Number | Date | Country | Kind |
---|---|---|---|
63-216307 | Sep 1988 | JPX | |
1-154743 | Jun 1989 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4619729 | Johncock et al. | Oct 1986 | |
4732761 | Machida et al. | Mar 1988 | |
4891118 | Ooiwa et al. | Jan 1990 |
Number | Date | Country |
---|---|---|
60-186849 | Sep 1985 | JPX |
61-283116 | Dec 1986 | JPX |
62-33772 | Feb 1987 | JPX |
Entry |
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S. Kato et al., "High Rate Deposition of a --Si:H Using Electron Cyclotron Resonance Plasma", Journal of Non-Crystalline Solids, 77 and 78, pp. 813-816 (1985). |