Claims
- 1. An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer selected from the group consisting of poly(vinylnaphthalenes), poly(acenaphthalenes) and poly(vinylbiphenyls), which is highly absorbent to mid and/or deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
- 2. A photoresist structure having at least two layers and overlaying a semiconductor substrate comprising
- an antireflective first layer coated upon said substrate wherein the antireflective layer comprises a polymer selected from the group consisting of poly(vinylnaphthalenes), poly(acenaphthalenes) and poly(vinylbiphenyls), wherein said layer has an optical density of at least 2.0 .mu.m at the imaging wavelength of an overlaying photoresist layer, and wherein the antireflective layer is substantially inert to contact reactions with the photoresist layer, and wherein the antireflective layer is insoluble in the developer for the photoresist layer, and
- a second layer coated upon said antireflective first layer comprising a chemically amplified photoresist which is sensitive to ultraviolet radiation having a wavelength in the range from about 180 nm to about 350 nm.
- 3. The photoresist structure of claim 2 wherein the antireflective first layer has an optical density of at least 2.0 .mu.m over the range of wavelengths from about 235 nm to 280 nm.
- 4. The photoresist structure of claim 2 wherein the antireflective first layer is chemically non-reactive with the photoresist second layer.
- 5. The photoresist structure of claim 2 wherein the antireflective first layer is immiscible with the photoresist second layer.
- 6. The photoresist structure of claim 2 wherein the antireflective first layer is essentially insoluble in photoresist casting solvents selected from the group consisting of alcohols, esters, ethers, ketones.
- 7. The photoresist structure of claim 2 wherein the antireflective first layer comprises a poly(vinylnaphthalene).
- 8. The photoresist structure of claim 2 wherein the antireflective first layer comprises a poly(acenaphthalene).
- 9. The photoresist structure of claim 2 wherein the antireflective first layer comprises a poly(vinylbiphenyl).
RELATED APPLICATION
This application is a division of U.S. patent application Ser. No. 08/017,938 now U.S. Pat. No. 5,401,614 which is a division of U.S. patent application Ser. No. 08/055,400 now U.S. Pat. No. 5,380,621, filed May 3, 1993, which is a division of Ser. No. 07/845,404, filed Mar. 3, 1992, entitled "Mid and Deep UV Antireflection Coatings and Methods for Use Thereof," abandoned.
US Referenced Citations (30)
Foreign Referenced Citations (1)
Number |
Date |
Country |
0159428 |
Apr 1984 |
EPX |
Divisions (3)
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Number |
Date |
Country |
Parent |
17938 |
Feb 1993 |
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Parent |
55400 |
May 1993 |
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Parent |
845404 |
Mar 1992 |
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