Generating means

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CPC
H01J37/32201

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32201Generating means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,765
- Issue date Nov 26, 2024
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method using potential control of grid and substrate
- Patent number 12,148,626
- Issue date Nov 19, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young Yeom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,112,921
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Hiroyuki Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus and methods for processing feed material utilizing...
- Patent number 12,094,688
- Issue date Sep 17, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for measuring density of plasma, plasma processing system, a...
- Patent number 12,087,550
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Vladimir Vsevolodovich Protopopov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,046,453
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus and methods for processing feed material utilizing...
- Patent number 12,040,162
- Issue date Jul 16, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of low temperature thin film deposition and in-si...
- Patent number 12,018,374
- Issue date Jun 25, 2024
- DSGI Technologies, Inc.
- Jeffrey Edward Kowalski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,009,180
- Issue date Jun 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular high-frequency source
- Patent number 12,002,654
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave coupling/combining device and associated microwave generator
- Patent number 11,961,713
- Issue date Apr 16, 2024
- SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQU...
- Louis Latrasse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave heating device
- Patent number 11,862,432
- Issue date Jan 2, 2024
- Mitsubishi Electric Corporation
- Hiroshi Suenobu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular reactor for microwave plasma-assisted deposition
- Patent number 11,859,279
- Issue date Jan 2, 2024
- DIAM CONCEPT
- Alix Gicquel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PEALD titanium nitride with direct microwave plasma
- Patent number 11,823,870
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 11,764,038
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,721,526
- Issue date Aug 8, 2023
- MKS Instruments, Inc.
- Francesco Braghiroli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with local lorentz force
- Patent number 11,721,532
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for the plasma processing of containers
- Patent number 11,660,361
- Issue date May 30, 2023
- KHS GmbH
- Juergen Franz Vorwerk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for plasma processing
- Patent number 11,646,178
- Issue date May 9, 2023
- Tokyo Electron Limited
- Yuji Onuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-power solid-state microwave generator for RF energy applications
- Patent number 11,646,177
- Issue date May 9, 2023
- Precisepower, LLC
- Kenneth Kaplan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave output device and plasma processing apparatus
- Patent number 11,587,769
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Yohei Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atmospheric cold plasma jet coating and surface treatment
- Patent number 11,560,627
- Issue date Jan 24, 2023
- Starfire Industries LLC
- Brian Edward Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,527,386
- Issue date Dec 13, 2022
- Tokyo Electron Limited
- Kazushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of power generation with phase linked solid-state...
- Patent number 11,476,092
- Issue date Oct 18, 2022
- MKS Instruments, Inc.
- Kenneth Trenholm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,106
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Yuki Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density monitor, plasma processing apparatus, and plasma pro...
- Patent number 11,410,835
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave plasma source
- Patent number 11,404,248
- Issue date Aug 2, 2022
- Applied Materials, Inc.
- Philip Allan Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote modular high-frequency source
- Patent number 11,393,661
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Hanh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity in...
- Patent number 11,355,317
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity wi...
- Patent number 11,348,783
- Issue date May 31, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20250022688
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...
- Publication number 20250014869
- Publication date Jan 9, 2025
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PRECLEAN APPARATUS AND PROCESSING METHOD FOR IMPURITY REM...
- Publication number 20240404803
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Yoon Ah SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240376604
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Hyunjoong Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20240282554
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Thai Cheng CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240254626
- Publication date Aug 1, 2024
- Tokyo Electron Limited
- Hiroki YAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS-FLOW-ENGINEERED PLASMA REACTOR FOR EFFICIENTLY PRODUCING FIXED...
- Publication number 20240234098
- Publication date Jul 11, 2024
- Nitricity Inc.
- John A. SCHWALBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...
- Publication number 20240222085
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Koichiro NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM
- Publication number 20240203699
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Young Jo JIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20240194450
- Publication date Jun 13, 2024
- Hitachi High-Tech Corporation
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240096655
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Katsuhiko Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...
- Publication number 20240071725
- Publication date Feb 29, 2024
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014007
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014010
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Tetsuo KAWANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTILIZING...
- Publication number 20230411123
- Publication date Dec 21, 2023
- 6K Inc.
- Michael C. Kozlowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR FLOWABLE GAP FILL
- Publication number 20230399745
- Publication date Dec 14, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple Chamber System for Plasma Chemical Vapor Deposition of Dia...
- Publication number 20230392255
- Publication date Dec 7, 2023
- PLASMABILITY, LLC
- William Holber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE PLASMA APPARATUS AND METHODS FOR PROCESSING MATERIALS USI...
- Publication number 20230377848
- Publication date Nov 23, 2023
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...
- Publication number 20230326716
- Publication date Oct 12, 2023
- Tokyo Electron Limited
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-port Phase Compensation Nested Microwave-plasma Apparatus for...
- Publication number 20230260756
- Publication date Aug 17, 2023
- Hangzhou Dianzi University
- Jie Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA
- Publication number 20230253186
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20230207272
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Sang Jeong LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20230207271
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MICROWAVE RADIATION SOURCE
- Publication number 20230178339
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Kenta KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT
- Publication number 20230160067
- Publication date May 25, 2023
- Starfire Industires, LLC
- Brian Edward Jurczyk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE FOR MEASURING DENSITY OF PLASMA, PLASMA PROCESSING SYSTEM, A...
- Publication number 20230102201
- Publication date Mar 30, 2023
- Samsung Electronics Co., Ltd.
- Vladimir Vsevolodovich PROTOPOPOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR PRODUCING LAYERS WITH IMPROVED UNIFORMITY IN...
- Publication number 20230067917
- Publication date Mar 2, 2023
- Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
- Michael VERGÖHL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230062105
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus For Single Chamber Deposition And Etch
- Publication number 20220389571
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCHING METHOD USING POTENTIAL CONTROL OF GRID AND SUBSTRATE
- Publication number 20220375761
- Publication date Nov 24, 2022
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS

Generating means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Dry etching method using potential control of grid and substrate

Plasma processing method and plasma processing apparatus

Plasma apparatus and methods for processing feed material utilizing...

Device for measuring density of plasma, plasma processing system, a...

Plasma processing apparatus

Plasma apparatus and methods for processing feed material utilizing...

System and method of low temperature thin film deposition and in-si...

Plasma processing apparatus

Modular high-frequency source

Microwave coupling/combining device and associated microwave generator

Microwave heating device

Modular reactor for microwave plasma-assisted deposition

PEALD titanium nitride with direct microwave plasma

Plasma processing apparatus, electrostatic attraction method, and e...

System and method of power generation with phase linked solid-state...

Modular microwave source with local lorentz force

Method and device for the plasma processing of containers

Apparatus for plasma processing

High-power solid-state microwave generator for RF energy applications

Microwave output device and plasma processing apparatus

Atmospheric cold plasma jet coating and surface treatment

Plasma processing apparatus

System and method of power generation with phase linked solid-state...

Plasma processing apparatus

Plasma density monitor, plasma processing apparatus, and plasma pro...

Modular microwave plasma source

Remote modular high-frequency source

Methods and apparatus for dynamical control of radial uniformity in...

Methods and apparatus for dynamical control of radial uniformity wi...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...

MICROWAVE PRECLEAN APPARATUS AND PROCESSING METHOD FOR IMPURITY REM...

SUBSTRATE PROCESSING APPARATUS

MODULAR HIGH-FREQUENCY SOURCE

FILM FORMING METHOD AND FILM FORMING APPARATUS

GAS-FLOW-ENGINEERED PLASMA REACTOR FOR EFFICIENTLY PRODUCING FIXED...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS INCLUDING...

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTILIZING...

METHODS AND APPARATUSES FOR FLOWABLE GAP FILL

Multiple Chamber System for Plasma Chemical Vapor Deposition of Dia...

MICROWAVE PLASMA APPARATUS AND METHODS FOR PROCESSING MATERIALS USI...

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND DIELECTR...

Multi-port Phase Compensation Nested Microwave-plasma Apparatus for...

PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA

APPARATUS FOR TREATING SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS AND MICROWAVE RADIATION SOURCE

ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT

DEVICE FOR MEASURING DENSITY OF PLASMA, PLASMA PROCESSING SYSTEM, A...

DEVICE AND METHOD FOR PRODUCING LAYERS WITH IMPROVED UNIFORMITY IN...

FILM FORMING METHOD AND FILM FORMING APPARATUS

Apparatus For Single Chamber Deposition And Etch

DRY ETCHING METHOD USING POTENTIAL CONTROL OF GRID AND SUBSTRATE