The present invention relates to multilayer ceramic capacitors each able to reduce or prevent generation of vibration noise caused by a piezoelectric phenomenon during mounting.
Conventionally, electronic components such as multilayer ceramic capacitors have been widely used in various electronic devices such as mobile terminal devices including mobile phones and personal computers. Multilayer ceramic capacitors each include a rectangular parallelepiped multilayer body in which dielectric layers and internal electrode layers are alternately laminated, and external electrodes provided on opposite ends of the multilayer body (for example, refer to Japanese Unexamined Patent Application, Publication No. 2000-182888).
Since a dielectric ceramic having a perovskite structure, such as barium titanate, is generally used as the dielectric of the dielectric layers, when an AC voltage is applied while a DC voltage is applied, vibration is generated by a piezoelectric phenomenon. Therefore, when the multilayer ceramic capacitor is mounted on the wiring board and an AC voltage in an audible frequency band of, for example, 20 Hz to 20 kHz is applied to the external electrode, the multilayer ceramic capacitor expands and contracts, and vibrates, ambient air vibrates to generate noise, and the wiring board also vibrates resonantly, such that the noise is amplified and becomes harsh.
Example embodiments of the present invention provide multilayer ceramic capacitors that are each able to reduce or prevent vibration of a dielectric due to a piezoelectric phenomenon occurring when the multilayer ceramic capacitors are mounted on a wiring board and reduce vibration noise.
The inventor of example embodiments of the present invention has discovered that it is possible to reduce or prevent the vibration noise caused by a piezoelectric phenomenon generated when mounting by providing an insulator at a predetermined position of an external electrode of a multilayer ceramic capacitor.
An example embodiment of the present invention provides a multilayer ceramic capacitor that includes a multilayer body including a plurality of dielectric layers and a plurality of internal electrode layers that are alternately laminated, and external electrodes each on a corresponding one of end surfaces in a length direction perpendicular or substantially perpendicular to a lamination direction of the multilayer body, the external electrodes each being connected to the plurality of internal electrode layers. A surface, in a plan view in the length direction, of each of the external electrodes is covered with an insulating layer except for a frame region having a width of about 1 μm or more and about 100 μm or less from an outer peripheral edge of the surface.
According to example embodiments of the present invention, it is possible to provide multilayer ceramic capacitors that are each able to reduce or prevent vibration of a dielectric due to a piezoelectric phenomenon occurring when the multilayer ceramic capacitors are mounted on a wiring board and reduce vibration noise.
The above and other elements, features, steps, characteristics and advantages of the present invention will become more apparent from the following detailed description of the example embodiments with reference to the attached drawings.
Hereinafter, multilayer ceramic capacitors according to example embodiments of the present invention will be described. However, the present invention is not limited thereto. In addition, the drawings may be schematically simplified and drawn in order to explain the contents of the present invention, and the drawn components or the ratio of the dimensions between the components may not coincide with the ratio of the dimensions described in the specification. In addition, components described in the specification may be omitted in the drawings or may be drawn with the number of components omitted.
The multilayer ceramic capacitor 1 includes a multilayer body 2 having a rectangular or substantially rectangular parallelepiped shape. The multilayer body 2 includes an inner layer portion 3. The multilayer body further includes a pair of a first main surface TS1 and a second main surface TS2 opposed to each other in the lamination direction T, a pair of a first end surface LS1 and a second end surface LS2 opposed to each other in the length direction L orthogonal or substantially orthogonal to the lamination direction T, and a pair of a first lateral surface WS1 and a second lateral surface WS2 opposed to each other in the width direction W orthogonal or substantially orthogonal to both the lamination direction T and the length direction L.
Although the dimensions of the multilayer ceramic capacitor 1 are not particularly limited, for example, the dimension in the lamination direction T may be about 0.1 mm to about 2.5 mm, the dimension in the length direction L may be about 0.1 mm to about 3.2 mm, and the dimension in the width direction W may be about 0.1 mm to about 2.5 mm.
The inner layer portion 3 includes a plurality of dielectric layers 5 and a plurality of internal electrode layers 6. The internal electrode layers 6 include first internal electrode layers 6a and second internal electrode layers 6b. The first internal electrode layers 6a and the second internal electrode layers 6b are provided on the dielectric layers 5a and 5b, respectively.
Each of the internal electrode layers 6 extends in the length direction L and has a rectangular or substantially rectangular shape in a plan view in the lamination direction T. Each of the first internal electrode layers 6a extends toward and is exposed at the first end surface LS1 of the multilayer body 2, and each of the second internal electrode layers 6b extends toward and is exposed at the second end surface LS2 of the multilayer body 2.
Each of the dielectric layers 5 is made of a dielectric material. For the dielectric material, for example, a dielectric ceramic including a component such as BaTiO3, CaTiO3, SrTiO3, or CaZrO3 can be used. Further, the dielectric material may be obtained by adding an auxiliary component such as, for example, a Mn compound, a Fe compound, a Cr compound, a Co compound, or a Ni compound to these main components.
The thickness of the dielectric layer 5 is not particularly limited, but may be, for example, about 0.3 μm to about 2.0 μm in an effective region of capacitance generation provided by the first internal electrode layers 6a and the second internal electrode layers 6b.
The number of the dielectric layers 5 is not particularly limited, but may be, for example, 1 to 6000 layers in the effective region of capacitance generation provided by the first internal electrode layers 6a and the second internal electrode layers 6b.
On both upper and lower sides of the inner layer portion 3, outer layer portions 7 are provided which do not include any internal electrode layer 6, but include only the dielectric layers 5. The thickness of each of the outer layer portions 7 is not limited, but may be, for example, about 15 μm to about 150 μm. In addition, the thickness of the dielectric layer in each of the outer layer portions 7 may be larger than the thickness of each of the dielectric layers in the effective region of the capacitance generation in which the internal electrode layers 6 are provided. Further, the material of the dielectric layer in each of the outer layer portions may be different from the material of the dielectric layers in the inner layer portion.
Each of the internal electrode layers 6 is formed by, for example, sintering, on a dielectric layer, an electrically conductive paste including a metal powder defining and functioning as an electrical conductor, an organic solvent, a binder, and a dispersant. The internal electrode layers 6 and the dielectric layers 5 are alternately laminated to define the inner layer portion 3. The internal electrode layers 6 each include a first internal electrode layer 6a and a second internal electrode layer 6b, and the first internal electrode layer 6a and the second internal electrode layer 6b are provided on the dielectric layers 5a and 5b, respectively.
For the internal electrode layers 6, for example, a metal such as Ni, Cu, Ag, Pd, an Ag—Pd alloy, or Au may be used. These metals may be compounds including these metal elements or alloys with other metals.
The thickness of each of the internal electrode layers 6 is not particularly limited, but may be, for example, about 0.3 μm to about 1.5 μm.
A first external electrode 4a and a second external electrode 4b are respectively provided on the first end surface LS1 and the second end surface LS2 of the multilayer body 2.
The first external electrode 4a includes a first base electrode layer 41a and a first plated layer 42a provided on the first base electrode layer 41a.
The second external electrode 4b includes a second base electrode layer 41b and a second plated layer 42b provided on the second base electrode layer 41b.
The first base electrode layer 41a is provided on the first end surface LS1. The first base electrode layer 41a is connected to the first internal electrode layers 6a. In the present example embodiment, the first base electrode layer 41a extends from the first end surface LSI to a portion of the first main surface TS1 and a portion of the second main surface TS2, and a portion of the first lateral surface WS1 and a portion of the second lateral surface WS2.
The second base electrode layer 41b is provided on the second end surface LS2. The second base electrode layer 41b is connected to the second internal electrode layers 6b. In the present example embodiment, the second base electrode layer 41b extends from the second end surface LS2 to a portion of the first main surface TS1 and a portion of the second main surface TS2, and a portion of the first lateral surface WS1 and a portion of the second lateral surface WS2.
Each of the first base electrode layer 41a and the second base electrode layer 41b includes, for example, at least one of a fired layer, an electrically conductive resin layer, a thin film layer, and the like. Each of the first base electrode layer 41a and the second base electrode layer 41b of the present example embodiment is, for example, a fired layer. The fired layer preferably includes a metal component and either a glass component or a ceramic component, or includes a metal component and both a glass component and a ceramic component. The metal component includes, for example, at least one selected from Cu, Ni, Ag, Pd, an Ag—Pd alloy, Au, and the like. The glass component includes, for example, at least one selected from B, Si, Ba, Mg, Al, Li, and the like. For the ceramic component, the same type of ceramic material as the dielectric layer 5 may be used, or a different type of ceramic material may be used. The ceramic component includes, for example, at least one selected from BaTiO3, CaTiO3, (Ba, Ca) TiO3, SrTiO3, CaZrO3, and the like.
The fired layer is formed by, for example, applying an electrically conductive paste including glass and metal to a multilayer body, and firing the resulting product. The fired layer may be a layer obtained by simultaneously firing a multilayer chip having internal electrode layers and dielectric layers, and an electrically conductive paste applied to the multilayer chip, or may be a layer obtained by firing the multilayer chip having internal electrode layers and dielectric layers to obtain a multilayer body, and then applying the electrically conductive paste to the multilayer body, and firing the multilayer body. In addition, when the multilayer chip including g the internal electrode layers and the dielectric layers and the electrically conductive paste applied to the multilayer chip are fired at the same time, the fired layer is preferably formed by firing a material to which a ceramic material is added instead of a glass component. In this case, it is preferable to use the same type of ceramic material as the dielectric layer as the ceramic material to be added. The fired layer may include a plurality of layers.
The thickness in the length direction L of the first base electrode layer 41a located on the first end surface LS1 is preferably, for example, about 3 μm or more and about 160 μm or less in the middle portion of the first base electrode layer 41a in the lamination direction T and the width direction W.
The thickness in the length direction L of the second base electrode layer 41b located on the second end surface LS2 is preferably, for example, about 3 μm or more and about 160 μm or less in the middle portion of the second base electrode layer 41b in the lamination direction T and the width direction W.
In a case where the first base electrode layer 41a is also provided on a portion of at least one of the first main surface TS1 and the second main surface TS2, the thickness of the first base electrode layer 41a provided on this portion in the lamination direction T is preferably, for example, about 3 μm or more and about 40 μm or less in the middle portion of the first base electrode layer 41a provided on this portion in the length direction L and the width direction W.
In a case where the first base electrode layer 41a is also provided on a portion of at least one of the first lateral surface WS1 and the second lateral surface WS2, the thickness of the first base electrode layer 41a provided on this portion in the width direction W is preferably, for example, about 3 μm or more and about 40 μm or less in the middle portion of the first base electrode layer 41a provided on this portion in the length direction L and the lamination direction T.
In a case where the second base electrode layer 41b is also provided on a portion of at least one of the first main surface TS1 and the second main surface TS2, the thickness of the second base electrode layer 41b provided on this portion in the lamination direction T is preferably, for example, about 3 μm or more and about 40 μm or less in the middle portion of the second base electrode layer provided on this portion in the length direction L and the width direction W.
In a case where the second base electrode layer 41b is also provided on a portion of at least one of the first lateral surface WS1 and the second lateral surface WS2, the thickness of the second base electrode layer 41b provided on this portion in the width direction W is preferably, for example, about 3 μm or more and about 40 μm or less in the middle portion of the second base electrode layer 41b provided on this portion in the length direction L and the lamination direction T.
In addition, the first base electrode layer 41a and the second base electrode layer 41b may not be provided, and a first plated layer 42a and a second plated layer 42b described later may be directly provided on the multilayer body 2.
In addition, each of the first base electrode layer 41a and the second base electrode layer 41b is not limited to the fired layer, and each may be, for example, a thin film layer. The thin film layer is formed by a thin film forming method such as, for example, sputtering or vapor deposition. The thin film layer is a layer having a thickness of, for example, about 1 μm or less on which metal particles are deposited.
The first plated layer 42a covers the first base electrode layer 41a.
The second plated layer 42b covers the second base electrode layer 41b.
The first plated layer 42a and the second plated layer 42b may include, for example, at least one of Cu, Ni, Sn, Ag, Pd, an Ag—Pd alloy, Au, and the like. Each of the first plated layer 42a and the second plated layer 42b may include a plurality of layers.
Each of the first plated layer 42a and the second plated layer 42b preferably includes, for example, a two-layer configuration in which Sn plated layers 422a and 422b are provided on Ni plated layers 421a and 421b, respectively. In this case, the Ni plated layers 421a and 421b prevent the first base electrode layer 41a and the second base electrode layer 41b from being eroded by solder when the multilayer ceramic capacitor 1 is mounted. The Sn plated layer improves solder wettability when the multilayer ceramic capacitor 1 is mounted. This facilitates mounting of the multilayer ceramic capacitor 1. When each of the first plated layer 42a and the second plated layer 42b includes such a two-layer configuration of a Ni plated layer and a Sn plated layer, the thickness of each of the Ni plated layer and the Sn plated layer is, for example, preferably about 2 μm or more and about 15 μm or less.
Each of the surfaces of the first external electrode 4a and the second external electrode 4b in a plan view in the length direction L is covered with an insulating layer 8, except for a frame region 9 having a width of, for example, about 1 μm or more and about 100 μm or less from the outer peripheral edge of the surface.
When each of the external electrodes includes the base electrode layer and the plated layer, the insulating layer can be provided in a predetermined range of the surface of the plated layer. However, when the insulating layer is provided in a predetermined range of the surface of the base electrode layer, the plated layer is provided on the surface of the base electrode layer, except for the range in which the insulating layer is provided.
In addition, in a case where the plated layer includes a plurality of layers, the insulating layer can be provided in a predetermined range of the surface of the plated layer functioning as an outermost layer. However, in a case where the insulating layer is provided on the surface of any of the plated layers other than the outermost layer, a plated layer provided on the plated layer on which the insulating layer is provided includes a plated layer laminated at a portion excluding the range in which the insulating layer is provided, such that the insulating layer is provided on the surface of the external electrode that can come into contact with a solder fillet.
In the example embodiment shown in
The multilayer ceramic capacitor 1 is connected to lands 51a and 51b, for example, by applying solder to the surfaces of the first external electrode 4a and the second external electrode 4b below the insulating layer 8. By providing the frame region 9, since the solder fillet can be formed in a range of a certain height from below the outer peripheral edge, it is possible to reliably perform bonding to the wiring board.
The material of the insulating layer 8 is not particularly limited as long as it has insulating properties, but it is preferable to use, for example, a synthetic resin because the insulating layer can be easily formed on the surface of the external electrode. As the synthetic resin, for example, a thermosetting resin such as an epoxy resin, a polyimide resin, and a phenol resin, and a thermoplastic resin such as a polyethylene resin and a polyamide resin can be used.
By providing the insulating layer 8 on each of the surfaces of the first external electrode 4a and the second external electrode 4b corresponding to the region in which the internal electrode layers 6 are laminated when viewed in a plan view in the length direction L, it is possible to prevent the solder fillets 52a and 52b from spreading up to the height at which the internal electrode layers 6 are provided at the time of mounting. With such a configuration, it is possible to effectively reduce or prevent the generation of vibration noise caused by the piezoelectric phenomenon.
The thickness of the insulating layer 8 in the length direction L is, for example, about 200 μm or less, and the insulating layer 8 includes the thickest portion in the middle as viewed in the length direction L. With such a configuration, it is possible to prevent the multilayer ceramic capacitor from increasing in size, and it is possible to reliably prevent the solder fillet from spreading since the middle portion of the surface of the insulating layer protrudes outward from the bottom portion when mounted on the wiring board.
The multilayer ceramic capacitor 1 is mounted by applying solder to the surfaces of the first external electrode 4a and the second external electrode 4b and connecting them to the lands 51a and 51b. However, in the conventional multilayer ceramic capacitor 1, as shown in
The multilayer ceramic capacitor according to the present example embodiment of the present invention was subjected to a test to confirm the advantageous effect of reducing or preventing the vibration noise.
In the validation test, sound pressures (dB) of vibration noises generated when a DC voltage of about 3 V and an AC voltage of about 1 V were applied were measured for an Example in which a multilayer ceramic capacitor in which an insulating layer was provided in a predetermined range on each of the surfaces of the external electrodes of the present invention was used as a sample and a Comparative Example in which a conventional multilayer ceramic capacitor in which an insulating layer was not provided was used as a sample.
As shown in
Although example embodiments of the present invention have been described above, the present invention is not limited to the example embodiments, and can be configured in various modes without departing from the scope of the present invention. For example, although an example in which the insulating layer 8 is provided on both of the first external electrode 4a and the second external electrode 4b has been described in the example embodiments above, the same or substantially the same advantageous effect can be obtained also when the insulating layer 8 is provided on either the first external electrode 4a or the second external electrode 4b.
While example embodiments of the present invention have been described above, it is to be understood that variations and modifications will be apparent to those skilled in the art without departing from the scope and spirit of the present invention. The scope of the present invention, therefore, is to be determined solely by the following claims.
Number | Date | Country | Kind |
---|---|---|---|
2022-130642 | Aug 2022 | JP | national |
This application claims the benefit of priority to Japanese Patent Application No. 2022-130642 filed on Aug. 18, 2022 and is a Continuation Application of PCT Application No. PCT/JP2023/019394 filed on May 24, 2023. The entire contents of each application are hereby incorporated herein by reference.
Number | Date | Country | |
---|---|---|---|
Parent | PCT/JP2023/019394 | May 2023 | WO |
Child | 18760091 | US |