The disclosure generally relates to non-volatile memory, and more specifically to a non-volatile memory circuit with self-terminating read current.
Conventional circuits employed for reading non-volatile memory exhibit inherent limitations, primarily characterized by constant current flow and high power dissipation during a read cycle. This presents a significant drawback as it impedes the continuous reading of non-volatile memory with an energy efficiency comparable to static random access memory (SRAM). The conventional circuits for reading the resistance of non-volatile memory devices rely on voltage divider circuits, necessitating constant current flow and causing substantial power dissipation. Consequently, these conventional circuits fail to harness the benefits of non-volatility while maintaining continuous cell state presentation.
An illustrative embodiment provides a non-volatile memory circuit. The memory circuit includes a first PMOS transistor which has a source coupled to a DC voltage supply and has a gate and a drain. The memory circuit includes a first NMOS transistor which has a source coupled to a reference potential, a gate coupled to the gate of the first PMOS transistor and has a drain. The memory circuit includes a first memory resistor which has a first terminal coupled to the drain of the first PMOS transistor and has a second terminal. The memory circuit includes a second memory resistor which has a first terminal coupled to the drain of the first NMOS transistor and has a second terminal coupled to the second terminal of the first memory resistor. The memory circuit includes a second PMOS transistor which has a source coupled to the DC voltage supply, a gate coupled to the second terminals of the first and second memory resistors, and has a drain. The memory circuit includes a second NMOS transistor which has a drain coupled to the drain of the second PMOS transistor, a gate coupled to the second terminals of the first and second memory resistors, and has a source coupled to the reference potential. The drains of the second PMOS and NMOS transistors are coupled to the gates of the first PMOS and NMOS transistors.
In an illustrative embodiment, the memory circuit includes a fifth transistor which has a first terminal coupled to receive an input signal, a second terminal coupled to the drain of the first PMOS transistor and a gate coupled to receive a write enable signal. The memory circuit includes a sixth transistor which has a first terminal coupled to the drain of the first NMOS transistor, a second terminal coupled to the reference potential and a gate coupled to the receive the write enable signal. The memory circuit includes a feedback loop formed by a connection between the drains of the second PMOS and NMOS transistors and the gates of the first PMOS and NMOS transistors.
In an illustrative embodiment, a non-volatile memory circuit includes a first transistor which has a first terminal coupled to a DC voltage supply and has a second terminal and a gate. The memory circuit includes a second transistor which has a first terminal coupled to a reference potential, a second terminal, and a gate coupled to the gate of the first transistor. The memory circuit includes a memory resistor circuit which has a first terminal coupled to the second terminal of the first transistor, a second terminal coupled to the second terminal of the second transistor, and has a third terminal. The memory circuit includes an inverter which has a first terminal coupled to the DC voltage supply, a second terminal coupled to the reference potential and a third terminal coupled to the third terminal of the memory resistor circuit.
Reference will now be made in detail to the embodiments, examples of which are illustrated in the accompanying drawings, in which some, but not all embodiments are shown. Indeed, the concepts may be embodied in many different forms and should not be construed as limiting herein. Rather, these descriptions are provided so that this disclosure will satisfy applicable requirements.
With reference to
Memory circuit 100 includes second transistor N1 which has first terminal 116 coupled to reference potential GND, second terminal 118, and has gate 120 coupled to gate 114 of first transistor P1. In an example embodiment, N1 is an NMOS transistor, first terminal 116 of N1 is a source and second terminal 118 of N1 is a drain.
Memory circuit 100 includes memory resistor circuit 122 which has first terminal 124 coupled to second terminal 112 of first transistor P1, second terminal 126 coupled to second terminal 118 of second transistor N1 and has third terminal 128.
Memory circuit 100 includes inverter 130 which has first terminal 132 coupled to DC voltage supply VDD, second terminal 134 coupled to reference potential GND, third terminal 136 coupled to third terminal 128 of memory resistor circuit 122, and fourth terminal 138 coupled to gates 114 and 120 of transistors P1 and N1, respectively.
Memory circuit 100 includes transistor N5 (also referred herein as input transistor) which has first terminal 140 coupled to receive an input signal (also referred as DATA), second terminal 142 coupled to second terminal 112 of first transistor P1 and gate 144 coupled to receive WRITE_ENABLE signal. Memory circuit 100 includes transistor N6 (also referred herein as write enable transistor) which has first terminal 146 coupled to second terminal 118 of second transistor N1, second terminal 148 coupled to reference potential GND and gate 150 coupled to receive the write enable signal.
Memory circuit 200 includes first memory resistor 222 which has first terminal 224 coupled to drain 212 of first PMOS transistor P1 and has second terminal 226. Memory circuit 200 includes second memory resistor 228 which has first terminal 230 coupled to drain 218 of first NMOS transistor N1 and has second terminal 232 coupled to second terminal 226 of first memory resistor 222. First and second memory resistors 222 and 228 form a voltage divider at interconnection junction 234.
Memory circuit 200 includes second PMOS transistor P2 which has source 240 coupled to DC voltage supply VDD, drain 242, and gate 244 coupled to second terminals 226 and 232 of first and second memory resistors 222 and 228. Memory circuit 200 includes second NMOS transistor N2 which has drain 246 coupled to drain 242 of second PMOS transistor P2, source 248 coupled to reference potential GND, and gate 250 coupled to second terminals 226 and 232 of respective first and second memory resistors 222 and 228. Drains 242 and 246 of respective second PMOS and NMOS transistors 242 and 246 are coupled to gates 214 and 220 of respective first PMOS and first NMOS transistors P1 and N1. Thus, a feedback loop is established between second transistors P2 and N2 and first transistors P1 and N1. Memory circuit 200 provides output VOUT at drains 242 and 246 of transistors P2 and N2.
Memory circuit 200 includes fifth transistor N5 which has first terminal 252 coupled to receive an input signal (also referred to as DATA), second terminal 254 coupled to drain 224 of first PMOS transistor P1, and gate 256 coupled to receive WRITE_ENABLE signal. Memory circuit 200 includes sixth transistor N6 which has first terminal 258 coupled to drain 218 of first NMOS transistor N1, second terminal 260 coupled to reference potential GND and gate 262 coupled to the receive the WRITE_ENABLE signal. In some example embodiments, fifth and sixth transistors N5 and N6 are NMOS transistors.
In some example embodiments, first and second memory resistors 222 and 228 are non-volatile memory resistive devices such as, for example, memristors, phase-change memory or magnetic tunnel junction. First and second memory resistors 222 and 228 acquire a first resistive state if a current flows through memory resistors 222 and 228 in a first direction. First and second memory resistors 222 and 228 acquire a second resistive state if a current flows through memory resistors 222 and 228 in a second direction. In some example embodiments, HRS can, for example, be around 30 k Ohms and LRS can be around 10 k Ohms. Memory resistors 222 and 228 generally store or retain their respective acquired resistive states until they are reprogrammed.
As illustrated in
The operation of the non-volatile memory circuit is now described with reference to
During the write operation, VDD (e.g., 0.8V or 3.5V) is enabled and WRITE_ENABLE signal is asserted at gates 256 and 262 of transistors N5 and N6. As a result, transistors N5 and N6 are turned ON. The input signal (e.g., DATA) is then applied at second terminal 252 of transistor N5. If the input signal is a positive voltage (e.g., +0.8 V or +2.5 V), a current flows through transistor N5, through memory resistors 222 and 228 and then through transistor N6 into reference potential GND. As a result, first memory resistor 222 acquires LRS and second memory resistor 228 acquires HRS.
If the input signal is a negative voltage (e.g., −0.8V or −2.5V), the direction of the current flow is reversed. The current flows from reference potential GND through transistor N6 and through memory resistors 228 and 222 and then out of transistor N5. As a result, memory resistor 228 acquires LRS and memory resistor 222 acquires HRS. Although first PMOS transistor P1 and first NMOS transistor N1 both weakly conduct during the write operation, the input signal applied to first terminal 252 of transistor N5 is much greater relative to the voltage at drain 224 of PMOS transistor P1. As such, the input signal forces memory resistors 222 and 228 to be set or programmed to the desired resistive states.
During the read operation, WRITE_ENABLE signal is de-asserted, the input signal is removed and VDD is applied. As a result, a current flows through first PMOS transistor P1 and through first and second memory resistors 222 and 228 and through first NMOS transistor N1 into reference potential GND. If second memory resistor 228 is set at LRS during the write operation, a low voltage is generated across second memory resistor 228 during the read operation. As a result, the low voltage is applied to gates 244 and 250 of PMOS transistor P2 and NMOS transistor N2, respectively. Thus, PMOS transistor P2 is turned ON while NMOS transistor N2 is turned OFF, causing output voltage Vout to be pulled higher to VDD. When Vout is pulled high to VDD, Vout represents a binary bit “1.”
If, however, second memory resistor 228 is set at HRS during the write cycle, a high voltage is generated across second memory resistor 228. As a result, the high voltage is applied to gates 244 and 250 of PMOS transistor P2 and NMOS transistor N2, respectively. Thus, PMOS transistor P2 is turned OFF while NMOS transistor N2 is turned ON, causing the output voltage Vout to be pulled lower to reference potential GND. When Vout is pulled low to GND, Vout represents a binary bit “0.”
Thus, transistors P2 and N2 act as an inverter which provides Vout which has an inverse relation to the voltage at interconnection junction 234. Furthermore, Vout is fed back to gates 214 and 220 of respective transistors P1 and N1 via the feedback loop. As such, depending on the polarity of Vout, either transistor P1 or transistor N1 is turned OFF, thereby limiting current flow through memory resistors 222 and 228 to a low level (e.g., leakage current through transistors P1 or N1).
Also, as VDD approaches 0.8V, PMOS transistors P1 and P2 operate in saturation regions, causing current flow through transistors P1 and P2 to not rise further. As such, the current through first and second memory resistors 222 and 228 are limited to a low level. However, the output voltage Vout is latched and is continuously provided at drains 242 and 246 of transistors P2 and N2, respectively. When VDD is removed, memory circuit 200 retains the stored bit. When VDD is restored, the stored bit is recovered and provided at Vout.
A key advantage of memory circuit 200 is self-terminating read current characteristics. During the read operation, because the current flow through memory resistors 222 and 228 are held at a low level, power consumption is minimized. As a result, memory circuit 200 exhibits lower power consumption during the read cycle while being non-volatile.
During a write cycle, at time T4, VDD 304 is applied. VDD rises to 0.8 V at time T5. Thus, Vout 314 rises up to 0.8 V. At time T6, WRITE_ENABLE 316 is asserted. Also, at time T6, input signal (DATA) 318 is applied which rises from 0 V to 1.0 V. As a result, memory resistor 308 acquires LRS (e.g., 10 k Ohms) and memory resistor 310 acquires HRS (e.g., 30 k Ohms). Thus, in response to a positive input signal, memory resistor 308 acquires LRS (e.g., 10 k Ohms) and memory resistor 310 acquires HRS (e.g., 30 k Ohms).
During the write cycle, when a negative input voltage is applied, memory resistors 308 and 310 reverse their respective resistive states. At time T10, VDD is applied, and at time T11, WRITE_ENABLE 316 is asserted and input voltage is applied. Since the input voltage is negative, memory resistor 308 acquires HRS and memory resistor 310 acquires LRS. As a result, Vout rises up to 0.8 V which correspond to a binary bit “1.”
Memory device 400 includes a plurality of DATA lines 408, WRITE-ENABLE lines 412 (also referred to as word lines) and OUTPUT lines 416. Each memory cell 404 includes a first terminal coupled to one of DATA lines 408 and includes a second terminal coupled to one of WRITE_ENABLE lines 412. Also, each memory cell 404 includes an output terminal coupled to one of OUTPUT lines 416.
During a write operation, memory cells 404 of memory device 400 are set or programmed to store a binary bit by asserting WRITE_ENABLE signal at lines 412 and applying an input signal at lines 408. During a read operation, the stored binary bit is provided at OUTPUT lines 416.
Memory circuit 500 includes PMOS transistors P1, P2, NMOS transistors N1, N2, N5, N6, and memory resistors R1 and R2. NMOS Transistor N5 has first terminal 510 coupled to receive input signal A, second terminal 512 coupled to memory resistor R1 and PMOS transistor P1, and gate 514 coupled to receive signal B. NMOS transistor N6 has gate 520 coupled to receive signal C (enable signal), first terminal 522 coupled to memory resistor R2 and NMOS transistor N1, and second terminal 524 coupled to reference potential GND.
During the write operation, VDD (e.g., 0.8V or 2.5V) is enabled and signals B and C are asserted at gates 514 and 520 of respective transistors NMOS N5 and N6. As a result, transistors N5 and N6 are turned ON. Input signal A is then applied at terminal 510 of transistor N5. If the input signal is a positive voltage (e.g., +0.8 V or +2.5V), a current flows through transistor N5, through memory resistors R1 and R2 and then through transistor N6 into reference potential GND. As a result, memory resistor R1 acquires LRS and memory resistor R2 acquires HRS.
If the input signal A is a negative voltage (e.g., −0.8V or −2.5V), the direction of the current flow is reversed. The current flows from reference potential GND through transistor N6 and through memory resistors R2 and R1 and then out of transistor N5. As a result, memory resistor R2 acquires LRS and memory resistor R1 acquires HRS. Turning on N6 causes node VM to fall, causing the inverter formed by P2 and N2 raise output D to a high voltage, turning off P1, and allowing VH to be driven solely by input signal A, and as such, the input signal forces memory resistors R1 and R2 to be set or programmed to the desired resistive states.
During the restore operation, signals B and C are de-asserted, input signal A is removed and VDD rises from 0V to the final DC supply voltage. As a result, a small current flows through transistor P1 and through first and second memory resistors R1 and R2 and through transistor N1 into reference potential GND. If the memory resistor R1 is set at HRS and the memory resistor R2 is set at LRS during the write operation, a low voltage is generated across memory resistor R2 during the read operation. As a result, the low voltage is applied to gates of transistor P2 and transistor N2. Thus, transistor P2 is turned ON while transistor N2 is turned OFF, causing output voltage D to be pulled higher to VDD. When D is pulled high to VDD, D represents a binary bit “1.”
If, however, memory resistor R1 is set at LRS and memory resistor R2 is set at HRS during the write cycle, a high voltage is generated across memory resistor R2. As a result, the high voltage is applied to gates of PMOS transistor P2 and NMOS transistor N2, respectively. Thus, PMOS transistor P2 is turned OFF while NMOS transistor N2 is turned ON, causing the output D to be pulled lower to reference potential GND. When D is pulled low to GND, D represents a binary bit “0.”
Memory device 600 includes a plurality of BIT-LINEs, WORD-LINEs, and WRITE-ENABLE lines. Each memory cell 404 includes a first terminal coupled to one of the BIT-LINEs, a second terminal coupled to one of the WORD-LINES, and a third terminal coupled to one of the WRITE_ENABLE lines.
During a write operation, memory cells 404 of memory device 600 are set or programmed to store a binary bit by asserting WRITE_ENABLE and WORD-LINE signals and applying data at all of the BIT-LINES simultaneously. During a read operation, a specific word is read by precharging all of the BIT-LINES, asserting the chosen WORD-LINE, and sensing the charge remaining on the BIT-LINES.
In some example embodiments, a non-volatile memory circuit has a binary memory state appearing at a bit cell output and a self-terminating read current to read the binary memory state. The non-volatile memory circuit is configured to provide a constant presentation of the memory state. The memory state is non-volatile and can be repeatedly written to a 0 or 1 value. The read current operatively latches the binary memory state on the initial presence of a sufficient supply voltage. The read current is automatically eliminated upon latching the binary memory state. The memory circuit is robust to power cycling and discontinuity of the read current. In some example embodiments, an array of non-volatile memory circuits include an array of bit cell outputs which are connected to program bits of a field programmable gate array. The array of memory circuits can be incorporated within an SRAM array. Upon application of the supply voltage, the SRAM array automatically restores the data stored before the supply voltage was removed.
Various illustrative components, blocks, modules, circuits, and steps have been described above in general terms of their functionality. Whether such functionality is implemented as hardware or software depends upon the particular application and design constraints imposed on the overall system. The described functionality may be implemented in varying ways for each particular application, but such implementation decision should not be interpreted as causing a departure from the scope of the present disclosure.
For simplicity and clarity, the full structure and operation of all systems suitable for use with the present disclosure is not being depicted or described herein. Instead, only so much of a system as is unique to the present disclosure or necessary for an understanding of the present disclosure is depicted and described.
This application claims priority from U.S. Provisional Application No. 63/491,298, filed Mar. 21, 2023, entitled “NON-VOLATILE MEMORY CIRCUIT WITH AUTOMATIC SELF-TERMINATING READ” assigned to the present assignee and incorporated herein by reference.
Number | Date | Country | |
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63491298 | Mar 2023 | US |