Claims
- 1. A positive active electron beam resist material which comprises a silicon wafer and a polymer having a number average molecular weight of from 10,000 to 1,000,000 and having, in the molecule thereof, repeating fundamental units of formula ##STR33## wherein each of R.sub.1, R.sub.2 and R.sub.3 is hydrogen or a hydrocarbon radical having from 1 to 6 carbon atoms, and R.sub.4 is (a) a partially or completely fluorinated hydrocarbon radical having from 1 to 20 carbon atoms; (b) a --OR.sub.5 group wherein R.sub.5 is a partially or completely fluorinated hydrocarbon radical having from 1 to 8 carbon atoms; (c) a ##STR34## group wherein R.sub.5 has the same meaning as defined above; or (d) a ##STR35## group wherein R.sub.5 has the same meaning as defined above.
- 2. The resist material according to claim 1 wherein said polymer is a member selected from the group of ##STR36##
- 3. The resist material according to claim 1, additionally comprising up to 50 wt%, based on the weight of said polymer, of a phenolic resin.
Priority Claims (3)
Number |
Date |
Country |
Kind |
59-51144 |
Mar 1984 |
JPX |
|
59-158623 |
Jul 1984 |
JPX |
|
59-158624 |
Jul 1984 |
JPX |
|
Parent Case Info
This is a continuation of application Ser. No. 711,989, filed Mar. 14, 1985, now abandoned.
US Referenced Citations (7)
Continuations (1)
|
Number |
Date |
Country |
Parent |
711989 |
Mar 1985 |
|