This application is based on and claims priority from Japanese Patent Application No. 2013-145048, filed on Jul. 10, 2013 with the Japan Patent Office, the disclosures of which are incorporated herein in their entireties by reference.
Various aspects and exemplary embodiments discussed herein relate to a microwave plasma processing apparatus.
A microwave plasma processing apparatus known in the related art uses high density plasma excited by microwave electric fields. For example, the microwave plasma processing apparatus includes a planar antenna having a plurality of slots which radiate microwaves for exciting plasma. In the microwave plasma processing apparatus, microwaves are radiated from the slot antenna to the inside of a processing container and ionize a gas within a vacuum container so as to excite plasma. See, for example, Japanese Patent Laid-Open Publication Nos. H9-63793, H3-191074, and 2007-213994.
A microwave plasma processing apparatus disclosed herein includes a processing container configured to define a processing space, a dielectric window having a facing surface formed to face the processing space, and an antenna plate installed on a surface of the dielectric window which is opposite to the facing surface. The antenna plate is formed with a plurality of slots configured to radiate microwaves for exciting plasma to the processing space through the dielectric window. The plurality of slots includes a first slot group configured to transmit the microwaves guided to a center side of the dielectric window, and a second slot group configured to transmit the microwaves guided to a peripheral edge side of the dielectric window. The dielectric window includes a first concave portion formed in a region corresponding to the first slot group of the antenna plate on the facing surface of the dielectric window, and a second concave portion formed in a region corresponding to the second slot group of the antenna plate on the facing surface of the dielectric window.
The foregoing summary is illustrative only and is not intended to be in any way limiting. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features will become apparent by reference to the drawings and the following detailed description.
In the following detailed description, reference is made to the accompanying drawing, which form a part hereof. The illustrative embodiments described in the detailed description, drawing, and claims are not meant to be limiting. Other embodiments may be utilized, and other changes may be made, without departing from the spirit or scope of the subject matter presented here.
In the above-described technology, microwaves radiated to the center side of the dielectric window from the slot antenna and microwaves radiated to the peripheral edge side of the dielectric window interfere with each other. As a result, the uniformity of the density of plasma excited by the microwaves below the dielectric may be impaired.
According to an exemplary embodiment of a microwave plasma processing apparatus disclosed herein, the uniformity of the density of plasma excited by the microwaves below the dielectric window may be maintained.
Hereinafter, exemplary embodiments of the microwave plasma processing apparatus disclosed herein will be described in detail with reference to the accompanying drawings. Meanwhile, the present disclosure is not limited by the exemplary embodiments. The exemplary embodiments may be properly combined with each other without making processing contents thereof contradictory.
A microwave plasma processing apparatus in a first exemplary embodiment includes a processing container configured to define a processing space, a dielectric window having a facing surface formed to face the processing space, and an antenna plate installed on a surface of the dielectric window which is opposite to the facing surface. The antenna plate is formed with a plurality of slots configured to radiate microwaves for exciting plasma to the processing space through the dielectric window. The plurality of slots includes a first slot group configured to transmit the microwaves guided to a center side of the dielectric window, and a second slot group configured to transmit the microwaves guided to a peripheral edge side of the dielectric window. The dielectric window includes a first concave portion formed in a region corresponding to the first slot group of the antenna plate on the facing surface of the dielectric window, and a second concave portion formed in a region corresponding to the second slot group of the antenna plate on the facing surface of the dielectric window.
In an exemplary embodiment of the microwave plasma processing apparatus in the first exemplary embodiment, the first concave portion of the dielectric window is formed to extend in an annular shape in the region corresponding to the first slot group on the facing surface of the dielectric window, and a plurality of second concave portions are formed to be arranged in an annular shape in the region corresponding to the second slot group on the facing surface of the dielectric window.
In the microwave plasma processing apparatus in the first exemplary embodiment, the antenna plate is formed in a disc shape. The first slot group is formed by a plurality of elongated hole pairs arranged along a circumferential direction of the antenna plate. The holes in each hole pair extend in intersecting directions. The second slot group is formed by a plurality of elongated holes arranged along the circumferential direction of the antenna plate radially outside of the first slot group. The holes in each hole pair extend in intersecting directions.
In the microwave plasma processing apparatus in the first exemplary embodiment, each of the plurality of second concave portions is formed in a region corresponding to one of the plurality of elongated hole pairs on the facing surface.
In an exemplary embodiment of the microwave plasma processing apparatus in the first exemplary embodiment, assuming that a wavelength of the microwaves within the dielectric window is λ, a thickness of each of the first and second concave portions is in a range of ⅛λ to ⅜λ.
In an exemplary embodiment of the microwave plasma processing apparatus in the first exemplary embodiment, assuming that a wavelength of the microwaves within the dielectric window is λ, a width of the first concave portion in a horizontal direction is equal to or larger than 5/16λ from a center of one unit slot which constitutes the first slot group.
In an exemplary embodiment of the microwave plasma processing apparatus in the first exemplary embodiment, assuming that a wavelength of the microwaves within the dielectric window is λ, a width of the second concave portion in a horizontal direction is equal to or larger than 5/16λ from a center of one unit slot which constitutes the second slot group.
The processing container 100 defines a processing space S configured to perform a plasma processing on the substrate W placed on the support 101. In addition, the processing container 100 is formed with an opening 103 connected to an exhaust system such as a vacuum pump.
A dielectric window 300 is provided on a top of the processing container 100 so as to vacuum-seal the processing space S of the processing container 100. The dielectric window 300 is also referred to as a ceiling plate. The dielectric window 300 has a facing surface 300a which faces the processing space S. The detailed configuration of the dielectric window 300 will be described later.
The slot antenna 200 is installed on a top surface 300b which is opposite to the facing surface 300a of the dielectric window 300. The slot antenna 200 is connected to an external microwave source (not illustrated) and transmits microwaves, which are supplied from the microwave source, from microwave transmission slots formed in the slot antenna 200. In addition, the slot antenna 200 radiates microwaves for exciting plasma to the processing space S of the processing container 100 through the dielectric window 300 so that a processing gas released into the processing container 100 is ionized to excite the plasma.
The slot antenna plate 203 has, for example, a thin plate shape, in particular, a disc shape. The slot antenna plate 203 is formed with a plurality of microwave transmission slots 203c and a plurality of microwave transmission slots 203b. It is preferable that each of the opposite surfaces of the slot antenna plate 203 in the plate thickness direction is flat. The plurality of microwave transmission slots 203c are formed on an inner periphery side of the slot antenna plate 203 and the plurality of microwave transmission slots 203b are formed on an outer periphery side of the slot antenna plate 203. The microwave transmission slots 203b, 203c are formed through the slot antenna plate 203 in the plate thickness direction. Each of the plurality of microwave transmission slots 203c includes two slots 203f, 203g which are elongated holes extending to intersect or cross at right angles each other. Each of the plurality of microwave transmission slots 203b includes two slots 203d, 203e which are elongated holes extending to intersect or cross at right angles each other. The plurality of microwave transmission slots 203c are arranged at predetermined intervals in the circumferential direction of the inner periphery side, and the plurality of microwave transmission slots 203b are arranged at predetermined intervals in the circumferential direction of the outer periphery side.
In other words, the plurality of microwave transmission slots 203c become an inner slot group 203c-1 which is formed by a plurality of slot pairs 203f, 203g arranged along the circumferential direction of the slot antenna plate 203. In addition, the plurality of microwave transmission slots 203b become an outer slot group 203b-1 which is formed by a plurality of slot pairs 203d, 203e arranged along the circumferential direction of the slot antenna plate outside of the inner slot group 203c-1 in the radial direction of the slot antenna plate 203.
The inner slot group 203c-1 transmits microwaves guided to the center side of the dielectric window 300 by an inner waveguide to be described later, and the outer slot group 203b-1 transmits microwaves guided to the peripheral edge side of the dielectric window 300 by an outer waveguide to be described later.
As illustrated in
The intermediate metal body 208 is installed to be spaced apart from the processing container 100 side of the cooling plate 202. The intermediate metal body 208 has a donut-shaped convex portion 208f that separates the processing container 100 side surface of the intermediate metal body 208 into a center side portion and an outer periphery side portion. In addition, it is preferable that the intermediate metal body 208 has a uniform thickness. More specifically, it is preferable that the thickness of the intermediate metal body 208 is uniform, except for the area where the convex portion 208f is formed.
The slot antenna plate 203 is installed to be in contact with the convex portion 208f on the processing container 100 side of the intermediate metal body 208. On the processing container 100 side surface of the slot antenna plate 203, the slot antenna plate 203 includes, as slots for radiating microwaves, the microwave transmission slots 203c formed in a more center side portion than the portion which is in contact with the convex portion 208f, and the microwave transmission slots 203b formed in a more outer periphery side portion than the portion which is in contact with the convex portion 208f.
The coaxial waveguide 201 is installed in a through hole which continuously extends through the cooling plate 202 and the intermediate metal body 208. In the example illustrated in
In addition, the coaxial waveguide 201 includes an inner conductor 201a, an intermediate conductor 201b, and an outer conductor 201c. Each of the inner conductor 201a, the intermediate conductor 201b, and the outer conductor 201c has a cylindrical shape, and may be installed such that the diametric centers thereof conform to each other. The inner conductor 201a and the intermediate conductor 201b are installed such that the outer surface of the inner conductor 201a and the inner surface of the intermediate conductor 201b are spaced apart from each other. In addition, the intermediate conductor 201b and the outer conductor 201c are installed such that the outer surface of the intermediate conductor 201b and the inner surface of the outer conductor 201c are spaced apart from each other.
Here, in the coaxial waveguide 201, the hollow portion of the inner conductor 201a forms a supply path that supplies the processing gas introduced into the gas supply hole 204 to the gas inlet hole 207. In addition, in the coaxial waveguide 201, microwaves from a microwave source (not illustrated) are transmitted by each of a space between the inner conductor 201a installed in the hollow portion of the intermediate conductor 201b and the intermediate conductor 201b, and a space between the intermediate conductor 201b installed in the hollow portion of the outer conductor 201c and the outer conductor 201c. That is, the microwaves are transmitted by each of the hollow portion formed by the outer surface of the inner conductor 201a and the inner surface of the intermediate conductor 201b, and the hollow portion formed by the outer surface of the intermediate conductor 201b and the inner surface of the outer conductor 201c.
A first member 213 and a second member 214 are installed at an end of the coaxial waveguide 201. For example, the first member 213 is installed at a processing container 100 side end of the inner conductor 201a of the coaxial waveguide 201. The first member 213 including a through hole has a first stepped portion 213a protruding to a center side space positioned at the more center side than the convex portion 208f in the space between the slot antenna plate 203 and the intermediate metal body 208. The length of the diameter of the first member 213 at the first stepped portion 213a is equal to or smaller than the inner diameter of the intermediate conductor 201b. In addition, in the example illustrated in
In addition, for example, the second member 214 is installed at the processing container 100 side end of the intermediate conductor 201b of the coaxial waveguide 201. The second member 214 including a through hole has a third stepped portion 214a protruding to the space between the intermediate metal body 208 and the cooling plate 202. The length of the diameter of the second member 214 at the third stepped portion 214a is equal to or smaller than the inner diameter of the outer conductor 201c. In addition, in the example illustrated in
As illustrated in
An example of a relationship of the through holes, the coaxial waveguide 201, the first member 213, and the second member 214 will be additionally described. In the example illustrated in
In addition, in the example illustrated in
Here, the intermediate metal body 208 will be further described with reference to
Here, in the intermediate metal body 208, a center side space is formed between the bottom surface 208d of the intermediate metal body 208 and the top surface 203a of the slot antenna plate 203 in a range from the center side of the intermediate metal body 208 to the donut-shaped convex portion 208f. In the example illustrated in
In addition, as illustrated in
Here, the cooling plate 202 has a convex portion 202d protruding to the space between the intermediate metal body 208 and the cooling plate 202. The convex portion 202d is not in contact with the intermediate metal body 208.
In addition, the intermediate metal body 208 and the cooling plate 202 are in contact with each other through the one or plural convex portions 208g formed on the intermediate metal body 208. In other words, the intermediate metal body 208 and the cooling plate 202 are installed to be spaced apart from each other, except for the one or plural convex portions 208g of the intermediate metal body 208. Meanwhile, the intermediate metal body 208 is formed with a flow hole connected to the flow holes 202c of the cooling plate 202 through the one or plural convex portions 208g where the cooling plate 202 and the intermediate metal body 208 are in contact with each other, thereby enhancing the cooling performance of the intermediate metal body 208. In addition, it is preferable that the one or plural convex portions 208g are formed at an area where the outer slow-wave plate 210 is not installed.
In addition, the slot antenna 200 is provided with a slow-wave plate at a portion on the outer surface of the intermediate metal body 208. Specifically, the slot antenna 200 is provided with an inner slow-wave plate 209 and an outer slow-wave plate 210.
As indicated by arrow 301 in
In addition, as indicated by arrow 302 in
That is, in the inner waveguide, the microwaves supplied from the microwave source sequentially pass through the hollow portion formed by the outer surface of the inner conductor 201a and the inner surface of the intermediate conductor 201b, the hollow portion formed by the outer surface of the inner conductor 201a and the side surface 208c of the through hole formed in the intermediate metal body 208, the space between the first member 213 and the intermediate metal body 208, the empty space 212 formed by the bottom surface of the intermediate metal body 208 and the top surface of the slot antenna plate 203, and the inner slow-wave plate 209, and then, the microwaves are discharged to the center side of the dielectric window 300 from the microwave transmission slots 203c (inner slot group 203c-1).
In addition, as indicated by arrow 303, the slot antenna 200 includes an outer waveguide as a waveguide that transmits microwaves to the microwave transmission slots 203b (outer slot group 203b-1) by transmitting the microwaves in the outer periphery side space, which is positioned at a more outer periphery side than the protrusion 208f in the space between the slot antenna plate 203 and the intermediate metal body 208, sequentially through the space between the intermediate conductor 201b and the outer conductor 201c, and the space between the intermediate metal body 208 and the cooling plate 202. In the outer waveguide, an outer slow-wave plate 210 is installed above the microwave transmission slots 203b (outer slot group 203b-1). In addition, the inner waveguide and the outer waveguide are not communicated with each other.
That is, in the outer waveguide, the microwaves supplied from the microwave source sequentially pass through the hollow portion formed by the outer surface of the intermediate conductor 201b and the inner surface of the outer conductor 201c, the hollow portion formed by the outer surface of the intermediate conductor 201b and the side surface 202b of the cooling plate 202, the space between the second member 214 and the cooling plate 202, the empty space 211 formed by the top surface 208a of the intermediate metal body 208 and the bottom surface 202a of the cooling plate 202, the outer slow-wave plate 210a, and the outer slow-wave plate 210b, and then, the microwaves are discharged to the periphery edge side of the dielectric window 300 from the microwave transmission slots 203b (outer slot group 203b-1).
When the configuration in which the inner waveguide and the outer waveguide are not communicated with each other is employed as described above, it is possible to avoid the interference of the microwaves between the inner waveguide and the outer waveguide.
Meanwhile, although the first exemplary embodiment illustrates, as an example, a case in which the inner waveguide and the outer waveguide are not communicated with each other, the present disclosure is not limited thereto. The inner waveguide and the outer waveguide may be communicated with each other via a through hole which does not transmit microwaves.
As illustrated
That is, as illustrated in
As illustrated in
That is, as illustrated in
In addition, the outer slow-wave plate 210a is installed to a predetermined length range from the outer periphery of the intermediate metal body 208 on the top surface 208a of the intermediate metal body 208. As a result, in the space formed between the top surface 208a of the intermediate metal body 208 and the bottom surface 202a of the cooling plate 202, an empty space 212 is formed from the through hole of the intermediate metal body 208 to the portion where the outer slow-wave plate 210a is installed. The one or plural convex portions 208g where the cooling plate 202 and the intermediate metal body 208 are in contact with each other are formed in the empty space 212 from the through hole of the intermediate metal body 208 to the portion where the outer slow-wave plate 210a is installed. In addition, the outer slow-wave plate 210 has a second stepped portion 210ab protruding toward the center side in the interface between the outer slow-wave plate 210 and the portion where the outer slow-wave plate 210 is not installed in the space between the intermediate metal body 208 and the cooling plate 202. Preferably, the length of the outer slow-wave plate 210 installed in the inner waveguide is longer than the length of the inner slow-wave plate 209 installed in the outer waveguide.
Descriptions will be described on a relationship between the outer waveguide, and the one or plural convex portions 208g formed on the intermediate metal body 208. As described above, the intermediate metal body 208 and the cooling plate 202 are in contact with each other in the one or plural convex portions 208g formed on the intermediate metal body 208. Here, the one or plural convex portions 208g are formed in the empty space 211. In other words, the one or plural convex portions 208g are not enclosed by the outer slow-wave plate 210.
Here, as illustrated in
Here, the detailed configuration of the dielectric window 300 will be described with reference to
As illustrated in
The inner concave portion 300c is formed to extend in an annular shape in the region corresponding to the inner slot group 203c-1 of the slot antenna plate 203 on the facing surface 300a of the dielectric window 300. In addition, the depth and width of the inner concave portion 300c are set such that the strength of the portion corresponding to the inner slot group 203c-1 of the slot antenna plate 203 of the dielectric window 300 may be maintained at a strength that may absorb the vacuum pressure within the processing container 100. For example, when the diameter of the dielectric window 300 is “608 mm”, the depth and width of the inner concave portion 300c are set to “18.2 mm” and “70 mm”, respectively.
In addition, the outer concave portion 300d may be formed in such a manner in which a plurality of outer concave portions 300d is arranged annularly in the region corresponding to the outer slot group 203b-1 of the slot antenna plate 203 on the facing surface 300a of the dielectric window 300. More specifically, the plurality of outer concave portions 300d are arranged to correspond to the regions of the plurality of slot pairs included in the outer slot group 203b-1 of the slot antenna plate 203 on the facing surface 300a of the dielectric window 300, respectively. Further, each of the plurality of outer concave portions 300d is formed in a circular shape when viewed from the top. The depth and diameter of each of the plurality of outer concave portions 300d are set such that the strength of the portion corresponding to the outer slot group 203b-1 of the slot antenna plate 203 of the dielectric window 300 may be maintained at a strength that may absorb the vacuum pressure within the processing container 100. For example, when the diameter of the dielectric window 300 is “608 mm”, the depth and diameter of each of the plurality of outer concave portions 300d are set to “18.2 mm” and “70 mm”, respectively
In addition, assuming that the wavelength of the microwaves within the dielectric window 300 is λ, the thickness of each of the inner concave portion 300c and the outer concave portion 300d of the dielectric window 300 is preferable in a range of ⅛λ to ⅜λ. When the thickness of each of the inner concave portion 300c and the outer concave portion 300d of the dielectric window 300 is set in this manner, the radiation efficiency of the microwaves which are respectively radiated from the inner slot group 203c-1 and the outer slot group 203b-1 of the slot antenna plate 203 to the inner concave portion 300c and the outer concave portion 300d of the dielectric window 300, may be improved.
In addition, assuming that the wavelength of the microwaves within the dielectric window 300 is λ, the width of the inner concave portion 300c of the dielectric window 300 in a horizontal direction is preferably equal to or larger than 5/16λ from a center of one unit slot that constitutes the inner slot group 203c-1. The horizontal direction of the inner concave portion 300c of the dielectric window 300 refers to the directional direction or circumferential direction of the dielectric window 300. When the width of the inner concave portion 300c of the dielectric window 300 in the horizontal direct is set in this manner, it is possible to avoid the resonance of the microwaves.
Further, assuming that the wavelength of the microwaves within the dielectric window 300 is λ, the width of the outer concave portion 300d of the dielectric window 300 in the horizontal direction is preferably equal to or larger than 5/16λ from a center of one unit slot that constitutes the outer slot group 203b-1. The horizontal direction of the outer concave portion 300d of the dielectric window 300 refers to the directional direction or circumferential direction of the dielectric window 300. When the width of the outer concave portion 300d of the dielectric window 300 in the horizontal direct is set in this manner, it is possible to avoid the resonance of the microwaves.
Although
Here, it may be considered that the inner slot group 203c-1 and the outer slot group 203b-1 are formed on the slot antenna plate 203 and the facing surface 300a of the dielectric window 300 is formed in a flat shape without including a concave portion. However, in such a case, the microwaves guided to the center side of the dielectric window 300 and the microwaves guided to the peripheral edge side may interfere with each other, and as a result, the uniformity of the density of plasma excited by the microwaves below the dielectric window 300 may be impaired.
In addition, “Pin/Pout” in
As illustrated in
As described above, as compared to the case in which the dielectric window 300 is formed in a flat shape that does not include a concave portion, according to the first exemplary embodiment, it becomes possible to suppress the mutual interference between the microwaves guided to the center side of the dielectric window 300 and the microwaves guided to the peripheral edge side of the dielectric window 300. That is, because the microwaves transmitted form the microwave transmission slot may be concentrated to the inner concave portion 300c and the outer concave portion 300d, it becomes possible to suppress the mutual interference between the microwaves guided to the center side of the dielectric window 300 and the microwaves guided to the peripheral edge side of the dielectric window 300. As a result, the uniformity of the density of plasma excited by the microwaves below the dielectric window 300 may be maintained.
As illustrated in
Here, an example of a configuration of a microwave source side of the microwave plasma processing apparatus 10 will be described.
The microwave oscillator 401 oscillates microwaves. The reflected wave interrupter 402 includes a circulator and a dummy load, in which the reflected wave interrupter 402 separates reflected waves of the microwaves from the slot antenna 200 side by the circulator and interrupts the separated reflected waves by the dummy load.
The distributor 403 distributes the microwaves oscillated by the microwave oscillator 401 to two waveguides 403a, 403b which are connected to the inner waveguide and the outer waveguide of the slot antenna 200. The phase shifter 404 is installed in one waveguide 403a of the two waveguides 403a, 403b, and adjusts the phase difference between the microwaves distributed to the other waveguide 403b from the distributor 403 and the microwaves distributed to the one waveguide 403a from the distributor 403.
The matching devices 405, 406 are installed in the two waveguides 403a, 403b, respectively. In addition, the matching devices 405, 406 match the microwave oscillator 401 side impedance and the slot antenna 200 side impedance so that reflected waves of microwaves from the slot antenna 200 side are reflected to the slot antenna 200 side.
When the matching devices 405, 406 are respectively installed in the two waveguides 403a, 403b connected to the inner waveguide and the outer waveguide of the slot antenna 200, the reflected waves going up the two waveguides 403a, 403b from the slot antenna 200 infiltrate into the other side waveguides 403b, 403a respectively through the distributor 403. Thus, re-distribution of the power of the microwaves against the set value of the microwave distribution rate of the distributor 403 may be avoided.
(Effect of First Exemplary Embodiment)
As described above, in the microwave plasma processing apparatus of the first exemplary embodiment, the inner slot group 203c-1 and the outer slot group 203b-1 are formed in the slot antenna plate 203, and an inner concave portion 300c and an outer concave portion 300d are also formed on the facing surface 300a of the dielectric window 300. Due to this, according to the first exemplary embodiment, the microwaves transmitted from the inner slot group 203c-1 and the outer slot group 203b-1 may be concentrated to the inner concave portion 300c and the outer concave portion 300d. As a result, according to the first exemplary embodiment, it is possible to suppress the mutual interference between the microwaves guided to the center side of the dielectric window 300 and the microwaves guided to the peripheral edge side of the dielectric window, and the uniformity of density of plasma excited by the microwaves below the dielectric window 300 may be maintained.
In addition, in the first exemplary embodiment, the inner concave portion 300c of the dielectric window 300 is formed to extend in an annular shape in the region corresponding to the inner slot group 203c-1 on the facing surface 300a of the dielectric window 300, and the plurality of the outer concave portions 300d of the dielectric window 300 are arranged in an annular shape in the region corresponding to the outer slot group 203b-1 on the facing surface 300a of the dielectric window 300 corresponding to the outer slot group 203b-1. As a result, it is possible to maintain the uniformity of the density of plasma excited by the microwaves below the dielectric window 300 and to maintain the strength of the dielectric window 300.
In addition, in the first exemplary embodiment, each of the plurality of outer concave portions 300d is arranged in a region of one of the plurality of slot pairs included in the outer slot group 203b-1 of the slot antenna plate 203 on the facing surface of the dielectric window 300. As a result, the microwaves transmitted from the outer slot group 203b-1 of the slot antenna plate 203 can be effectively concentrated to the outer concave portion 300d. Thus, it is possible to properly suppress the mutual interference between the microwaves guided to the center side of the dielectric window 300 and the microwaves guide to the peripheral edge side.
In addition, in the first exemplary embodiment, assuming that the wavelength of the microwaves within the dielectric window 300 is λ, the thickness of each of the inner concave portion 300c and the outer concave portion 300d of the dielectric window 300 is in the range of ⅛λ to ⅜λ. As a result, the radiation efficiency of the microwaves, which are respectively radiated from the inner slot group 203c-1 and the outer slot group 203b-1 of the slot antenna plate 203 to the inner concave portion 300c and outer concave portion 300d of the dielectric window 300, may be improved.
In addition, in the first exemplary embodiment, assuming that the wavelength of the microwaves within the dielectric window 300 is λ, the width of the inner concave portion 300c of the dielectric window 300 in the horizontal direction is equal to or larger than 5/16λ from the center of one unit slot which constitutes the inner slot group 203c-1. As a result, it is possible to avoid the resonance of the microwaves radiated from the inner slot group 203c-1 of the slot antenna plate 203 to the inner concave portion 300c of the dielectric window 300.
Further, in the first exemplary embodiment, assuming that the wavelength of the microwaves within the dielectric window 300 is λ, the width of the outer concave portion 300d of the dielectric window 300 in the horizontal direction is equal to or larger than 5/16λ, from the center of one unit slot which constitutes the outer slot group 203b-1. As a result, it is possible to avoid the resonance of the microwaves radiated from the outer slot group 203b-1 of the slot antenna plate 203 to the outer concave portion 300d of the dielectric window 300.
From the foregoing, it will be appreciated that various exemplary embodiments of the present disclosure have been described herein for purposes of illustration, and that various modifications may be made without departing from the scope and spirit of the present disclosure. Accordingly, the various exemplary embodiments disclosed herein are not intended to be limiting, with the true scope and spirit being indicated by the following claims.
Number | Date | Country | Kind |
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2013-145048 | Jul 2013 | JP | national |