Claims
- 1. A reflection mirror, for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise beryllium.
- 2. A reflection mirror, for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon.
- 3. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon.
- 4. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon carbide.
- 5. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon nitride.
- 6. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise boron carbide.
- 7. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said first layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon oxide.
- 8. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise beryllium.
- 9. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon carbide.
- 10. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise boron carbide.
- 11. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon nitride.
- 12. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon oxide.
- 13. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon.
- 14. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise beryllium.
- 15. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon carbide.
- 16. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise boron carbide.
- 17. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon nitride.
- 18. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon oxide.
- 19. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten and said second layers comprise silicon.
- 20. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten and said second layers comprise silicon.
- 21. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten and said second layers comprise beryllium.
- 22. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise silicon carbide.
- 23. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise boron carbide.
- 24. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise silicon nitride.
- 25. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise silicon oxide.
- 26. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon.
- 27. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise beryllium.
- 28. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon carbide.
- 29. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise boron carbide.
- 30. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon nitride.
- 31. A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:
- a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less; and
- a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon oxide.
Priority Claims (3)
Number |
Date |
Country |
Kind |
61-231246 |
Oct 1986 |
JPX |
|
61-231247 |
Oct 1986 |
JPX |
|
61-307757 |
Dec 1986 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07/602,922 filed Oct. 25, 1990, now abandoned, which is a continuation of application Ser. No. 07/246,012, filed Sep. 14, 1988, now abandoned, which is a continuation of application Ser. No. 07/102,498 filed on Sep. 29, 1987, now abandoned.
US Referenced Citations (12)
Foreign Referenced Citations (3)
Number |
Date |
Country |
203903 |
Nov 1983 |
DEX |
204693 |
Dec 1983 |
DEX |
266397 |
Nov 1988 |
JPX |
Non-Patent Literature Citations (1)
Entry |
Baumeister, P. and Arnon, O., "Use of Hafnium Dioxide in Multilayer Dielectric Reflectors for the Near UV", Applied Optics, vol. 16, No. 2, Feb. 1977. |
Continuations (3)
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Number |
Date |
Country |
Parent |
602922 |
Oct 1990 |
|
Parent |
246012 |
Sep 1988 |
|
Parent |
102498 |
Sep 1987 |
|