Patent Application
20130334688
This invention relates to the technical field of manufacture of semiconductor opto-electronic material, particularly, to a preparation method of a multi-elements doped zinc oxide film and the film made thereby and the application of the film.
In recent years, the research on transparent conductive film with flexible substrate has been conducted all over the world, because the transparent conductive film with flexible substrate has a promising prospect of application, it has not only the characteristics of transparent conductive film with glass substrate, but also many unique advantages, such as flexibility, light weight, impact resistance, easy to produce in large area, easy to transport and the like, therefore it has broad application prospects in the field of flexible light-emitting devices, plastic liquid crystal displays and solar cells with plastic substrates and the like.
Currently the majority of the available transparent conductive films are made of the stannum doped indium oxide (Sn-doped In2O3, ITO film for short). Although the ITO film is a transparent conductive film with excellent universal photoelectric properties, and broadest application, the indium has the problems of toxic, expensive, poor stability, and the probability of device performance degradation caused by the indium diffusion, thus the researchers are trying to find an replacement material for ITO with the advantages of inexpensive and excellent performance. The doped zinc oxide system is a hot spot at home and abroad, as the zinc oxide is inexpensive and non-toxic, which may have good electrical and optical properties comparable to ITO after being doped with aluminum, gallium, indium, fluorine and silicon, thus it has become the most competitive transparent conductive film material. However, for a single-element doped zinc oxide film, it is not easy to prepare a film with low resistance in production, and the obtained film has poor conductivity and chemical stability. For example, the gallium doped zinc oxide film has the problems of degraded electronic performance caused by the oxygen absorption on the surfaces and grain boundaries, and the stability of the aluminum doped zinc oxide is not good enough because of the trend of overflow from surface for the oxygen atoms, and so on.
The transparent conductive film made by magnetron sputtering has the advantages of high deposition rate, good film adhesion, easy to control and can realize large area deposition and thus this method has become one of the most studied, the most mature in process and the most widely used processes in industrialized production nowadays. But only the polycrystalline film with poor crystallization quality can be usually prepared on the ordinary domestic magnetron sputtering equipments, and the crystallization quality can be improved by heating the substrate or post high temperature annealing, and the resistivity may be lowered thereby. To prepare a film on an organic flexible substrates, the deposition temperature should not be too high, otherwise severe deformation of the substrate will take place.
A technical problem solved by the present invention is to overcome the shortcomings of prior art, and provide a method for manufacturing a multi-elements doped zinc oxide film and the film made thereby and the application of the film.
Another object of the present invention is to provide a multi-elements doped zinc oxide film made by the above-said method for manufacturing a multi-elements doped zinc oxide film.
Another yet object of the present invention is to provide the application of the above-said multi-elements doped zinc oxide film in the semiconductor opto-electronic elements.
The above-mentioned technical problems can be solved through the following technical solutions: a method for manufacturing a multi-elements doped zinc oxide film and the film made thereby and the application of the film are provided at first aspect, which method comprises following steps:
mixing Ga2O3 powder, Al2O3 powder, SiO2 powder, and ZnO powder, sintering the resulted mixture to give a target, wherein the Ga2O3 powder accounts for 0.5%-10% of the total weight, the Al2O3 powder accounts for 0.5%-5% of the total weight, the SiO2 powder accounts for 0.5%-1.5% of the total weight, and the rest is ZnO powder;
loading the target into a magnetron sputtering chamber, then evacuating the chamber, and setting the operating pressure within the range of 0.2 Pa to 5 Pa, then inletting a mixed gas of an inert gas and a hydrogen gas into the chamber at a flow rate of 15 sccm to 25 sccm, and sputtering on a substrate to give a multi-elements doped zinc oxide film, wherein the power of the sputtering is in the range of 40 W to 200 W.
The embodiments of the present invention provide a preparation method of a multi-element target, which employs magnetron sputtering, and a multi-elements doped zinc oxide film is obtained by sputtering, which method has the advantages of high deposition rate, good film adhesion, easy to control and can realize large area deposition. Furthermore, the means of being multi-element doped may have the effect of low resistance, and improved photoelectric properties. Furthermore, a mixture of an inert gas and a hydrogen gas is used as the working gas in the sputtering chamber, which enables a doped zinc oxide film with lower resistance be obtained at a lower temperature.
Objects, advantages and embodiments of the present invention will be explained below in detail with reference to the drawings and the embodiments. However, it is to be appreciated that the following description of the embodiments is merely exemplary in nature and is no way intended to limit the invention.
Referring to
S01: mixing Ga2O3 powder, Al2O3 powder, SiO2 powder, and ZnO powder, sintering the resulted mixture to give a target, wherein the Ga2O3 powder accounts for 0.5%-40% of the total weight, the Al2O3 powder accounts for 0.5%-5% of the total weight, the SiO2 powder accounts for 0.5%-1.5% of the total weight;
S02: loading the target into a magnetron sputtering chamber, then evacuating the chamber, and setting the operating pressure within the range of 0.2 Pa to 5 Pa, then inletting a mixed gas of an inert gas and a hydrogen gas into the chamber at a flow rate of 15 sccm to 25 sccm, and sputtering on a substrate to give a multi-elements doped zinc oxide film, wherein the power of the sputtering is in the range of 40 W to 200 W.
In the step S01, the Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder are mixed uniformly, wherein the ZnO is used as substrate. The said mixed powders are sintered at the temperature of 900° C.-1300° C. to obtain a sputtering target material. Preferably, the Ga2O3 powder accounts for 2% to 4% of the total weight, the Al2O3 powder accounts for 0.8% to 1.5% of the total weight, the SiO2 powder accounts for 0.6% to 1% of the total weight. The aluminum and gallium may improve the conductivity of the zinc oxide, and the silicon may have the function of stabilizing the conductivity and chemical properties, and the doped gallium may increase the bandwidth of the film, and expand the wavelength range of transmitted light. In step S02, the process of sputtering to give a multi-elements doped zinc oxide film may be carried out by selecting a quartz substrate or an organic flexible substrate. The organic flexible substrate includes: polyethylene terephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN), polyether sulfone (PES) and the like. The flexible substrate has the advantages of good flexibility, low cost, but because of its poor smoothness, low melting point, many processes for manufacturing transparent conductive films don't employ the flexible substrate. The temperature of the substrate is controlled at below 100° C. by cooling water. The substrate is ultrasonic washed in absolute alcohol and deionized water separately and blown to dry in high purity nitrogen before use. The distance between the target and the substrate is preferably in the range of 50 mm to 90 mm. After the target has been loaded into the sputtering chamber, the chamber is evacuated by means of a mechanical pump or a turbo pump to the vacuum degree of 1.0×10−3 Pa to 1.0×10−5 Pa, preferably 6.0×10−4 Pa. To get a multi-elements doped zinc oxide film with excellent performance, the process condition setting is very important. The working gas in the sputtering chamber is a mixture of an inert gas and a hydrogen gas, wherein the molar volume percentage of the hydrogen gas is in the range of 1% to 5%, preferably, the mole percentage of the hydrogen gas is in the range of 3% to 6%, and more preferably, the molar volume percentage of the hydrogen gas is 5%. The flow rate of the mixed gas is preferably in the range of 18 sccm to 22 sccm, and the working pressure is preferably ranged from 0.8 Pa˜1.2 Pa, the sputtering power is preferably ranged from 80 W˜120 W. The thickness of the film is in the range of 150 nm to 500 nm.
The embodiments of the present invention further provide a multi-elements doped zinc oxide film made by the above-said preparation method of a multi-elements doped zinc oxide film, which works at the temperature of 0° C. to 120° C. , and the resistance change rate thereof is less than 15%.
And the application of the above-mentioned multi-elements doped zinc oxide film in the preparation of semiconductor opto-electronic elements is also provided, and the multi-elements doped zinc oxide film is mainly employed in the transparent heating elements, antistatic, electromagnetic wave shield films, and solar transparent electrodes.
The preparation method of multi-elements doped zinc oxide film provided in the embodiment of the present invention employs magnetron sputtering to achieve the greatest degree of reduction of the resistance of the film, furthermore, the doping endows the zinc oxide with stable conductivity and chemical properties, and increased film bandwidth, meanwhile a high transmission in the visible region is ensured. Moreover, with a mixture of an inert gas and a hydrogen gas being used as the working gas in the process of sputtering, a multi-elements doped zinc oxide film with lower resistance may be manufactured under lower temperature.
The present invention will be explained in detail referring to following Examples.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed uniformly, wherein the Ga2O3 powder accounted for 1.5% of the total weight, the Al2O3 powder accounted for 2% of the total weight, the SiO2 powder accounted for 1% of the total weight; the ZnO powder accounted for 95.5% of the total weight, after mixed uniformly, the resulted mixture was sintered at 1250° C. to give a ceramic target of Φ 50×2 mm, then the target was loaded into a vacuum chamber. Then a PET substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, then put into the vacuum chamber. The distance between the target and the substrate was set to be 60 mm. The chamber was evacuated by a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture gas of an argon gas and a hydrogen gas was inlet into the evacuated chamber, wherein the content of the hydrogen gas was 3% (molar volume ratio), and the flow rate of the mixture gas was 20 sccm, the pressure was adjusted to 1.0 Pa. The deposition of the film was initiated at a sputtering power of 100 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmission in visible region of greater than 85%, and a resistivity of 9.3×10−4 Ω·cm.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed together uniformly, wherein the Ga2O3 powder accounted for 2.5% of the total weight, the Al2O3 powder accounted for 2% of the total weight, the SiO2 powder accounted for 1% of the total weight; the ZnO powder accounted for 94.5% of the total weight, after mixed uniformly, the resulted mixture was sintered at 1250° C. to give a ceramic target of Φ 50×2 mm, then the target was loaded into a vacuum chamber. Then a PET substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, then put into the vacuum chamber. The distance between the target and the substrate was set to be 60 mm. The chamber was evacuated by a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture gas of an argon gas and a hydrogen gas was inlet into the evacuated chamber, wherein the content of the hydrogen gas was 5% (molar volume ratio), and the flow rate of the mixture gas was 20 sccm, the pressure was adjusted to 3.0 Pa. The deposition of the film was initiated at a sputtering power of 120 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmission in visible region of greater than 78%, and a resistivity of 8×10−4 Ω·cm.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed uniformly, wherein the Ga2O3 powder accounted for 2% of the total weight, the Al2O3 powder accounted for 2% of the total weight, the SiO2 powder accounted for 1% of the total weight; the ZnO powder accounted for 95% of the total weight, after mixed uniformly, the resulted mixture was sintered at 1250° C. to give a ceramic target of Φ 50×2 mm, then the target was loaded into a vacuum chamber. Then a PET substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, then put into the vacuum chamber. The distance between the target and the substrate was set to be 60 mm. The chamber was evacuated with a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture gas of an argon gas and a hydrogen gas was introduced into the evacuated chamber, wherein the content of the hydrogen was 2% (molar volume ratio), and the flow rate of the mixed gas was 20 sccm, the pressure was adjusted to 2.0 Pa. The deposition of the film was initiated at a sputtering power of 100 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmission in visible region greater than 80%, and a resistivity of 9.9×10−4 Ω·cm.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed uniformly, wherein the Ga2O3 powder accounted for 5% of the total weight, the Al2O3 powder accounted for 2% of the total weight, the SiO2 powder accounted for 1% of the total weight; the ZnO powder accounted for 92% of the total weight, after mixed uniformly, the resulted mixture was sintered at 1250° C. to give a ceramic target of Ω 50×2 mm, then the target was loaded into a vacuum chamber. Then a PET substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, then put into the vacuum chamber. The distance between the target and the substrate was set to be 60 mm. The chamber was evacuated with a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture of an argon and a hydrogen gas was inlet into the evacuated chamber, wherein the content of the hydrogen was 1% (molar volume ratio), and the flow rate of the mixed gas was 20 sccm, the pressure was adjusted to 5.0 Pa. The deposition of the film was initiated at a sputtering power of 90 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmission in visible region of greater than 88%, and a resistivity of 2.5×10−3 Ω·cm.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed uniformly, wherein the Ga2O3 powder accounted for 10% of the total weight, the Al2O3 powder accounted for 2% of the total weight, the SiO2 powder accounted for 1% of the total weight; the ZnO powder accounted for 87% of the total weight, after mixed uniformly, the resulted mixture was sintered at 1250° C. to give a ceramic target of Ω 50×2 mm, then the target was loaded into a vacuum chamber. Then a PET substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, and put into the vacuum chamber. The distance between the target and the substrate was set to be 60 mm. The chamber was evacuated with a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture gas of an argon and a hydrogen was inlet into the evacuated chamber, wherein the content of the hydrogen was 2.5% (molar volume ratio), and the flow rate of the mixed gas was 20 sccm, the pressure was adjusted to 0.5 Pa. The deposition of the film was initiated at a sputtering power of 80 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmission in visible region of greater than 82%, and a resistivity of 3.3×10−3 Ω·cm.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed uniformly, wherein the Ga2O3 powder accounted for 0.5% of the total weight, the Al2O3 powder accounted for 0.5% of the total weight, the SiO2 powder accounted for 0.5% of the total weight; the ZnO powder accounted for 98.5% of the total weight, after mixed uniformly, the resulted mixture was sintered at 900° C. to give a ceramic target of Ω 50×2 mm, then the target was loaded into a vacuum chamber. Then a PET substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, then put into the vacuum chamber. The distance between the target and the substrate was set to be 70 mm. The chamber was evacuated with a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture gas of an argon and a hydrogen was inlet into the evacuated chamber, wherein the content of the hydrogen was 8% (molar volume ratio), and the flow rate of the mixture gas was 15 sccm, the pressure was adjusted to 1.0 Pa. The deposition of the film was initiated at a sputtering power of 40 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmittance in visible region of greater than 72%, and a resistivity of 9.2×10−3 Ω·cm.
Ga2O3 powder, Al2O3 powder, SiO2 powder and ZnO powder were mixed uniformly, wherein the Ga2O3 powder accounted for 0.5% of the total weight, the Al2O3 powder accounted for 5% of the total weight, the SiO2 powder accounted for 1.5% of the total weight; the ZnO powder accounted for 93% of the total weight, after mixed uniformly, the resulted mixture was sintered at 1300° C. to give a ceramic target of Φ 60×2 mm, then the target was loaded into a vacuum chamber. Then a PC substrate was ultrasonic washed in absolute ethanol and deionized water sequentially, and blown to dry with high purity nitrogen, then put into the vacuum chamber. The distance between the target and the substrate was set to be 90 mm. The chamber was evacuated with a mechanical pump and a turbo pump to the vacuum degree of 6.0×10−4 Pa, then a mixture of an argon and a hydrogen was inlet into the evacuated chamber, wherein the content of the hydrogen was 10% (molar volume ratio), and the flow rate of the mixed gas was 15 sccm, the pressure was adjusted to 1.0 Pa. The deposition of the film was initiated at a sputtering power of 200 W. The multi-elements doped zinc oxide film obtained by sputtering has an average transmission in visible region of greater than 70%, and a resistivity of 8.2×10−3 Φ·cm.
The embodiments above are merely the preferable embodiments of the present invention and not intended to limit the present invention. And all changes, equivalent substitution and improvements which come within the meaning and range of equivalency of the present invention are intended to be embraced therein.
| Filing Document | Filing Date | Country | Kind | 371c Date |
|---|---|---|---|---|
| PCT/CN2011/072144 | 3/25/2011 | WO | 00 | 8/30/2013 |
