romack et al. | Jul 2001 | B1 |
6277753 | Mullee et al. | Aug 2001 | B1 |
6306564 | Mullee | Oct 2001 | B1 |
6331487 | Koch | Dec 2001 | B2 |
Entry |
---|
Cao, Heidi B., et al., Comparison of resist collapse for deep ultraviolet and 193 nm resist platforms, J. Vac. Sci. Technol., vol. B 18, No. 6, pp. 3303-3307 (Nov./Dec. 2000). |
Mori, Shigeyasu, et al., Pattern collapse in the top surface imaging process after dry development, J. Vac. Sci. Technol., vol. B 16, No. 6, pp. 3744-3747 (Nov./Dec. 1998). |
Namatsu, Hideo, et al., Supercritical resist dryer, J. Vac. Sci. Technol., vol. B 18, No. 2, pp. 780-782 (Mar./Apr. 2000). |
Namatsu, Hideo, Supercritical drying for water-rinsed resist systems, J. Vac. Sci. Technol., vol. B 18, No. 6, pp. 3308-3312 (Nov./Dec. 2000). |
Simons, John P., et al., Aqueous-based photo resist drying using supercritical carbon dioxide to prevent pattern collapse, J. Vac. Sci. Technol., vol. B 18, No. 6, pp. 3313-3317 (Nov./Dec. 2000). |
Spall, W. Dale, Supercritical Carbon Dioxide Precision Cleaning for Solvent and Waste Reduction, International Journal of Environmentally Conscious Design & Manufacturing, vol. 2, No. 1, pp. 81-86 (1993). |
Supercritical CO2 process offers less mess from semiconductor plants, Abstract, Chemical Engineering, pp. 27-29 (Jul. 1998). |
Number | Date | Country | |
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60/269026 | Feb 2001 | US |
Number | Date | Country | |
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Parent | 09/932063 | Aug 2001 | US |
Child | 09/951259 | US |