Nickel-chromium nanolaminate coating having high hardness

Information

  • Patent Grant
  • 10844504
  • Patent Number
    10,844,504
  • Date Filed
    Wednesday, November 14, 2018
    5 years ago
  • Date Issued
    Tuesday, November 24, 2020
    3 years ago
  • Inventors
  • Original Assignees
  • Examiners
    • Schleis; Daniel J.
    Agents
    • Seed Intellectual Property Law Group LLP
Abstract
The present disclosure describes electrodeposited nanolaminate materials having layers comprised of nickel and/or chromium with high hardness. The uniform appearance, chemical resistance, and high hardness of the nanolaminate NiCr materials described herein render them useful for a variety of purposes including wear (abrasion) resistant barrier coatings for use both in decorative as well as demanding physical, structural and chemical environments.
Description
BACKGROUND

Electrodeposition is recognized as a low-cost method for forming a dense coating on a variety of conductive materials, including metals, alloys, conductive polymers and the like. Electrodeposition has also been successfully used to deposit nanolaminated coatings on non-conductive material such as non-conductive polymers by incorporating sufficient materials into the non-conductive polymer to render it sufficiently conductive or by treating the surface to render it conductive, for example by electroless deposition of nickel, copper, silver, cadmium etc. a variety of engineering applications.


Electrodeposition has also been demonstrated as a viable means for producing laminated and nanolaminated coatings, materials and objects, in which the individual laminate layers may vary in the composition of the metal, ceramic, organic-metal composition, and/or microstructure features. Laminated coatings and materials, and in particular nanolaminated metals, are of interest for a variety of purposes, including structural, thermal, and corrosion resistance applications because of their unique toughness, fatigue resistance, thermal stability, wear (abrasion resistance and chemical properties.


SUMMARY

The present disclosure is directed to the production NiCr nanolaminated materials having a high hardness. The materials have a variety of uses including, but not limited to, the preparation of coatings that protect an underlying substrate, and which may also increase its strength. In one embodiment hard NiCr coatings and materials are wear/abrasion resistant and find use as wear resistant coatings in tribological applications. In another embodiment the hard NiCr coatings prevent damage to the underlying substrates. Where the NiCr materials are applied as a coating that is more noble then the underlying material upon which it is placed, it may function as a corrosion resistant barrier coating.







DESCRIPTION

1.1 Overview


The present disclosure is directed to the method of producing laminate materials and coatings comprising layers each comprising nickel or nickel and chromium. The materials, which are prepared by electrodeposition, have a Vickers hardness value up to about 750 without the addition of other elements or heat treatments.


In one embodiment the disclosure is directed to an electrodeposition processes for forming a multilayered nickel and chromium containing coating on a substrate or mandrel comprising:


(a) providing one or more electrolyte solutions comprising a nickel salt and/or a chromium salt;


(b) providing a conductive substrate or mandrel for electrodeposition;


(c) contacting at least a portion of the substrate or mandrel with one of said one or more electrolyte solutions; and


(d) passing a first electric current through the substrate or mandrel, to deposit a first layer comprising either nickel or an alloy thereof on the surface; and passing a second electric current through the substrate, to deposit second layer comprising a nickel-chromium alloy on the surface;


(e) repeating step (d) two or more times thereby producing a multilayered coating having first layers of nickel or an alloy thereof and second layers of a nickel-chromium alloy on at least a portion of the surface of the substrate or mandrel.


The method may further comprise the step of separating said substrate or mandrel from the coating, where the coating forms an object comprised of the laminate material.


The high hardness coating produced by the process typically has alternating first and second layers. The first layers are each from about 25 nm to about 75 nm thick, and comprises from about 92% to about 99% nickel, with the balance typically comprising chromium. The second layers are each from about 125 nm to about 175 nm thick, and typically comprise from about 10% to about 21% chromium by weight with the balance typically comprising nickel.


1.2 Definitions


“Laminate” or “laminated” as used herein refers to materials that comprise a series of layers, including nanolaminated materials.


“Nanolaminate” or “nanolaminated” as used herein refers to materials that comprise a series of layers less than 1 micron.


All compositions given as percentages are given as percent by weight unless stated otherwise.


1.3 Nanolaminate NiCr Coatings


1.3.1 Nanolaminate NiCr Materials and Coatings and Methods of Their Preparing


Electrodeposition has been demonstrated as a viable means for producing nanolaminated metal materials and coatings in which the individual laminate layers may vary in the composition or structure of the metal components. In addition, electrodeposition permits the inclusion of other components, such as ceramic particles and organic-metal components.


Multi-laminate materials having layers with different compositions can be realized by moving a mandrel or substrate from one bath to another and electrodepositing a layer of the final material. Each bath represents a different combination of parameters, which may be held constant or varied in a systematic manner. Accordingly, laminated materials may be prepared by alternately electroplating a substrate or mandrel in two or more electrolyte baths of differing electrolyte composition and/or under differing plating conditions (e.g., current density and mass transfer control). Alternatively, laminated materials may be prepared using a single electrolyte bath by varying the electrodeposition parameters such as the voltage applied, the current density, mixing rate, substrate or mandrel movement (e.g., rotation) rate, and/or temperature. By varying those and/or other parameters, laminated materials having layers with differing metal content can be produced in a single bath.


The present disclosure provides a process for forming a multilayered nickel and chromium containing coating on a substrate or mandrel by electrodeposition comprising:


(a) providing one or more electrolyte solutions (baths) comprising a nickel salt and/or a chromium salt;


(b) providing a conductive substrate or mandrel suitable for electrodeposition;


(c) contacting at least a portion of the substrate or mandrel with one of said one or more electrolyte solutions;


(d) passing a first electric current through the substrate or mandrel, to deposit a first layer comprising either nickel or an alloy thereof on the substrate or mandrel; and passing a second electric current through the substrate, to deposit second layer comprising a nickel-chromium alloy on the surface; and


(e) repeating step (d) two or more times thereby producing a multilayered coating having first layers of nickel or an alloy thereof and second layers of a nickel-chromium alloy on at least a portion of the surface of the substrate or mandrel.


Where separate baths are employed to deposit the first and second layers step (d) includes contacting at least a portion of the substrate or mandrel that having the first layer deposited on it with a second of said one or more electrolyte solutions (baths) prior to passing a second electric current through the substrate, to deposit second layer comprising a nickel-chromium alloy on the surface.


Where the electroplated material is desired as an object that is “electroformed” or as a material separated from the substrate or mandrel, the method may further comprise a step of separating the substrate or mandrel from the electroplated coating. Where a step of separating the electroplated material form the substrate or mandrel is to be employed, the use of electrodes (mandrel) that do not form tight bonds with the coating are desirable, such as titanium electrode (mandrel).


In one embodiment, where a single bath is used to deposit the first and second layers, providing one or more electrolyte solutions comprises providing a single electrolyte solution comprising a nickel salt and a chromium salt, and passing an electric current through said substrate or mandrel comprises alternately pulsing said electric current for predetermined durations between said first electrical current density and said second electrical current density; where the first electrical current density is effective to electrodeposit a first composition comprising either nickel or an alloy of nickel and chromium; and the second electrical current density is effective to electrodeposit a second composition comprising nickel and chromium; the process is repeated to producing a multilayered alloy having alternating first and second layers on at least a portion of said surface of the substrate or mandrel.


Regardless of whether the laminated material is produced by electroplating in more than one bath (e.g., alternately plating in two different baths) or in a single baths, the electrolytes employed may be aqueous or non-aqueous. Where aqueous baths are employed they may benefit from the addition of one or more, two or more, or three or more complexing agents, which can be particularly useful in complexing chromium in the +3 valency. Among the complexing agents that may be employed in aqueous baths are one or more of citric acid, ethylendiaminetetraacetic acid (EDTA), triethanolamine (TEA), ethylenediamine (En), formic acid, acetic acid, hydroxyacetic acid, malonic acid, or an alkali metal salt or ammonium salt of any thereof. In one embodiment the electrolyte used in plating comprises a Cr+3 salt (e.g., a tri-chrome plating bath). In another embodiment the electrolyte used in plating comprises either Cr+3 and one or more complexing agents selected from citric acid, formic acid, acetic acid, hydroxyacetic acid, malonic acid, or an alkali metal salt or ammonium salt of any thereof. In still another embodiment the electrolyte used in plating comprises either Cr+3 and one or more amine containing complexing agents selected from EDTA, triethanolamine (TEA), ethylenediamine (En), or salt of any thereof.


The temperature at which the electrodeposition process is conducted may alter the composition of the electrodeposit. Where the electrolyte(s) employed are aqueous, the electrodeposition process will typically be kept in the range of about 18° C. to about 45° C. (e.g., 18° C. to about 35° C.) for the deposition of both the first and second layers.


Both potentiostatic and galvanostatic control of the electrodeposition of the first and second layers is possible regardless of whether those layers are applied from different electrolyte baths or from a single bath. In one embodiment, a single electrolyte bath is employed and the first electrical current ranges from approximately 10 mA/cm2 to approximately 100 mA/cm2 for the deposition of the first layers. In that embodiment the second electrical current ranges from approximately 100 mA/cm2 to approximately 500 mA/cm2 for the deposition of the second layers.


Plating of each layer may be conducted either continuously or by pulse or pulse reverse plating. In one embodiment, the first electrical current is applied to the substrate or mandrel in pulses ranging from approximately 0.001 second to approximately 1 seconds. In another embodiment, the second electrical current is applied to the substrate or mandrel in pulses ranging from approximately 1 second to approximately 100 seconds. In another embodiment, wherein alternating Ni and Cr containing layer are electrodeposited, the electrodeposition may employ periods of DC plating followed by periods of pulse plating.


In one embodiment, plating of the nearly pure nickel layer may be conducted either by direct current or by pulse plating. In one such embodiment, the first electrical current is applied to the substrate or mandrel in pulses ranging from approximately 0.001 second to approximately 1 seconds. In another embodiment, the second electrical current is applied to the substrate or mandrel in pulses ranging from approximately 1 second to approximately 100 seconds. In another embodiment, wherein alternating Ni and Cr containing layer are electrodeposited, the electrodeposition may employ periods of DC plating followed by periods of pulse plating.


To ensure adequate binding of NiCr coatings to substrates it is necessary to preparing the substrate for the electrodeposition (e.g., the surface must be clean, electrochemically active, and the roughness determined to be in in an adequate range). In addition, depending on the substrate it may be desirable to employ a strike layer, particularly where the substrate is a polymer or plastic that has previously been rendered conductive by electroless plating or by chemical conversion of its surface, as in the case for zincate processing of aluminum, which is performed prior to the electroless or electrified deposition. Where a strike layer is applied, it may be chosen from an of a number of metals including, but not limited to, copper nickel, zinc, cadmium, platinum etc. In one embodiment, the strike layer is nickel or a nickel alloy from about 100 nm to about 1000 nm or about 250 nm to about 2500 nm thick. In another embodiment, a first layer applied to a substrate may act as a strike layer, in which case it is applied so that it is directly in contact with a substrate, or in the case of a polymeric substrate rendered conductive by electroless deposition of a metal, directly in contact with the electroless metal layer. Accordingly, in one embodiment a first layer is in contact with the substrate or mandrel. In another embodiment, the second layer is in contact with the substrate or mandrel.


The hard nanolaminate materials, such as coatings, produced by the processes described above will typically comprise alternating first and second layers in addition to any strike layer applied to the substrate. The first layers each having a thickness independently selected from about 25 nm to about 75 nm, from about 25 nm to about 50 nm, from about 35 nm to about 65 nm, from about 40 nm to about 60 nm, or from about 50 nm to about 75 nm. The second layers having thickness independently from about 125 nm to about 175 nm, from about 125 nm to about 150 nm, from about 135 nm to about 165 nm, from about 140 nm to about 160 nm, or from about 150 nm to about 175 nm.


First layers may typically comprise greater than about 92%, 93%, 94%, 95%, 96%, 97%, 98% or 99% nickel. The balance of first layers may be chromium, or may be comprised of one or more, two or more, three or more, or four or more elements selected independently for each first layer from C, Co, Cr, Cu, Fe, In, Mn, Nb, Sn, W, Mo, and P. In one embodiment the balance of the first layers are each an alloy comprising chromium and one or more elements selected independently for each layer from C, Co, Cu, Fe, Ni, W, Mo and/or P.


Second layers may typically comprise about 5% to about 40%, about 5% to about 21%, about 10% to about 14%, about 12% to about 16%, about 14% to about 18%, about 16 to about 21%, about 18% to about 21% or about 18% to about 40% chromium. The balance of second layers may be nickel, or may be comprised of nickel and one or more, two or more, three or more, or four or more elements selected independently for each second layer from C, Co, Cu, Fe, In, Mn, Mo, P, Nb, Ni and W. In one embodiment the balance of the second layers is an alloy comprising nickel and one or more elements selected independently for each layer from C, Co, Cr, Cu, Mo, P, Fe, Ti and W.


In one embodiment, for an element to be considered as being present, it is contained in the electrodeposited material in non-trivial amounts. In such an embodiment a trivial amount may be less than about 0.005%, 0.01%, 0.05% or 0.1% by weight. Accordingly, non-trivial amounts may be greater than 0.005%, 0.01%, 0.05% or 0.1% by weight.


Laminated or nanolaminated materials including coatings prepared as described herein comprise two or more, three or more, four or more, six or more, eight or more, ten or more, twenty or more, forty or more, fifty or more, 100 or more, 200 or more, 500 or more or 1000 or more alternating first and second layers. In such embodiments, the first and second layers are counted as pairs of first and second layers. Accordingly, two layers each having a first layer and second layer, consists of a total of four laminate layers (i.e., each layer is counted separately).


In addition to the methods of preparing hard NiCr materials, the present disclosure is directed to hard NiCr materials, including hard NiCr coatings and electroformed NiCr objects prepared by the methods described above.


1.3.2 Properties and Applications of Nanolaminate NiCr Coatings


1.3.2.1 Surface Properties


The hard NiCr materials described herein have a number of properties that render them useful for both industrial and decorative purposes. The coatings applied are self-leveling and depending on the exact composition of the outermost layer can be reflective to visible light. Accordingly, the hard NiCr materials may serve as a replacement for chrome finishes in a variety of application where reflective metal surfaces are desired. Such applications include, but are not limited to, mirrors, automotive details such as bumpers or fenders, decorative finishes and the like.


In one embodiment the laminated NiCr coatings described herein have a surface roughness (arithmetical mean roughness or Ra) of less than 0.1 micrometer (e.g., 0.09, 0.08, 0.07, or 0.05 microns).


1.3.2.2 Hardness


Through the use of nanolamination it is possible to increase the hardness of NiCr alloys above the hardness observed for homogeneous electrodeposited NiCr compositions (alloys) that have not been heat treated and have the same thickness and average composition as the hard NiCr nanolaminate material. Then laminated NiCr materials have a Vickers microhardness as measured by ASTM E384-11e1 of 550-750, 550-600, 600-650, 650-700, 700-750 or greater than 750 but less than about 900, 950, 1000 or 1100 units without heat treatment. The use of heat treatments in the presence of other elements such as P, C in the first and second layers can increase the hardness of the coating.


In another embodiment the NiCr materials described herein comprising alternating first and second layers, where the first layers that comprise nickel or comprise a nickel-chromium alloy, and the second layers comprise a nickel-chromium alloy. Such materials have a Vickers microhardness as measured by ASTM E384-11e1 of 550-750, 550-600, 600-650, 650-700, 700-750, 750-800, or 800-850 without heat treatment.


In one embodiment, the NiCr materials described herein consist of alternating first and second layers, where the first layers consist of a nickel or a nickel-chromium alloy and second layers consist of a nickel-chromium alloy. Such materials have a Vickers microhardness as measured by ASTM E384-11e1 of 550-750, 550-600, 600-650, 650-700, 700-750, 750-800 or 800-850 without heat treatment.


1.3.2.3 Abrasion Resistance


Due to their high hardness the laminated NiCr materials are useful as a means of providing resistance to abrasion, especially when they are employed as coatings. In one embodiment, the nanolaminate NiCr coatings that have not been heat treated display 5%, 10%, 20%, 30% or 40% less loss of weight than homogeneous electrodeposited NiCr compositions (alloys) that have not been heat treated and have the same thickness and average composition as the hard NiCr nanolaminate material when subject to testing on a Taber Abraser equipped with CS-10 wheels and a 250 g load and operated at room temperature at the same speed for both samples (e.g., 95 RPM). In another embodiment, the laminated NiCr compositions display a higher abrasion resistance when subject to testing under ASTM D4060 than their homogeneous counterpart (e.g., homogeneous electrodeposited counterpart having the average composition of the laminated NiCr composition).


1.3.2.4 Corrosion Protection


The behavior of organic, ceramic, metal and metal-containing coatings in corrosive environments depends primarily on their chemistry, microstructure, adhesion, their thickness and galvanic interaction with the substrate to which they are applied.


NiCr generally acts as barrier coating being more electronegative (more noble) than substrates to which it will be applied, such as iron-based substrates. As such, NiCr coatings act by forming a barrier to oxygen and other agents (e.g., water, acid, base, salts, and/or H2S) causing corrosive damage, including oxidative corrosion. When a barrier coating that is more noble than its underlying substrate is marred or scratched, or if coverage is not complete, the coatings will not work and may accelerate the progress of substrate corrosion at the substrate-coating interface, resulting in preferential attack of the substrate. Consequently, coatings prepared from the hard NiCr coatings described herein offer advantages over softer NiCr nanolaminate coatings as they are less likely to permit a scratch to reach the surface of a corrosion susceptible substrate. Another advantage offered by the hard NiCr laminate coatings described herein are their fully dense structure, which lacks any significant pores or microcracks that extend from the surface of the coating to the substrate. To avoid the formation of microcracks the first layer can be a nickel rich ductile layer that hinders the formation of continuous cracks from the coating surface to the substrate. To the extent that microcracks occur in the high chromium layers, they are small and tightly spaced. The lack of pores and continuous microcracks more effectively prohibits corrosive agents from reaching the underling substrate and renders the laminate NiCr coatings described herein more effective as a barrier coating to oxidative damage of a substrate than an equivalent thickness of electrodeposited chromium.


2.0 Certain Embodiments


1. A process for forming a multilayered nickel and chromium containing coating on a surface of a substrate or mandrel by electrodeposition comprising:

    • (a) providing one or more electrolyte solutions comprising a nickel salt and/or a chromium salt;
    • (b) providing a conductive substrate or mandrel for electrodeposition;
    • (c) contacting at least a portion of the surface of the substrate or mandrel with one of said one or more electrolyte solutions;
    • (d) passing a first electric current through the substrate or mandrel, to deposit a first layer comprising either nickel, or an alloy thereof, on the substrate or mandrel; and passing a second electric current through the substrate, to deposit a second layer comprising a nickel-chromium alloy on the surface;
    • (e) repeating step (d) two or more times thereby producing a multilayered coating having first layers of nickel, or an alloy thereof, and second layers of a nickel-chromium alloy on at least a portion of the surface of the substrate or mandrel; and


      optionally separating the substrate or mandrel from the coating.


2. The process of embodiment 1, wherein:

    • said providing one or more electrolyte solutions comprise providing an electrolyte solution comprising a nickel salt and a chromium salt;
    • passing an electric current through said substrate or mandrel comprises alternately pulsing said electric current for predetermined durations between said first electrical current and said second electrical current (e.g., pulsing for predetermined durations at a first electrical current value and then at a second electrical current value);
    • where said first electrical current is effective to electrodeposit a first composition comprising nickel or an alloy of nickel and chromium; and
    • where said second electrical current is effective to electrodeposit a second composition comprising nickel and chromium;
    • thereby producing a multilayered alloy having alternating first and second layers, said first layer comprising either nickel, or an alloy thereof, and said second layer comprising a nickel-chromium alloy on at least a portion of the surface of the substrate or mandrel.


3. The process of embodiment 1 or embodiment 2, wherein at least one of said one or more electrolyte solutions is an aqueous bath (e.g., aqueous solution) comprising one or more complexing agents.


4. The process of embodiment 3, wherein said complexing agent is selected from one or more, two or more, or three or more of citric acid, ethylenediaminetetraacetic acid (EDTA), triethanolamine (TEA), ethylenediamine (En), formic acid, acetic acid, hydroxyacetic acid, malonic acid or an alkali metal or ammonium salt of any thereof.


5. The process of any of embodiments 1-4, wherein said passing said first electric current through said substrate or mandrel and passing said second electric current through said substrate or mandrel are conducted at a temperature ranging from approximately (about) 18° C. to approximately (about) 35° C., or from approximately (about) 18° C. to approximately (about) 45° C.


6. The process of any of embodiments 1-5, wherein the first electric current has a range from approximately (about) 10 mA/cm2 to approximately (about) 100 mA/cm2.


7. The process of any of embodiments 1-6, wherein the second electric current has a range from approximately (about) 100 mA/cm2 to approximately (about) 500 mA/cm2.


8. The process of any of embodiments 1-7, wherein the first electrical current is applied to the substrate or mandrel in pulses ranging from approximately (about) 0.001 second to approximately (about) 1.00 seconds.


9. The process of any of embodiments 1-8, wherein the second electrical current is applied to the substrate or mandrel in pulses ranging from approximately (about) 0.001 second to approximately (about) 1.00 seconds.


10. The process of any of embodiments 1-9, wherein said first layer is in contact with said substrate or mandrel.


11. The process of any of embodiments 1-9, wherein said second layer is in contact with said substrate or mandrel.


12. The process of any of embodiments 1-11, wherein said first layer has a thickness from about 25 nm to about 75 nm, from about 25 nm to about 50 nm, from about 35 nm to about 65 nm, from about 40 nm to about 60 nm, or from about 50 nm to about 75 nm.


13. The process of any of embodiments 1-12, wherein said second layer has a thickness from about 125 nm to about 175 nm, from about 125 nm to about 150 nm, from about 135 nm to about 165 nm, from about 140 nm to about 160 nm, or from about 150 nm to about 175 nm.


14. The process of any of embodiments 1-13, wherein said first layer comprises greater than about 92%, 93%, 94%, 95%, 96%, 97%, 98% or 99% nickel by weight and a balance of other elements.


15. The process of any of embodiments 1-14, wherein said second layer comprises about 10% to about 21%, about 10% to about 14%, about 12% to about 16%, about 14% to about 18%, about 16% to about 21%, about 18% to about 21% or about 18% to about 40% chromium by weight and a balance of other elements.


16. The process of embodiment 14, wherein said first layer comprises greater than about 92%, 93%, 94%, 95%, 96%, 97%, 98% or 99% nickel, and the balance of the first layer is chromium.


17. The process of embodiment 15, wherein said second layer comprises about 10% to about 21%, about 10% to about 14%, about 12% to about 16%, about 14% to about 18%, about 16% to about 21%, about 18% to about 21% or about 18% to about 40% chromium, and the balance of the second layer is nickel.


18. The process of any of embodiments 1-15, wherein the first layer and/or the second layer comprises one or more, two or more, three or more or four or more elements selected independently for each layer from the group consisting of C, Co, Cu, Fe, In, Mn, Nb, W, Mo, and P.


19. The process of embodiment 18, wherein said elements selected independently for each layer are each present in a non-trivial amount greater than 0.005%, 0.01%, 0.05% or 0.1% by weight.


20. The process of any of embodiments 1-19, comprising two or more, three or more, four or more, six or more, eight or more, ten or more, twenty or more, forty or more, fifty or more, 100 or more, 200 or more, 500 or more or 1000 or more alternating first layers and second layers.


21. An object or coating comprising a multilayered nickel and chromium containing coating prepared by the method of any of embodiments 1-20.


22. An object or coating comprising a multilayered coating comprising a plurality of alternating first layers of nickel or an alloy comprising nickel, and second layers of an alloy comprising nickel and chromium, and optionally comprising a substrate.


23. The object or coating of embodiment 22, wherein said multilayer coating comprises two or more, three or more, four or more, six or more, eight or more, ten or more, twenty or more, forty or more, fifty or more, 100 or more, 200 or more, 500 or more or 1000 or more alternating first and second layers.


24. The object or coating of any of embodiments 22-23, wherein said first layers have a thickness from about 25 nm to about 75 nm, from about 25 nm to about 50 nm, from about 35 nm to about 65 nm, from about 40 nm to about 60 nm or from about 50 nm to about 75 nm.


25. The object or coating of any of embodiments 22-24, wherein said second layers have a thickness from about 125 nm to about 175 nm, from about 125 nm to about 150 nm, from about 135 nm to about 165 nm, from about 140 nm to about 160 nm or from about 150 nm to about 175 nm.


26. The object or coating of any of embodiments 22-25, wherein said first layer is in contact with said substrate or mandrel.


27. The object or coating of any of embodiments 22-26, wherein said second layer is in contact with said substrate or mandrel.


28. The object or coating of any of embodiments 22-27, wherein said first layer comprises greater than about 92%, 93%, 94%, 95%, 96%, 97%, 98% or 99% nickel.


29. The object or coating of any of embodiments 22-28, wherein each second layer comprises chromium in a range independently selected from about 10% to about 21%, about 10% to about 14%, about 12% to about 16%, about 14% to about 18%, about 16% to about 21%, about 18% to about 21% or 18%-40% chromium.


30. The object or coating of embodiment 28, wherein said first layer comprises greater than about 92%, 93%, 94%, 95%, 96%, 97%, 98% or 99% nickel and the balance of the first layer is chromium.


31. The object or coating of embodiment 29, wherein said second layer comprises greater than about 10% to about 21%, about 10% to about 14%, about 12% to about 16%, about 14% to about 18%, about 16% to about 21%, about 18% to about 21% or about 18% to about 40% chromium and the balance of the second layer is nickel.


32. The object or coating of any of embodiments 22-31, wherein said first and/or second layer comprises one or more, two or more, three or more, or four or more elements selected independently from the group consisting of C, Co, Cu, Fe, In, Mn, Nb W, Mo, and P.


33. The object or coating of any of embodiments 22-31, wherein each of said elements are present at concentrations of 0.01% or greater.


34. The object or coating of any of embodiments 22-33, comprising two or more, three or more, four or more, six or more, eight or more, ten or more, twenty or more, forty or more, fifty or more, 100 or more, 200 or more, 500 or more or 1000 or more alternating first and second layers.


35. The object or coating of any of embodiments 22-34, wherein said first layers consist of nickel or a nickel chromium alloy and said second layers consist of a nickel-chromium alloy and wherein said coating has a Vickers microhardness as measured by ASTM E384-11e1 of about 550 to about 750, about 550 to about 600, about 600 to about 650, about 650 to about 700, about 700 to about 750, about 750 to about 800 or about 800 to about 850 without heat treatment.


36. The object or coating of any of embodiments 22-34, wherein said substrate comprises one or metals.


37. The object or coating of embodiment 36, wherein said substrate comprises one or more metals or other elements selected from the group consisting of C, Co, Cu, Fe, In, Mn, Nb, W, Mo, and P.


38. The object or coating of embodiment 37, wherein said substrate is selected from iron or steel.


39. The object or coating of any of embodiments 22-38, wherein said coating has fewer cracks, pores, or microcracks than a monolithic coating of chromium of substantially the same thickness (e.g., an electrodeposited coating of chromium of substantially the same thickness deposited under conditions suitable for deposition of second layers but consisting of chromium).


40. The object or coating of any of embodiments 22-39, wherein said object resists corrosion of said substrate caused by exposure to one or more of water, air, acid, base, salt water, and/or H2S.


41. The object or coating of any of embodiments 36-40, wherein said first layers consists of nickel, or a nickel chromium alloy, and second layers consist of a nickel-chromium alloy, and wherein said coating has a Vickers microhardness as measured by ASTM E384-11e1 of about 550 to about 750, about 550 to about 600, about 600 to about 650, about 650 to about 700, about 700 to about 750, about 750 to about 800 or about 800 to about 850 without heat treatment.


42. The process of any of embodiments 1-20, further comprising separating said multilayered coating from said substrate or mandrel to form a multilayered object.

Claims
  • 1. An object comprising: a nanolaminate coating on at least a portion of a surface of a substrate, the nanolaminate coating comprising a plurality of alternating first layers of a first nickel-chromium alloy comprising greater than about 92% nickel and at least 0.1% chromium, by weight, and second layers of a second nickel-chromium alloy comprising at least 0.1% nickel and about 14% to about 40% chromium, by weight.
  • 2. The object of claim 1, wherein the nanolaminate coating comprises at least 100 layers.
  • 3. The object of claim 1, wherein the first layers have a thickness ranging from about 25 nanometers to about 75 nanometers, and the second layers have a thickness ranging from about 125 nanometers to about 175 nanometers.
  • 4. The object of claim 1, wherein the first layers comprise greater than about 92% nickel, by weight, and the balance of the first layers is chromium.
  • 5. The object of claim 1, wherein the second layers comprise about 14% to about 21% chromium, by weight, and the balance of the second layers is nickel.
  • 6. The object of claim 1, wherein the first layers, the second layers, or both comprise at least one element selected independently from the group consisting of carbon, cobalt, copper, iron, indium, manganese, niobium, tungsten, molybdenum, and phosphorus.
  • 7. The object of claim 1, wherein the nanolaminate coating has a Vickers microhardness as measured by ASTM E384-1 1 el of 550-750 without heat treatment.
  • 8. The object of claim 1, wherein the substrate comprises one or more metals or other elements selected from the group consisting of C, Co, Cu, Fe, In, Mn, Nb, W, Mo, and P.
  • 9. The object of claim 1, further comprising a nickel strike layer between the surface of the substrate and the nanolaminate coating.
  • 10. The object of claim 1, wherein the nanolaminate coating comprises at least twenty layers.
  • 11. The object of claim 1, wherein the first layers comprise greater than about 94% nickel, by weight and the balance of the first layers is chromium.
  • 12. The object of claim 1, wherein the second layers comprise about 14% to about 41% chromium, by weight and the balance of the second layers is nickel.
  • 13. An object comprising: a plurality of alternating layers comprising first layers of a first nickel-chromium alloy comprising greater than about 92% nickel and at least 0.1% chromium, by weight, and second layers of a second nickel-chromium alloy comprising at least 0.1% nickel and about 14% to about 40% chromium, by weight, each layer of the plurality of alternating layers having a thickness of less than one micrometer.
  • 14. The object of claim 13, wherein the first layers comprise greater than about 92% nickel, by weight, and the balance of the first layers is chromium; and wherein the second layers comprise about 14% to about 40% chromium, by weight, and the balance of the second layers is nickel.
  • 15. The object of claim 13, wherein the second layers comprise about 14% to about 21% chromium, by weight, and the balance of the second layers is nickel.
  • 16. The object of claim 13, wherein the first layers comprise greater than about 95% nickel, by weight, and the balance of the first layers is chromium.
  • 17. The object of claim 13, wherein the plurality of alternating layers comprises at least 20 layers.
  • 18. The object of claim 13, wherein the plurality of alternating layers comprises at least 100 layers.
  • 19. The object of claim 13, wherein the first layers have a thickness ranging from about 25 nanometers to about 75 nanometers, and the second layers have a thickness ranging from about 125 nanometers to about 175 nanometers.
CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No. 14/855,252, filed Sep. 15, 2015, which is a continuation of PCT/US14/30381, filed Mar. 17, 2014, which claims the benefit of U.S. Provisional Application No. 61/802,112, filed Mar. 15, 2013, each of which is incorporated herein by reference in its entirety.

US Referenced Citations (246)
Number Name Date Kind
2428033 Nachtman Sep 1947 A
2436316 Lum et al. Feb 1948 A
2470775 Jernstedt et al. May 1949 A
2558090 Jernstedt Jun 1951 A
2642654 Ahrens Jun 1953 A
2678909 Jernstedt et al. May 1954 A
2694743 Ruskin et al. Nov 1954 A
2706170 Marchese Apr 1955 A
2891309 Fenster Jun 1959 A
3090733 Brown May 1963 A
3255781 Gillespie, Jr. Jun 1966 A
3282810 Odekerken Nov 1966 A
3359469 Levy et al. Dec 1967 A
3362851 Dunster Jan 1968 A
3483113 Carter Dec 1969 A
3549505 Hanusa Dec 1970 A
3616286 Aylward et al. Oct 1971 A
3633520 Stiglich, Jr. Jan 1972 A
3716464 Kovac et al. Feb 1973 A
3753664 Klingenmaier et al. Aug 1973 A
3759799 Reinke Sep 1973 A
3787244 Schulmeister et al. Jan 1974 A
3866289 Brown et al. Feb 1975 A
3994694 Clauss et al. Nov 1976 A
3996114 Ehrsam Dec 1976 A
4053371 Towsley Oct 1977 A
4105526 Lewellen, Jr. et al. Aug 1978 A
4107003 Anselrode Aug 1978 A
4191617 Hurley et al. Mar 1980 A
4204918 McIntyre et al. May 1980 A
4216272 Clauss Aug 1980 A
4246057 Janowski et al. Jan 1981 A
4284688 Stücheli et al. Aug 1981 A
4314893 Clauss Feb 1982 A
4405427 Byrd Sep 1983 A
4422907 Birkmaier et al. Dec 1983 A
4461680 Lashmore Jul 1984 A
4464232 Wakano et al. Aug 1984 A
4510209 Hada et al. Apr 1985 A
4519878 Hara et al. May 1985 A
4540472 Johnson et al. Sep 1985 A
4543300 Hara et al. Sep 1985 A
4543803 Keyasko Oct 1985 A
4591418 Snyder May 1986 A
4592808 Doubt Jun 1986 A
4597836 Schaer et al. Jul 1986 A
4620661 Slatterly Nov 1986 A
4652348 Yahalom et al. Mar 1987 A
4666567 Loch May 1987 A
4670356 Sato et al. Jun 1987 A
4678552 Chen Jul 1987 A
4678721 den Broeder et al. Jul 1987 A
4702802 Umino et al. Oct 1987 A
H543 Chen et al. Nov 1988 H
4795735 Liu et al. Jan 1989 A
4834845 Muko et al. May 1989 A
4839214 Oda et al. Jun 1989 A
4869971 Nee et al. Sep 1989 A
4885215 Yoshioka et al. Dec 1989 A
4904542 Mroczkowski Feb 1990 A
4904543 Sakakima et al. Feb 1990 A
4923574 Cohen May 1990 A
4975337 Hyner et al. Dec 1990 A
5043230 Jagannathan et al. Aug 1991 A
5045356 Uemura et al. Sep 1991 A
5056936 Mahrus et al. Oct 1991 A
5059493 Takahata Oct 1991 A
5073237 Bacher et al. Dec 1991 A
5079039 Heraud et al. Jan 1992 A
5156729 Mahrus et al. Oct 1992 A
5156899 Kistrup et al. Oct 1992 A
5158653 Lashmore et al. Oct 1992 A
5190637 Guckel Mar 1993 A
5228967 Crites et al. Jul 1993 A
5268235 Lashmore et al. Dec 1993 A
5300165 Sugikawa Apr 1994 A
5320719 Lasbmore et al. Jun 1994 A
5326454 Engelhaupt Jul 1994 A
5352266 Erb et al. Oct 1994 A
5378583 Guckel et al. Jan 1995 A
5413874 Moysan, III et al. May 1995 A
5431800 Kirchhoff et al. Jul 1995 A
5461769 McGregor Oct 1995 A
5472795 Atita Dec 1995 A
5489488 Asai et al. Feb 1996 A
5500600 Moyes Mar 1996 A
5547096 Kleyn Apr 1996 A
5527445 Palumbo Jun 1996 A
5545435 Steffier Aug 1996 A
5620800 De Leeuw et al. Apr 1997 A
5660704 Murase Aug 1997 A
5679232 Fedor et al. Oct 1997 A
5738951 Goujard et al. Apr 1998 A
5742471 Barbee, Jr. et al. Apr 1998 A
5783259 McDonald Jul 1998 A
5798033 Uemiya et al. Aug 1998 A
5800930 Chen et al. Sep 1998 A
5828526 Kagawa et al. Oct 1998 A
5912069 Yializis et al. Jun 1999 A
5930085 Kitade et al. Jul 1999 A
5942096 Ruzicka et al. Aug 1999 A
5952111 Sugg et al. Sep 1999 A
6036832 Knol et al. Mar 2000 A
6036833 Tang et al. Mar 2000 A
6071398 Martin et al. Jun 2000 A
6143424 Jonte et al. Nov 2000 A
6143430 Miyasaka et al. Nov 2000 A
6193858 Hradil et al. Feb 2001 B1
6203936 Cisar et al. Mar 2001 B1
6212078 Hunt et al. Apr 2001 B1
6214473 Hunt et al. Apr 2001 B1
6284357 Lackey et al. Sep 2001 B1
6312579 Bank et al. Nov 2001 B1
6344123 Bhatnagar Feb 2002 B1
6355153 Uzoh et al. Mar 2002 B1
6409907 Braun et al. Jun 2002 B1
6415942 Fenton et al. Jul 2002 B1
6461678 Chen et al. Oct 2002 B1
6466417 Gill Oct 2002 B1
6468672 Donovan, III Oct 2002 B1
6537683 Staschko et al. Mar 2003 B1
6547944 Schreiber et al. Apr 2003 B2
6592739 Sonoda et al. Jul 2003 B1
6739028 Sievenpiper et al. May 2004 B2
6777831 Gutiérrez, Jr. et al. Aug 2004 B2
6800121 Shahin Oct 2004 B2
6884499 Penich et al. Apr 2005 B2
6902827 Kelly et al. Jun 2005 B2
6908667 Christ et al. Jun 2005 B2
6979490 Steffier Dec 2005 B2
7581933 Bruce et al. Sep 2009 B2
7632590 Punsalan et al. Dec 2009 B2
7736753 Deligianni et al. Jun 2010 B2
8084564 Kano et al. Dec 2011 B2
8152985 Macary Apr 2012 B2
8192608 Matthews Jun 2012 B2
8253035 Matsumoto Aug 2012 B2
8585875 Cummings et al. Nov 2013 B2
8814437 Braun Aug 2014 B2
9005420 Tomantschger et al. Apr 2015 B2
9080692 Tomomori et al. Jul 2015 B2
9108506 Whitaker et al. Aug 2015 B2
9115439 Whitaker Aug 2015 B2
9234294 Whitaker et al. Jan 2016 B2
9273932 Whitaker et al. Mar 2016 B2
9732433 Caldwell et al. Aug 2017 B2
9758891 Bao Sep 2017 B2
9938629 Whitaker et al. Apr 2018 B2
10041185 Sukenari Aug 2018 B2
10253419 Lomasney Apr 2019 B2
10266957 Sugawara et al. Apr 2019 B2
10472727 Lomasney Nov 2019 B2
10513791 Lomasney et al. Dec 2019 B2
10544510 Lomasney Jan 2020 B2
10662542 Caldwell et al. May 2020 B2
10689773 Whitaker et al. Jun 2020 B2
20010037944 Sanada et al. Nov 2001 A1
20020070118 Schreiber et al. Jun 2002 A1
20020100858 Weber Aug 2002 A1
20020179449 Domeier et al. Dec 2002 A1
20030134142 Ivey et al. Jul 2003 A1
20030234181 Palumbo Dec 2003 A1
20030236163 Chaturvedi et al. Dec 2003 A1
20040027715 Hixson-Goldsmith et al. Feb 2004 A1
20040031691 Kelly et al. Feb 2004 A1
20040067314 Joshi et al. Apr 2004 A1
20040154925 Podlaha et al. Aug 2004 A1
20040178076 Stonas et al. Sep 2004 A1
20040211672 Ishigami et al. Oct 2004 A1
20040234683 Tanaka et al. Nov 2004 A1
20040239836 Chase Dec 2004 A1
20050002228 Dieny et al. Jan 2005 A1
20050109433 Danger et al. May 2005 A1
20050181192 Steffier Aug 2005 A1
20050205425 Palumbo et al. Sep 2005 A1
20050221100 Kirihara et al. Oct 2005 A1
20050279640 Shimoyama et al. Dec 2005 A1
20060135281 Palumbo et al. Jun 2006 A1
20060135282 Palumbo et al. Jun 2006 A1
20060201817 Guggemos et al. Sep 2006 A1
20060243597 Matefi-Tempfli et al. Nov 2006 A1
20060269770 Cox et al. Nov 2006 A1
20060272949 Detor Dec 2006 A1
20060286348 Sauer Dec 2006 A1
20070158204 Taylor et al. Jul 2007 A1
20070269648 Schuh et al. Nov 2007 A1
20070278105 Ettel Dec 2007 A1
20080093221 Basol Apr 2008 A1
20080102360 Stimits et al. May 2008 A1
20080226976 Stimits Sep 2008 A1
20080245669 Yoshioka et al. Oct 2008 A1
20080271995 Savastiouk et al. Nov 2008 A1
20090004465 Kano et al. Jan 2009 A1
20090101511 Lochtman et al. Apr 2009 A1
20090130424 Tholen et al. May 2009 A1
20090130425 Whitaker May 2009 A1
20090130479 Detor et al. May 2009 A1
20090155617 Kim et al. Jun 2009 A1
20090159451 Tomantschger et al. Jun 2009 A1
20090283410 Sklar et al. Nov 2009 A1
20100187117 Lingenfelter et al. Jul 2010 A1
20100304063 McCrea et al. Dec 2010 A1
20100304179 Facchini et al. Dec 2010 A1
20100319757 Oetting Dec 2010 A1
20110162970 Sato Jul 2011 A1
20110180413 Whitaker et al. Jul 2011 A1
20110186582 Whitaker et al. Aug 2011 A1
20110256356 Tomantschger et al. Oct 2011 A1
20110277313 Soracco et al. Nov 2011 A1
20120088118 Lomasney Apr 2012 A1
20120118745 Bao May 2012 A1
20120135270 Wilbuer et al. May 2012 A1
20120231574 Wang Sep 2012 A1
20120282417 Garcia et al. Nov 2012 A1
20130052343 Dieny et al. Feb 2013 A1
20130071755 Oguro Mar 2013 A1
20130075264 Cummings et al. Mar 2013 A1
20130130057 Caldwell et al. May 2013 A1
20130186852 Dietrich et al. Jul 2013 A1
20130220831 Vidaurre Heiremans et al. Aug 2013 A1
20130224008 Cheung et al. Aug 2013 A1
20130323473 Dietsch et al. Dec 2013 A1
20140163717 Das et al. Jun 2014 A1
20140231266 Sherrer et al. Aug 2014 A1
20150315716 Whitaker Nov 2015 A1
20150322588 Lomasney et al. Nov 2015 A1
20160002790 Whitaker et al. Jan 2016 A1
20160002803 Sklar Jan 2016 A1
20160002806 Lomasney Jan 2016 A1
20160002813 Lomasney Jan 2016 A1
20160024663 Lomasney Jan 2016 A1
20160145850 Cook et al. May 2016 A1
20160159488 Roach et al. Jun 2016 A1
20160160863 Roach et al. Jun 2016 A1
20170191177 Whitaker et al. Jul 2017 A1
20170191179 Lomasney Jul 2017 A1
20180016692 Caldwell et al. Jan 2018 A1
20180016694 Bao Jan 2018 A1
20180066375 Morgan et al. Mar 2018 A1
20180071980 Lomasney et al. Mar 2018 A1
20180245229 Whitaker et al. Aug 2018 A1
20190309430 Sklar Oct 2019 A1
20190360116 Collinson et al. Nov 2019 A1
20200115998 Lomasney Apr 2020 A1
20200131658 Lomasney et al. Apr 2020 A1
20200173032 Lomasney Jun 2020 A1
Foreign Referenced Citations (39)
Number Date Country
102148339 Aug 1911 CN
1257941 Jun 2000 CN
1380446 Nov 2002 CN
1924110 Mar 2007 CN
101113527 Jan 2008 CN
101195924 Jun 2008 CN
102317504 Jan 2012 CN
39 02 057 Jul 1990 DE
10 2004 006 441 Dec 2005 DE
2 324 813 Nov 1998 GB
S47-2005 Feb 1972 JP
S47-33925 Nov 1972 JP
S52-109439 Sep 1977 JP
58-197292 Nov 1983 JP
S60-97774 May 1985 JP
S61-99692 May 1986 JP
H01-132793 May 1989 JP
H05-251849 Sep 1993 JP
H06-196324 Jul 1994 JP
07-065347 Mar 1995 JP
2000-239888 Sep 2000 JP
2001-181893 Jul 2001 JP
2006-035176 Feb 2006 JP
2009-215590 Sep 2009 JP
10-2015-0132043 Nov 2015 KR
882417 Nov 1918 SU
36121 Apr 1935 SU
8302784 Aug 1983 WO
9514116 May 1995 WO
9700980 Jan 1997 WO
2004001100 Dec 2003 WO
2007045466 Apr 2007 WO
2007138619 Dec 2007 WO
2009045433 Apr 2009 WO
2009079745 Jul 2009 WO
2011033775 Mar 2011 WO
2011110346 Sep 2011 WO
2012145750 Oct 2012 WO
2013133762 Sep 2013 WO
Non-Patent Literature Citations (90)
Entry
“Improvement of Galvanneal Coating Adherence on Advanced High Strength Steel,” Appendix 1: Literature review (Task 1), Progress Report No. 1 to Galvanized Autobody Partnership Program of International Zinc Association, Brussels, Belgium, Jun. 2008-Jul. 2009, Issued: Sep. 2009.
Blum, “The Structure and Properties of Alternately Electrodeposited Metals,” paper presented at the Fortieth General Meeting of the American Electrochemical Society, Lake Placid, New York, 14 pages (Oct. 1, 1921).
Designing with Metals—Power Manufacturing, http://www.pwrmfg.com/power-manufacturing/technical-info/designing-with-metals/, printed Oct. 5, 2017 (2017), 3 pages.
Etminanfar et al., “Corrosion resistance of multilayer coatings of nanolayered Cr/Ni electrodeposited from Cr(III)—Ni(II) bath,” Thin Solid Films, 5322-5327 (2012).
Georgescu et al., “Magnetic Behavior of [Ni/Co—Ni—Mg—N] x n Cylindrical Multilayers prepared by Magnetoelectrolysis,” Phys. Stat. Sol. (a) 189, No. 3, 1051-1055 (2002).
Huang et al., “Characterization of Cr—Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current,” Scripta Materialia, 57:61-64 (2007).
Huang et al., “Hardness variation and annealing behavior of a Cr—Ni multilayer electroplated in a trivalent chromium-based bath,” Surface and Coatings Technology, 203, 3320-3324 (2009).
International Search Report and Written Opinion dated Aug. 7, 2014 for International Application No. PCT/US2014/030381.
Ivanov et al., “Corrosion resistance of compositionally modulated multilayered Zn—Ni alloys deposited from a single bath,” Journal of Applied Electrochemistry, 33:239-244 (2003).
Kalu et al., “Cyclic voltammetric studies of the effects of time and temperature on the capacitance of electrochemically deposited nickel hydroxide,” Journal of Power Sources, 92:163-167 (2001).
Kirilova et al., “Corrosion behaviour of Zn—Co compositionally modulated multilayers electrodeposited from single and dual baths,” Journal of Applied Electrochemistry, 29:1133-1137 (1999).
Onoda et al., “Preparation of Amorphous/Crystalloid Soft Magnetic Multilayer Ni—Co—B Alloy Films by Electrodeposition,” Journal ofMagnetism and Magnetic Materials, 126(1-3):595-598 (Sep. 1, 1993).
Ross, “Electrodeposited Multilayer Thin Films,” Annual Review of Materials Science, 24:159-188 (1994).
Rousseau et al., “Single-bath Electrodeposition of Chromium-Nickel Compositionally Modulated Multilayers (CMM) From a Trivalent Chromium Bath,” Plating and Surface Finishing, pp. 106-110 (Sep. 1999).
Srivastava et al., “Corrosion resistance and microstructure of electrodeposited nickel-cobalt alloy coatings,” Surface & Coatings Technology, 201, (2006) 3051-3060.
Tench et al., “Considerations in Electrodeposition of Compositionally Modulated Alloys,” J Electrochem. Soc., vol. 137, No. 10, 3061-3066 (Oct. 1990).
Thangaraj et al., “Corrosion behaviour of composition modulated multilayer Zn—Co electrodeposits produced using a single-bath technique,” Journal of Applied Electrochemistry, 39:339-345 (Oct. 21, 2008).
Thangaraj et al., “Surface Modification by Compositionally Modulated Multilayered Zn—Fe Coatings,” Chinese Journal of Chemistry, 26:2285-2291 (2008).
Tokarz et al., “Preparation, structural and mechanical properties of electrodeposited Co/Cu multilayers,” Physica Status Solidi, 11:3526-3529 (Jun. 18, 2008).
Weil et al., “Properties of Composite Electrodeposits,” Final Report, Contract No. DAALO3-87-K-0047, U.S. Army Research Office, 21 pages (Jan. 1, 1990).
Wilcox, “Surface Modification With Compositionally Modulated Multilayer Coatings,” The Journal of Corrosion Science and Engineering, 6, Paper 52, 5 pages (submitted Jul. 6, 2003; fully published Jul. 26, 2004).
“Low-temperature iron plating,” web blog article found at http:blog.sina.com.cn/s/blog_48ed0a9c0100024z.html, published Mar. 22, 2006, 3 pages. (with English translation).
Adams et al., “Controlling strength and toughness of multilayer films: A new multiscalar approach,” J. Appl. Phys. 74(2):1015-1021, 1993.
Aizenberg et al., “Skeleton of Euplectella sp.: Structural Hierarchy from the Nanoscale to the Macroscale,” Science 309:275-278, 2005.
Alfantazi et al., “Synthesis of nanocrystalline Zn—Ni alloy coatings,” JMSLD5 15(15):1361-1363, 1996.
Atanassov et al., “Electrodeposition and properties of nickel-manganese layers,” Surface and Coatings Technology 78:144-149, 1996.
Bakonyi et al., “Electrodeposited multilayer films with giant magnetoresistance (GMR): Progress and problems,” Progress in Materials Science 55:107-245, 2010.
Bartlett et al., “Electrochemical deposition of macroporous platinum, palladium and cobalt films using polystyrene latex sphere templates,” Chem. Commun., pp. 1671-1672, 2000.
Beattie et al., “Comparison of Electrodeposited Copper-Zinc Alloys Prepared Individually and Combinatorially,” J. Electrochem. Soc. 150(11):C802-C806, 2003.
Bird et al., “Giant Magnetoresistance in Electrodeposited Ni/Cu and Co/Cu Multilayers,” J. Electrochem. Soc. 142(4):L65-L66, 1995.
Cohen et al., “Electroplating of Cyclic Multilayered Alloy (CMA) Coatings,” J. Electrochem. Soc. 130(10):1987-1995, 1983.
Cowles, “High cycle fatigue in aircraft gas turbines—an industry perspective,” International Journal of Fracture 80(2-3):147-163, 1996.
Despic et al., “Electrochemical Formation of Laminar Deposits of Controlled Structure and Composition,” J. Electrochem. Soc. 136(6):1651-1657, 1989.
Dini et al. “On the High Temperature Ductility Properties of Electrodeposited Sulfamate Nickel,” Plating and Surface Finishing 65(2):36-40, 1978.
Gasser et al., “Materials Design for Acoustic Liners: an Example of Tailored Multifunctional Materials,” Advanced Engineering Materials 6(1-2):97-102, 2004.
Ghanem et al., “A double templated electrodeposition method for the fabrication of arrays of metal nanodots,” Electrochemistry Communications 6:447-453, 2004.
Grimmett et al., “Pulsed Electrodeposition of Iron-Nickel Alloys,” J. Electrochem. Soc. 137(11):3414-3418, 1990.
Hariyanti, “Electroplating of Cu—Sn Alloys and Compositionally Modulated Multilayers of Cu—Sn—Zn—Ni Alloys on Mild Steel Substrate,” Master of Science Thesis, University of Science, Malaysia, Penang, Malaysia, 2007.
Harris et al., “Improved Single Crystal Superalloys, CMSX-4® (SLS)[La+Y] and CMSX-486®,” TMS (The Minerals, Metals & Materials Society), Superalloys, p. 45-52, 2004.
Igawa et al., “Fabrication of SiC fiber reinforced SiC composite by chemical vapor infiltration for excellent mechanical properties,” Journal of Physics and Chemistry of Solids 66:551-554, 2005.
Jeong et al., “The Effect of Grain Size on the Wear Properties of Electrodeposited Nanocrystalline Nickel Coatings,” Scripta Mater. 44:493-499, 2001.
Jia et al., “LIGA and Micromolding” Chapter 4, The MEMS Handbook, 2nd edition, CRC Press, Boca Raton, Florida, Edited by Mohamed Gad-el-Hak, 2006.
Kaneko et al., “Vickers hardness and deformation of Ni/Cu nano-multilayers electrodeposited on copper substrates,” Eleventh International Conference on Intergranular and Interphase Boundaries 2004, Journal of Material Science 40:3231-3236, 2005.
Karimpoor et al., “Tensile Properties of Bulk Nanocrystalline Hexagonal Cobalt Electrodeposits,” Materials Science Forum 386-388:415-420, 2002.
Keckes et al., “Cell-wall recovery after irreversible deformation of wood,” Nature Materials 2:810-814, 2003.
Kockar et al., “Effect of potantiostatic waveforms on properties of electrodeposited NiFe alloy films,” Eur. Phys. J. B(42):497-501, 2004.
Kruth et al., “Progress in Additive Manufacturing and Rapid Prototyping” CIRP Annals 47(2):525-540, 1998.
Lashmore et al., “Electrodeposited Cu—Ni Textured Superlattices,” J. Electrochem. Soc. 135(5):1218-1221, 1988.
Lashmore et al., “Electrodeposited Multilayer Metallic Coatings,” Encyclopedia of Materials Science and Engineering, Supp. vol. 1:136-140, 1988.
Leisner et al., “Methods for electrodepositing composition-modulated alloys,” Journal of Materials Processing Technology 58:39-44, 1996.
Leith et al., “Characterization of Flow-Induced Compositional Structure in Electrodeposited NiFe Composition-Modulated Alloys” J. Electrochem. Soc. 145(8):2827-2833, 1998.
Lekka et al., “Corrosion and wear resistant electrodeposited composite coatings,” Electrochimica Acta 50:4551-4556, 2005.
Lewis et al., “Stability in thin film multilayers and microlaminates: the role of free energy, structure, and orientation at interfaces and grain boundaries,” Scripta Materialia 48:1079-1085, 2003.
Low et al., “Electrodeposition of composite coatings containing nanoparticles in a metal deposit,” Surface & Coating Technology 201:371-383, 2006.
Malone, “New Developments in Electroformed Nickel-Based Structural Alloys,” Plating and Surface Finishing 74(1):50-56, 1987.
Marchese, “Stress Reduction of Electrodeposited Nickel,” Journal of the Electrochemical Society 99(2):39-43, 1952.
Meng et al., “Fractography, elastic modulus, and oxidation resistance of Novel metal-intermetallic Ni/Ni3Al multilayer films,” J. Mater. Res. 17(4):790-796, 2002.
Naslain et al., “Synthesis of highly tailored ceramic matrix composites by pressure-pulsed CVI,” Solid State Ionics 141-142:541-548, 2001.
Naslain, “The design of the fibre-matrix interfacial zone in ceramic matrix composites,” Composites Part A 29A:1145-1155, 1998.
Nicholls, “Advances in Coating Design for High-Performance Gas Turbines,” MRS Bulletin, p. 659-670, 2003.
Parkin et al., “Oscillations in Exchange Coupling and Magnetoresistance in Metallic Superlattice Structures: Co/Ru, Co/Cr, and Fe/Cr,” Physical Review Letters 64(19):2304-2307, 1990.
Pilone et al., “Model of Multiple Metal Electrodeposition in Porous Electrodes,” Journal of the Electrochemical Society 153(5):D85-D90, 2006.
Podlaha et al. “Induced Codeposition: I. An Experimental Investigation of Ni—Mo Alloys,” J. Electrochem. Soc. 143(3):885-892, 1996.
Saleh et al., “Effects of electroplating on the mechanical properties of stereolithography and laser sintered parts,” Rapid Prototyping Journal 10(5)305-315, 2004.
Sanders et al., “Mechanics of hollow sphere foams,” Materials Science and Engineering A347:70-85, 2003.
Sartwell et al., “Replacement of Chromium Electroplating on Gas Turbine Engine Components Using Thermal Spray Coatings,” Report No. NRL/MR/6170-May 8890, Naval Research Laboratory, 2005. (207 pages).
Schwartz, “Multiple-Layer Alloy Plating,” ASM Handbook 5: Surface Engineering, p. 274-276, 1994.
Sherik, “Synthesis, Structure and Properties of Electrodeposited Bulk Nanocrystalline Nickel,” Master's Thesis, Queen's University, Ontario, Canada, 1993.
Shishkovski, “Laser synthesis of functionally graded meso structures and bulk products,” Fizmatlit, Moscow, Russia, pp. 30-38, 2009. (with English Abstract).
Simunovich et al., “Electrochemically Layered Copper-Nickel Nanocomposites with Enhanced Hardness,” J. Electrochem. Soc. 141(1):L10-L11, 1994.
Sperling et al., “Correlation of stress state and nanohardness via heat treatment of nickel-aluminide multilayer thin films,” J. Mater. Res. 19(11):3374-3381, 2004.
Stephenson, Jr., “Development and Utilization of a High Strength Alloy for Electroforming,” Plating 53(2): 183-192, 1966.
Suresh, “Graded Materials for Resistance to Contact Deformation and Damage,” Science 292:2447-2451, 2001.
Switzer et al., “Electrodeposited Ceramic Superlattices,” Science 247(4941):444-446, 1990.
Tench et al., “Enhanced Tensile Strength for Electrodeposited Nickel-Copper Multilayer Composites,” Metallurgical Transactions A (15A):2039-2040, 1984.
Touchstone Research Laboratory, Ltd., Material Safety Data Sheet, CFOAM Carbon Foams, 2008. (4 pages).
Vill et al., “Mechanical Properties of Tough Multiscalar Microlaminates,” Acta metall. mater. 43(2):427-437, 1995.
Voevodin et al., “Superhard, functionally gradient, nanolayered and nanocomposite diamond-like carbon coatings for wear protection,” Diamond and Related Materials 7:463-467, 1998.
Wearmouth et al., “Electroforming with Heat-Resistant, Sulfur-Hardened Nickel,” Plating and Surface Finishing 66(10):53-57, 1979.
Weil et al., “Pulsed Electrodeposition of Layered Brass Structures,” Metallurgical Transactions A 19A:1569-1573, 1988.
Wikipedia, “Gold,” URL= http://en.wikipedia.org/wiki/Gold, version modified Nov. 3, 12 pages, 2008.
Wikipedia, “Silver,” URL= http://en.wikipedia.org/wiki/Silver, version modified Nov. 3, 12 pages, 2008.
Wu et al., “Preparation and characterization of superhard CNx/ZrN multilayers,” J. Vac. Sci. Technol. A 15(3):946-950, 1997.
Yahalom et al., “Formation of composition-modulated alloys by electrodeposition,” Journal of Materials Science 22:499-503, 1987.
Yang et al., “Effects of SiC sub-layer on mechanical properties of Tyranno-SA/SiC composites with multiple interlayers,” Ceramics International 31:525-531, 2005.
Yang et al., “Enhanced elastic modulus in composition-modulated gold-nickel and copper-palladium foils,” Journal of Applied Physics 48(3):876-879, 1977.
Yogesha et al., “Optimization of deposition conditions for development of high corrosion resistant Zn—Fe multilayer coatings,” Journal of Materials Processing Technology 211:1409-1415, 2011.
Zabludovsky et al., “The Obtaining of Cobalt Multilayers by Programme-controlled Pulse Current,” Transactions of the Institute of Metal Finishing 75(5):203-204, 1997.
U.S. Appl. No. 16/496,925, filed Sep. 23, 2019.
U.S. Appl. No. 16/606,723, filed Oct. 18, 2019.
Related Publications (1)
Number Date Country
20190309430 A1 Oct 2019 US
Provisional Applications (1)
Number Date Country
61802112 Mar 2013 US
Continuations (2)
Number Date Country
Parent 14855252 Sep 2015 US
Child 16191386 US
Parent PCT/US2014/030381 Mar 2014 US
Child 14855252 US