Number | Name | Date | Kind |
---|---|---|---|
5498555 | Lin | Mar 1996 | A |
5648287 | Tsai et al. | Jul 1997 | A |
5747373 | Yu | May 1998 | A |
5877535 | Matsumoto | Mar 1999 | A |
5950098 | Oda et al. | Sep 1999 | A |
Entry |
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Spectroscopic ellipsometry investigation of nickel silicide formation by rapid thermal process. Yaozhi Hu, Sing Pin Tay, Feb. 9, 1998 pp. 1820-1824. |
Properties of Metal Silicides-Kinetics of formation of TM Silicide thin fils: self-diffusion P. Gas, F.M. d'Heurle, Jan. 1995 pp. 279-292. |