FIELD
The present invention relates to a micromechanical component. The present invention further relates to a method for producing a micromechanical component.
BACKGROUND INFORMATION
Micromechanical pressure sensors in which a membrane is tensioned in a frame structure are available in the related art; this frame structure can be produced from silicon bulk material (monocrystalline Si wafers) or in a surface micromachining (SMM) process, for example. If an SMM process is used, the frame generally consists of polysilicon.
German Patent Application No. DE 10 2018 222 715 A1 describes a pressure sensor in which the membrane is not tensioned by a continuously extending frame, but by individual anchor structures.
In particular in low-pressure sensors, thin and/or large membranes are used so that good sensitivity can be achieved. To prevent these sensors from sustaining any damage at higher pressures (e.g., if they are overloaded), the membrane still has to have high stability. In particular at a tensioning region of the membrane or at edges of membrane bracing structures, high forces that can result in tears in the membrane can develop if it is overloaded.
SUMMARY
An object of the present invention is to provide a micromechanical component that is improved in particular in terms of a membrane.
According to a first aspect of the present invention, the object is achieved by a micromechanical component having features of the present invention. According to an example embodiment of the present invention, the micromechanical component includes:
- a membrane; wherein
- the membrane comprises at least one reinforcement structure of a geometrically defined shape, which reinforces the membrane in a defined manner, in the region of at least one anchor structure and/or in the region of at least one connecting structure.
In this way, the membrane can in particular be more robust in relation to high compressive loads, as a result of which a stress path within the membrane can advantageously be minimized. As a result, this can, for example, largely prevent any tears in or damage to the membrane due to a high compressive load.
According to a second aspect of the present invention, the object is achieved by a method for producing a micromechanical component including features of the present invention. According to an example embodiment of the present invention, the method includes:
- providing a membrane; wherein
- at least one reinforcement structure of a geometrically defined shape, which reinforces the membrane in a defined manner, is formed in the membrane in the region of at least one anchor structure and/or in the region of at least one connecting structure.
Preferred developments and example embodiments of the micromechanical component of the present invention are disclosed herein.
In an advantageous development of the micromechanical component of the present invention, the reinforcement structure is designed to have a defined overlap over the at least one anchor structure and/or the at least one connecting structure. Advantageously, this can improve a reinforcement effect of the reinforcement structure even further.
In further advantageous developments of the micromechanical component of the present invention, lateral dimensions of a portion of the reinforcement structure that is raised relative to the rest of the membrane are dependent on an extent of the overlap regions and/or a thickness of the membrane.
In a further advantageous development of the micromechanical component of the present invention, the reinforcement structure has substantially the same or different lateral dimensions above and below a surface of the membrane. As a result, individual regions of the reinforcement structure are specifically dimensioned, and this can improve a reinforcement effect of the reinforcement structure even further.
In a further advantageous development of the micromechanical component of the present invention, the reinforcement structure is integrally formed from one material. In this way, the reinforcement effect of the reinforcement structure can be very precisely specified on the basis of well-known material properties.
In a further advantageous development of the micromechanical component of the present invention, the reinforcement structure comprises at least one enclosed additional element. In this way, a reinforcement effect of the reinforcement structure can be improved even further by way of the interaction of two different materials.
In a further advantageous development of the micromechanical component of the present invention, the at least one additional element is arranged in the region of at least one anchor structure and/or in the region of at least one connecting structure. In this way, the reinforcement effect of the reinforcement structure can also be optimized even further.
In further advantageous developments of the micromechanical component of the present invention, the reinforcement structure is made of at least one of the following materials: Si, Ge, SiO2, Si3N4, GeO2, Ge3N4, SiC, Al2O3, or silicon-rich silicon nitride. Advantageously, different materials each having their own material parameters can thus be used for implementing the reinforcement structure, as a result of which, for example, production processes for providing the reinforcement structure can be optimally used.
The present invention is described in detail below on the basis of multiple figures in conjunction with further features and advantages. Identical or functionally identical elements are provided with identical reference signs. The figures are in particular intended to illustrate the main features of the present invention and are not necessarily to scale. For the sake of improved clarity, it may be that not all the reference signs are shown in all the figures.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 shows a cross-sectional view of a conventional micromechanical sensor.
FIG. 2 shows a cross-sectional view through the conventional micromechanical sensor from FIG. 1 showing the problem of tear formation.
FIGS. 3A-3D′ show a plurality of views of a reinforcement structure of a micromechanical component in the tensioning region of the membrane.
FIGS. 4A-4C′ show further alternative variants of a reinforcement structure in the tensioning region of a micromechanical component, according to example embodiments of the present invention.
FIGS. 5A-5B′ show further variants of the reinforcement structure in the tensioning region of a micromechanical component, according to example embodiments of the present invention.
FIGS. 6A-6D show plan views of reinforcement structures in the tensioning region of a membrane of a micromechanical component, according to example embodiments of the present invention.
FIGS. 7A and 7B show plan views of reinforcement structures in the tensioning region of a membrane of a micromechanical component, according to example embodiments of the present invention.
FIGS. 8A-8D show plan views of reinforcement structures in the tensioning region of a micromechanical component, according to example embodiments of the present invention.
FIGS. 9A-9E′ show variants of a reinforcement structure in the bracing region of a membrane of a micromechanical component, according to an example embodiment of the present invention.
FIG. 10 shows a schematic sequence for producing a micromechanical component, according to an example embodiment of the present invention.
DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
A main feature of the present invention is in particular that of reinforcing a membrane of a micromechanical component in the tensioning region and/or in the region of transitions of the membrane, such as bracing structures, in a targeted manner such that, as far as possible, tears do not form in the membrane if it is overloaded.
In connection with the present invention, an “anchor structure” may be a plurality of anchor or anchoring structures that are separate from one another or may be a contiguous, one-piece, or integral anchor or anchoring region. For the sake of simplicity, this distinction is not made again below.
FIG. 1 is a cross-sectional view of a schematic structure of a conventional micromechanical component 100 in the form of a capacitive micromechanical pressure sensor, as is described in DE 10 2018 222 715 A1, for example. It shows a substrate 1 (preferably a silicon substrate, e.g., a silicon wafer) having a layered structure arranged thereon, which has, inter alia, a functional layer 2 and an upper sacrificial layer 3. Here, a membrane 10 is tensioned in tensioning regions 11 by way of individual anchor structures arranged beside one another. The membrane 10 is braced in a central bracing region 12 by one or more supporting structures, which together fix an upper electrode 15 in place above a lower electrode 16 of a usable capacitor. These supporting structures are connected to the membrane 10 via connecting structures 14 and thus locally brace the membrane 10.
FIG. 2 shows a scenario in which a high mechanical pressure F is applied to the membrane 10. If this pressure F is too high, in the worst case tears can develop in the tensioning region 11 and/or in the bracing region 12 of the membrane 10. Possible positions of tears of this kind are indicated by dashed circles.
To make it possible to prevent tears of this kind in the membrane 10, it is proposed to reinforce the tensioning region 11 of a membrane 10 in a defined manner, as shown in FIGS. 3B-3D.
FIG. 3A is a cross-sectional view through a conventional anchor structure 13 in the tensioning region 11, as described in DE 10 2018 222 715 A1, for example. The anchor structure 13 comprises a functional layer 2 (e.g., made of polysilicon) and is in direct contact with the membrane 10 or the membrane layer. In this case, the functional layer 2 is arranged within a lower sacrificial layer 4 and in an upper sacrificial layer 3 so as to completely penetrate the lower sacrificial layer 4 and the upper sacrificial layer 3. Various options are taken into consideration to be able to reinforce the tensioning region 11, as explained in the following.
For example, as shown in FIG. 3B, the upper face of the membrane is thickened or reinforced by an additional layer, which can extend beyond the anchor structure 13 and thus reinforces the membrane in the region of the transition between the anchor structure 13 and the membrane 10. Preferably, a layer of polysilicon can be used to provide this reinforcement, so as to, for example, keep thermal influences on sensor performance low and/or to provide good chemical etching stability in relation to a sacrificial layer etching medium. If the sacrificial layer 3 and the sacrificial layer 4 consist of SiO2, for example, the reinforcement layer should have the highest possible etching resistance to an etching medium in the form of HF in liquid or gaseous form. As expressed on the basis of the following equations, this reinforcement can extend beyond the region, or the width and length, i.e., the lateral dimensions, of the anchor structure 13, although respective projecting portions do not necessarily have to have the same dimensions.
The geometric dimensions of the reinforcement structure 20 set out below are possible, with the term “as desired” being understood in the following to mean a range of suitable dimensioning parameters in connection with possible dimensioning parameters of a micromechanical component, such as those for the geometric dimensions of a membrane. Here, it is assumed that, for example, a thickness of the membrane 10 of the micromechanical component 100 can be a few tens of nanometers to several hundreds of micrometers.
a,c>=0
a=c
a>c
a<c
dV=as desired
dVU<dO
dM=as desired
a″,c″>=0
a″=c″
a″>c″
a′<c″
a″=a
a″>a
a′<a
c″=c
c″>c
c″<c
FIG. 3C shows a further variant of the reinforcement structure in which the membrane can be reinforced in the region of the transition between the anchor structure 13 and the membrane 10. Here too, the reinforcement layer can consist of silicon and extend beyond the anchor structure 13. In this case too, projecting portions having the widths a and c can have different dimensions. While the thickness of the reinforcement layer in FIG. 3B can be as desired, in the variant in FIG. 3C, it should be less than the thickness of the uppermost sacrificial layer 3 (e.g., made of SiO2), which is located between the membrane layer and the next functional layer 2 (e.g., made of polysilicon) positioned thereunder.
FIG. 3D shows a combination of the variants shown in FIGS. 3B and 3C. In this case, reinforcement layers are provided above and below the membrane layer in the region of the anchor structure 13 and can all project beyond the anchor structure 13 to different extents. FIGS. 3B′-3D′ show the respective variants of the reinforcement structure 20 after the sacrificial layers 3, 4 have been removed.
While the variants in FIGS. 3B-3D show the reinforcement of the membrane tensioning by thickening by way of one layer, in principle there is also the option of stabilizing the tensioning region 11 by way of a plurality of reinforcement layers. As a result, for example, the stress and stress curve in the tensioning region 11 of the membrane 10 can be influenced and set in a targeted manner.
FIGS. 4A to 4C show possible variants of the proposed reinforcement structure 20. FIG. 4A, for example, shows a variant in which an additional element or an additional layer 5 is integrated in the reinforced region of the membrane tensioning, as shown in FIG. 3B. If the reinforced region consists completely of polysilicon, the additional element 5 or the additional layers are completely surrounded by polysilicon. In this case, the thickness of the enveloping silicon layer can be, for example, the same all over, different all over, or the same only in part. The width of the reinforced region results from the sum of overhang widths plus a width of the anchor structure 13.
A further variant derives from FIG. 3C. In this figure, a reinforcement structure 20 is provided which extends, in the tensioning region 11 in the region of the anchor structure 13, into the region below the membrane 10. One or more additional layers can in turn be integrated in said structure, which layers are surrounded by silicon, having optionally different layer thicknesses, analogously to that explained above.
FIG. 4C shows a combination of the above-described variants. FIGS. 4A′-4C′ again show the respective variants of the reinforcement structure 20 after the sacrificial layers 3, 4 have been removed.
With reference to the parameters shown in FIGS. 4A to 4C, the following is applicable:
a+b+c>bZ
dV+dM>dZ
dV+dVu+dM>dZ
a″,c″>0
a″=c″
a″>c″
a″<c″
a″=a
a″>a
a″<a
c=c
c″>c
c″<c
FIGS. 4A and 4B illustrate that the additional element 5 can be arranged substantially above or below the membrane surface.
This also applies to the arrangements in FIGS. 5A and 5B, which show two further variants of FIG. 4C in which the additional element 5 can be arranged substantially above the membrane surface (FIG. 5A) or below the membrane surface (FIG. 5B). FIGS. 5A and 5B also show that additional reinforcement layers can be present without an additional element 5. If the additional element or the additional layer 5 consists of a layer or layer system that is resistant to the sacrificial layer etching medium, it is also possible to consider only enveloping the additional element or the additional layer 5 with silicon in part and to refrain from enveloping it completely.
As already explained, in the capacitive pressure sensor mentioned in DE 10 2018 222 715 A1, the membrane is tensioned by singular, substantially adjacent, anchor structures.
FIG. 6A is a plan view of a detail of the membrane 10 of the tensioning region 11 described in DE 10 2018 222 715 A1; it can be seen that the membrane is tensioned at singular anchor structures 13.
FIG. 6B is a plan view in which a plurality of proposed reinforcement structures 20 are not contiguous only in the region around singular anchor structures 13. Here, in the plane for both directions around the anchor structures 13, the same requirements or assumptions as described above in connection with the variants in FIGS. 3A-3D and FIGS. 4A-4C are then applicable to the reinforcement structures 20.
FIG. 6C is a plan view of a further variant in which the reinforcement structures 20 of adjacent anchor structures 13 transition into one another at least in part and form a larger, contiguous reinforcement region. As shown in FIG. 6C, this reinforcement region can be arranged in the region of the anchor structure 13, but, as shown in FIG. 6C, does not necessarily have to be symmetrical in this region.
Alternatively, the reinforcement region can extend away from the anchor structure 13 asymmetrically, as shown in FIG. 6D. In extreme cases, the reinforcement structure 20 can be located in the entire surface outside the membrane region. In this case, by way of example, the membrane region can extend up to the reinforcement structure 20 or up to the anchor structure 13 or comprise the anchor structure 13.
FIGS. 7A-7C are views corresponding to FIGS. 6B-6D, in which an additional element or an additional reinforcement layer 5 can still be present. Furthermore, it is also possible not to design a reinforcement structure 20 to extend in a straight line in parallel with membrane tensioning, but instead to design it in a convex or concave manner, or in some other specific manner, in the direction of membrane tension.
FIGS. 8A-8D show examples of an outwardly domed (convex) extension of a reinforcement structure 20 along a tensioning region 11. FIG. 8A shows a variant in which singular, non-contiguous reinforcement structures 20 create a convex extension in the direction of membrane tension, while FIG. 8B shows a contiguous region. While, in FIGS. 8A and 8B, the outwardly domed reinforcement structure 20 is symmetrical about the anchor structures 13 in the direction of membrane tensioning, variants can also be provided in which the outwardly domed reinforcement structure 20 only extends into the membrane region, for example, as shown in FIGS. 8C and 8D.
The plan view in FIG. 8C shows that a contour of the reinforcement structure(s) 20 can extend into the membrane region in an outwardly domed shape starting from a straight arrangement of the anchor structure(s) 13 and can be formed over the entire surface in the surrounding membrane region directed away from the membrane, starting from the anchor structure(s) 13.
The plan view in FIG. 8D shows that regions of the reinforcement structure 20 can be asymmetrical about the anchor structure 13 and can have a parallel and/or non-parallel extension.
By way of a curved extension of a reinforcement structure 20 in the region of a tensioning region 11, the stress path in a membrane surface can be taken into account and tensioned membrane regions which are subject to a higher mechanical load are accordingly reinforced while at the same time minimizing the influence of the reinforcement structure 20 on the membrane properties.
FIGS. 9A-9E show an application of that explained above to the bracing region 12 of the pressure sensor described in DE 10 2018 222 715 A1 in the region of the usable capacitor.
FIG. 9E shows an example of a conventional bracing region 12.
Analogously to FIG. 3B, FIG. 9B shows proposed reinforcement structures 20 which are located on the membrane 10 in the region around connecting structures so as to be non-contiguous.
FIG. 9C is analogous to FIG. 3C, in which the non-contiguous reinforcement structures 20 are located below the membrane 10 in the region around connecting structures.
FIG. 9D shows a combination of the above-described variants. FIG. 9E shows a variant in which at least partly adjacent reinforcement structures 20 merge into one another in the region of connecting structures 14 and form a larger, contiguous reinforcement surface. In this example, this applies to reinforcement structures 20 above and below the membrane layer. This is, however, equally possible if the reinforcement structure(s) are only located above or below the membrane layer.
With reference to the parameters shown in FIGS. 9A to 9E, the following is applicable:
s,u>=0
s=U
s>u
s<u
dV=as desired
dVu<dO
dM=as desired
s″,u″>=0
s″=u″
s″>u″
s″<u″
s″=s
s″>s
s″<s
u″=u
u″>u
u″<u
By way of a curved extension of a reinforcement structure 20 in the bracing region 12 of a membrane 10, the stress path in a membrane surface can be taken into account and braced membrane regions which are subject to a higher mechanical load are accordingly reinforced while at the same time minimizing the influence of the reinforcement structure 20 on the membrane properties. In the figures shown, the reinforcement layer(s) and the additional layer(s) 5 are shown to be rectangular for the sake of simplicity. In principle, however, they can be any shape, for example, they can be lenticular, elliptical, cup-shaped, champagne-coupe-shaped, rectangular, or square, with rounded corners and edges, etc., or can be combinations of said shapes.
The reinforcement structures 20 and the additional reinforcement layers 5 can, e.g., be made of electrically conducting, semiconducting, or non-conducting materials such as Si, Ge, SiO2, Si3N4, GeO2, Ge3N4, SiC, Al2O3, silicon-rich silicon nitride, etc., or combinations of these materials. In addition, these materials can be provided with dopants in a targeted manner, as is conventional in semiconductor technology, for example.
FIG. 10 shows a possible schematic sequence of a method for producing a proposed micromechanical component 100.
In a step 200, a membrane 10 is provided.
In a step 210, at least one reinforcement structure 20 of a geometrically defined shape, which reinforces the membrane 10 in a defined manner, is formed in the membrane 10 in the region of at least one anchor structure 13 and/or in the region of at least one bracing structure 12.
Advantageously, a plurality of different forms of implementation are possible for the micromechanical component, for example in the form of a capacitive pressure sensor, a microphone, a piezo-resistive pressure sensor, etc.
Patent Application
20230304881
