George et al., “A Practical and Precise Method for Mask Defect Size Measurement,” Mar. 10, 1996, Proceedings of the SPIE Conference on Photo-Lithography. |
Stocker et al., “Characterization of Defect Sizing on an Automatic Inspection Station (KLA-238e),” 1993, SPIE vol. 2087 Photomask Technology and Management. |
Karvahira et al., “SEMI Standards Programmed Defect Masks and its Applications for defect Inspection”, Semi Japan Standards Committee. |
Peter J. Fiekowsky, Quotation (Preliminary), Oct. 17, 1994. |
Fiekowsky et al., “Defet Printability Measurement on the KLA-351: Correlation to Defect Sizing Using the AVI Metrology System”, SPIE 19th Annual BACUS Symposium on Photomask Technology and Management Conference 3873, Sep. 1999. |
Tran et al., “Application of Image processing Software to Characterize the Photomask Key Parameters for Future Technologies,” Apr. 17-18, 1997, Proceedings of SPIE vol. 3096. |