Patent Application
20070291440
A fired-on-foil ceramic capacitor coated with an encapsulant and embedded in a printed wiring board is disclosed. The application and processing of the encapsulant is designed to be compatible with printed wiring board and integrated circuit (IC) package processes and provides protection to the fired-on-foil capacitor from moisture and printed wiring board fabrication chemicals prior to and after embedding into the structure. Application of said encapsulant to the fired-on-foil ceramic capacitor allows the capacitor embedded inside the printed wiring board to pass 1000 hours of accelerated life testing conducted at 85° C., 85% relative humidity under 5 volts of DC bias.
Compositions are disclosed comprising a polyimide with a water absorption of 2% or less, an organic solvent, and optionally one or more of an inorganic electrically insulating filler, defoamer and colorant dye. Optionally, a hindered hydrophobic epoxy may be added to the composition. The amount of water absorption was determined by ASTM D-570, which is a method known to those skilled in the art.
Applicants determined that the most stable polymer matrix is achieved with the use of crosslinkable resins that also have low moisture absorption of 2% or less, preferably 1.5% or less, more preferably 1% or less. Polymers used in the compositions with water absorption of 1% or less tend to provide cured materials with preferred protection characteristics.
Generally, the polyimide component of the present invention can be represented by the general formula,
where X can be equal to C(CF3)2, SO2, O, Chemical bond, C(CF3)phenyl, C(CF3)CF2CF3, C(CF2CF3)phenyl (and combinations thereof); and where Y is derived from a diamine component comprising from 0 to 30 mole percent of a phenolic-containing diamine selected from the group consisting of 2,2′-bis(3-amino-4-hydroxyphenyl) hexafluoropropane (6F-AP), 3,3′-dihydroxy-4,4′-diaminobiphenyl (HAB), 2,4-diaminophenol, 2,3-diaminophenol, 3,3′-diamino-4,4′-dihydroxy-biphenyl, and 2,2′-bis(3-amino-4-hydroxyphenyl)hexafluoropropane.
Diamines useful in comprising the remaining portion of the diamine component (i.e., that portion comprising from about 70 to 100 mole percent of the total diamine component) can be 3,4′-diaminodiphenyl ether (3,4′-ODA), 4,4′-diamino-2,2′-bis(trifluoromethyl)biphenyl (TFMB), 3,3′,5,5′-tetramethylbenzidine, 2,3,5,6-tetramethyl-1,4-phenylenediamine, 3,3′-diaminodiphenyl sulfone, 3,3′dimethylbenzidine, 3,3′-bis(trifluoromethyl)benzidine, 2,2′-bis-(p-aminophenyl)hexafluoropropane, bis(trifluoromethoxy)benzidine (TFMOB), 2,2′-bis(pentafluoroethoxy)benzidine (TFEOB), 2,2′-trifluoromethyl-4,4′-oxydianiline (OBABTF), 2-phenyl-2-trifluoromethyl-bis(p-aminophenyl)methane, 2-phenyl-2-trifluoromethyl-bis(m-aminophenyl)methane, 2,2′-bis(2-heptafluoroisopropoxy-tetrafluoroethoxy)benzidine (DFPOB), 2,2-bis(m-aminophenyl)hexafluoropropane (6-FmDA), 2,2-bis(3-amino-4-methylphenyl)hexafluoropropane, 3,6-bis(trifluoromethyl)-1,4-diaminobenzene (2TFMPDA), 1-(3,5-diaminophenyl)-2,2-bis(trifluoromethyl)-3,3,4,4,5,5,5-heptafluoropentane, 3,5-diaminobenzotrifluoride (3,5-DABTF), 3,5-diamino-5-(pentafluoroethyl)benzene, 3,5-diamino-5-(heptafluoropropyl)benzene, 2,2′-dimethylbenzidine (DMBZ), 2,2′,6,6′-tetramethylbenzidine (TMBZ), 3,6-diamino-9,9-bis(trifluoromethyl)xanthene (6FCDAM), 3,6-diamino-9-trifluoromethyl-9-phenylxanthene (3FCDAM), 3,6-diamino-9,9-diphenyl xanthene. These diamines can be used alone or in combination with one another.
It has been found that if more than about 30 mole percent of the diamine component is a phenolic containing diamine, the polyimide may be susceptible to unwanted water absorption. As such, the diamine component of the present invention can typically comprise from about 0 to about 30 mole percent of a phenolic-containing diamine to be effective.
The polyimides of the invention are prepared by reacting a suitable dianhydride (or mixture of suitable dianhydrides, or the corresponding diacid-diester, diacid halide ester, or tetracarboxylic acid thereof) with one or more selected diamines. The mole ratio of dianhydride component to diamine component is preferably from between 0.9 to 1.1. Preferably, a slight molar excess of dianhydrides or diamines can be used at mole ratio of about 1.01 to 1.02. End capping agents, such as phthalic anhydride, can be added to control chain length of the polyimide.
Some dianhydrides found to be useful in the practice of the present invention, i.e., to prepare the polyimide component, can be 3,3′,4,4′-diphenylsulfone tetracarboxylic dianhydride (DSDA), 2,2-bis(3,4-dicarboxyphenyl)1,1,1,3,3,3-hexafluoropropane dianhydride (6-FDA), 1-phenyl-1,1-bis(3,4-dicarboxyphenyl)-2,2,2-trifluoroethane dianhydride, 1,1,1,3,3,4,4,4-octylfluoro-2,2-bis(3,4-dicarboxyphenyl)butane dianhydride, 1-phenyl-2,2,3,3,3-pentafluoro-1,1-bis(3,4-dicarboxylphenyl)propane dianhydride, 4,4′-oxydiphthalic anhydride (ODPA), 2,2′-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2′-bis(3,4-dicarboxyphenyl)-2-phenylethane dianhydride, 2,3,6,7-tetracarboxy-9-trifluoromethyl-9-phenylxanthene dianhydride (3FCDA), 2,3,6,7-tetracarboxy-9,9-bis(trifluoromethyl)xanthene dianhydride (6FCDA), 2,3,6,7-tetracarboxy-9-methyl-9-trifluoromethylxanthene dianhydride (MTXDA), 2,3,6,7-tetracarboxy-9-phenyl-9-methylxanthene dianhydride (MPXDA), 2,3,6,7-tetracarboxy-9,9-dimethylxanthene dianhydride (NMXDA) and combinations thereof. These dianhydrides can be used alone or in combination with one another.
The compositions include an organic solvent. The choice of solvent or mixtures of solvents will depend in-part on the reactive resins used in the composition. Any chosen solvent or solvent mixtures must dissolve the resins and not be susceptible to separation when exposed to cold temperatures, for example. An exemplary list of solvents is selected from the group consisting of terpineol, ether alcohols, cyclic alcohols, ether acetates, ethers, acetates, cyclic lactones, and aromatic esters.
Most encapsulant compositions are applied to a substrate or component by screen printing a formulated composition, although stencil printing, dispensing, doctor blading into photoimaged or otherwise preformed patterns or other techniques known to those skilled in the art are possible.
Thick-film encapsulant pastes which are printed must be formulated to have appropriate characteristics so that they can be printed readily. Thick-film encapsulant compositions, therefore, include an organic solvent suitable for screen printing and optional additions of defoaming agents, colorants and finely divided inorganic fillers as well as resins. The defoamers help to remove entrapped air bubbles after the encapsulant is printed. Applicants determined that silicone containing organic defoamers are particularly suited for defoaming after printing. The finely divided inorganic fillers impart some measure of thixotropy to the paste, thereby improving the screen printing rheology. Applicants determined that fumed silica is particularly suited for this purpose. Colorants may also be added to improve automated registration capability. Such colorants may be organic dye compositions, for example. The organic solvent should provide appropriate wettability of the solids and the substrate, have sufficiently high boiling point to provide long screen life and a good drying rate. The organic solvent along with the polymer also serves to disperse the finely divided insoluble inorganic fillers with an adequate degree of stability. Applicants determined that DBE-2 and butyl carbitol acetate are particularly suited for the screen printable paste compositions of the invention. Additionally, the composition could comprise a photopolymer for photodefining the encapsulant for use with very fine features.
Generally, thick-film compositions are mixed and then blended on a three-roll mill. Pastes are typically roll-milled for three or more passes at increasing levels of pressure until a suitable dispersion has been reached. After roll milling, the pastes may be formulated to printing viscosity requirements by addition of solvent.
Heating of the paste or liquid composition is accomplished by any number of standard curing methods including convection heating, forced air convection heating, vapor phase condensation heating, conduction heating, infrared heating, induction heating, or other techniques known to those skilled in the art.
One advantage that the polymers provide to the compositions of the invention is a relatively low heating temperature. The compositions can be heated with a temperature of equal to or less than 190° C. over a reasonable time period. This is particularly advantageous as it is compatible with printing wiring board processes and avoids oxidation of copper foil or damage or degradation of component properties.
It is to be understood, that the 190° C. temperature is not a maximum temperature that may be reached in a heating profile. For example, the compositions can also be heated using a peak temperature up to about 350° C. with a short infrared cure. The term “short infrared cure” is defined as providing a curing profile with a high temperature spike over a period that ranges from a few seconds to a few minutes.
Another advantage that the polymers provide to the compositions of the inventions is a relatively high adhesion to prepreg when bonded to the prepreg using printed wiring board or IC package substrate lamination processes. This allows for reliable lamination processes and sufficient adhesion to prevent de-lamination in subsequent processes or use.
The encapsulant paste compositions of the invention can further include one or more metal adhesion agents. Preferred metal adhesion agents are selected from the group consisting of polybenzimidazole, 2-mercaptobenzimidazole (2-MB) and benzotriazole.
The compositions of the invention can also be provided in a solution and used in IC and wafer-level packaging as semiconductor stress buffers, interconnect dielectrics, protective overcoats (e.g., scratch protection, passivation, etch mask, etc.), bond pad redistribution, and solder bump underfills. One advantage provided by the compositions is the low heating temperature of less than 190° C. or short duration at peak temperature of 350° C. with short IR cure. Current packaging requires a cure temperature of about 300° C.±25° C.
As noted the composition(s) of the present invention are useful in many applications. The composition(s) may be used as protection for any electronic, electrical or non-electrical component. For example, the composition(s) may be useful in integrated circuit packages, wafer-level packages and hybrid circuit applications in the areas of semiconductor junction coatings, semiconductor stress buffers, interconnect dielectrics, protective overcoats for bond pad redistribution, “glob top’ protective encapsulation of semiconductors, or solder bump underfills. Furthermore, the compositions may be useful in battery automotive ignition coils, capacitors, filters, modules, potentiometers, pressure sensitive devices, resistors, switches, sensors, transformers, voltage regulators, lighting applications such as LED coatings for LED chip carriers and modules, sealing and joining medical and implantable devices, and solar cell coatings.
Test procedures used in the testing of the compositions of the invention and for the comparative examples are provided as follows:
Insulation Resistance
Insulation resistance of the capacitors is measured using a Hewlett Packard high resistance meter.
Temperature Humidity Bias (THB) Test
THB Test of ceramic capacitors embedded in printed wiring boards involves placing the printed wiring board in an environmental chamber and exposing the capacitors to 85° C., 85% relative humidity and a 5 volt DC bias. Insulation resistance of the capacitors is monitored every 24 hours. Failure of the capacitor is defined as a capacitor showing less than 50 meg-ohms in insulation resistance.
Brown Oxide Test
The device under test was exposed to an Atotech brown oxide treatment with a series of steps: (1) 60 sec. soak in a solution of 4-8% H2SO4 at 40° C., (2) 120 sec. soak in soft water at room temperature, (3) 240 sec soak in a solution of 3-4% NaOH with 5-10% amine at 60° C., (4) 120 sec. soak in soft water at room temperature, (5) 120 sec. soak in 20 ml/l H2O2 and H2SO4 acid with additive at 40° C., (6) a soak for 120 sec. in a solution of Part A 280, Part B 40 ml/l at 40° C., and (7) a deionized water soak for 480 sec. at room temperature.
Insulation resistance of the capacitor was then measured after the test and failure was defined as a capacitor showing less than 50 Meg-Ohms.
Black Oxide Test
Black oxide processes are similar nature and scope to the brown oxide procedures described above, however the acid and base solutions in a traditional black oxide process can possess concentrations as high as 30%. Thus, the reliability of encapsulated dielectrics was evaluated after exposure to 30% sulfuric acid and 30% caustic solutions, 2 minute and 5 minute exposure times respectively.
Corrosion Resistance Test
Samples of the encapsulant are coated on copper foil and the cured samples were placed in a fixture that contacts the encapsulant coated side of the copper foil to 3% NaCl solution in water that was heated to 60° C. A 2V and 3V DC bias was applied respectively during this test. The corrosion resistance (Rp) was monitored periodically during a 10-hour test time.
Water Permeation Test
Samples of the encapsulant were coated on copper foil and the cured samples wee placed in a fixture that contacts the encapsulant coated side of the copper foil to 3% NaCl solution in water that was heated to 60° C. No bias was applied during this test. The water permeation rate indicated by a capacitance resistance was monitored periodically during a 10-hour test time.
Polyimide Film Moisture Absorption Test
The ASTM D570 method is used where polyimide solution is coated with a 20-mil doctor knife on a one oz. copper foil substrate. The wet coating is dried at 190° C. for about 1 hour in a forced draft oven to yield a polyimide film of 2 mils thickness. In order to obtain a thickness of greater than 5 mils as specified by the test method, two more layers are coated on top of the dried polyimide film with a 30 min 190° C. drying in a forced draft oven between the second and third coating. The three layer coating is dried 1 hr at 190° C. in a forced draft oven and then is dried in a 190° C. vacuum oven with a nitrogen purge for 16 hrs or until a constant weight is obtained. The polyimide film is removed from the copper substrate by etching the copper using commercially available acid etch technology. Samples of one inch by 3-inch dimensions are cut from the free-standing film and dried at 120° C. for 1 hour. The strips are weighed and immersed in deionized water for 24 hrs. Samples are blotted dry and weighed to determine the weight gain so that the percent water absorption can be calculated. Film samples were also placed in an 85/85 chamber for 48 hours to measure the water uptake of the samples under these conditions.
The following glossary contains a list of names and abbreviations for each ingredient used:
A polyimide was prepared by conversion of a polyamic acid to polyimide with chemical imidization. To a dry three neck round bottom flask equipped with nitrogen inlet, mechanical stirrer and condenser was added 800.45 grams of DMAC, 89.98 grams of 3,3′-bis-(trifluoromethyl)benzidine (TFMB), 3.196 grams 3,3′-dihydroxy-4,4′-diaminobiphenyl (HAB) and 0.878 grams of phthalic anhydride (to control molecular weight).
To this stirred solution was added over one hour 104.87 grams of 3,3′,4,4′-diphenylsulfone tetracarboxylic dianhydride (DSDA). The solution of polyamic acid reached a temperature of 33° C. and was stirred without heating for 16 hrs. 119.56 grams of acetic anhydride were added followed by 109.07 grams of 3-picoline and the solution was heated to 80° C. for 1 hour.
The solution was cooled to room temperature, and the solution added to an excess of methanol in a blender to precipitate the product polyimide. The solid was collected by filtration and was washed 2 times by re-blending the solid in methanol. The product was dried in a vacuum oven with a nitrogen purge at 150° C. for 16 hrs to yield 188.9 grams of product having a number average molecular weight of 46,300 and a weight average molecular weight of 93,900. The molecular weight of the polyimide polymer was obtained by size exclusion chromatography using polystyrene standards. Some of the phenolic groups were acetylated under the conditions used to chemically dehydrate the poly(amic acid) as determined by NMR analysis.
The polyimide was dissolved at 20% solids in a 60/40 weight/weight mixture of propyleneglycol diacetate (PGDA)/Dowanol® PPh.
A polyimide based on 6FDA and TFMB was prepared according to the procedure in Example 1. The yield was 181 g, the number average molecular weight was 48,500 g/m according to GPC analysis, the weight average molecular weight was 110,000 g/m. The polyimide was dissolved at 25% solids in DBE-2. The polyimide was also dissolved at 25% solids by weight in butyl carbitol acetate.
A polyimide based on 6FDA, TFMB, and 6F-AP (90/10 amine molar ratio) was prepared according to the procedure in Example 1. The yield was 185 g, the number average molecular weight was 44,200 g/m according to GPC analysis, the weight average molecular weight was 93,000 g/m. The polyimide was dissolved at 20% solids in butyl carbitol acetate.
A polyimide based on 6FDA, TFMB, and 6F-AP (75/25 amine molar ratio) was prepared according to the procedure in Example 1. The yield was 178 g, the number average molecular weight was 39,600 g/m according to GPC analysis, the weight average molecular weight was 84,700 g/m. The polyimide was dissolved at 20% solids in butyl carbitol acetate.
An encapsulant composition was prepared according to the following composition and procedure:
The mixture was roll milled with a 1-mil gap with 3 passes each at 0, 50, 100, 200, 250 and 300 psi to yield well dispersed paste.
Capacitors on commercial 96% alumina substrates were covered by encapsulant compositions and used as a test vehicle to determine the encapsulants resistance to selected chemicals. The test vehicle was prepared in the following manner as schematically illustrated in
As shown in
The electrode pattern was dried at 120° C. for 10 minutes and fired at 930° C. under copper thick-film nitrogen atmosphere firing conditions.
As shown in
As shown in
The first dielectric layer, the second dielectric layer, and the copper paste electrode were then co-fired at 930° C. under copper thick-film firing conditions. The encapsulant composition was screen printed through a 325 mesh screen over the entirety of the capacitor electrode and dielectric except for the two fingers using the pattern shown in
After encapsulation, the average capacitance of the capacitors was 41.4 nF, the average loss factor was 1.5%, the average insulation resistance was 2.2 Gohms. The coupons were then dipped in a 5% sulfuric acid solution at room temperature for 6 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. The average capacitance, loss factor, and insulation resistance were 40.8 nf, 1.5%, 1.9 Gohm respectively after the acid treatment. Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 2.2 lbf/inch over the copper electrode and 2.8 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorption test was 0.16% under 85/85 conditions. Example 6
An encapsulant with the following composition containing 11% by weight CAB-O-SIL TS-500 fumed silica was prepared according to the procedure outlined in Example 5.
The encapsulant was printed and cured over the capacitors prepared on alumina substrates as described in Example 5. To evaluate the encapsulant stability in the presence of strong acids and bases, selected coupons were then dipped in a 5% sulfuric acid solution at 45° C. for 2 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. Additional coupons were exposed to a 5% sodium hydroxide bath at 60° C. for 5 minutes. After exposure, these coupons were also rinsed with deionized water and dried prior to testing. The table below summarizes capacitor properties before and after acid and base exposure.
Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 3.6 lbf/inch over the copper electrode and 4.0 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorption test was 0.12% under 85/85 conditions.
An encapsulant with the following composition containing 5.8% by weight CAB-O-SIL TS-500 fumed silica was prepared according to the procedure outlined in Example 5.
The encapsulant was printed and cured over the capacitors prepared on alumina substrates as described in Example 5. To evaluate the encapsulant stability in the presence of strong acids and bases, selected coupons were then dipped in a 5% sulfuric acid solution at 45° C. for 2 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. Additional coupons were exposed to a 5% sodium hydroxide bath at 60° C. for 5 minutes. After exposure, these coupons were also rinsed with deionized water and dried prior to testing. The table below summarizes capacitor properties before and after acid and base exposure.
Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 4.2 lbf/inch over the copper electrode and 4.6 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorbtion test was 0.27% under 85/85 conditions.
An encapsulant with the following composition containing 5.8% by weight CAB-O-SIL TS-500 fumed silica was prepared according to the procedure outlined in Example 5.
The encapsulant was printed and cured over the capacitors prepared on alumina substrates as described in Example 5. To evaluate the encapsulant stability in the presence of strong acids and bases, selected coupons were then dipped in a 5% sulfuric acid solution at 45° C. for 2 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. Additional coupons were exposed to a 5% sodium hydroxide bath at 60° C. for 5 minutes. After exposure, these coupons were also rinsed with deionized water and dried prior to testing. The table below summarizes capacitor properties before and after acid and base exposure.
Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 4.1 lbf/inch over the copper electrode and 4.4 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorption test was 0.31% under 85/85 conditions.
An encapsulant based on the polymer solution from Example 3 was printed and cured over the capacitors prepared on alumina substrates as described in Example 5. No silica was added to this sample so roll milling was not necessary. To evaluate the encapsulant stability in the presence of strong acids and bases, selected coupons were then dipped in a 5% sulfuric acid solution at 45° C. for 2 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. Additional coupons were exposed to a 5% sodium hydroxide bath at 60° C. for 5 minutes. After exposure, these coupons were also rinsed with deionized water and dried prior to testing. The table below summarizes capacitor properties before and after acid and base exposure.
Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 4.4 lbf/inch over the copper electrode and 4.8 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorption test was 0.29% under 85/85 conditions.
An encapsulant based on the polymer solution from Example 4 was printed and cured over the capacitors prepared on alumina substrates as described in Example 5. No silica was added to this sample so roll milling was not necessary. To evaluate the encapsulant stability in the presence of strong acids and bases, selected coupons were then dipped in a 5% sulfuric acid solution at 45° C. for 2 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. Additional coupons were exposed to a 5% sodium hydroxide bath at 60° C. for 5 minutes. After exposure, these coupons were also rinsed with deionized water and dried prior to testing. The table below summarizes capacitor properties before and after acid and base exposure.
Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 4.1 lbf/inch over the copper electrode and 4.3 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorption test was 0.33% under 85/85 conditions.
An encapsulant based on the polymer solution from Example 2 (butyl carbitol acetate solvent) was printed and cured over the capacitors prepared on alumina substrates as described in Example 5. No silica was added to this sample so roll milling was not necessary. To evaluate the encapsulant stability in the presence of strong acids and bases, selected coupons were then dipped in a 5% sulfuric acid solution at 45° C. for 2 minutes, rinsed with deionized water, then dried at 120° C. for 30 minutes. Additional coupons were exposed to a 5% sodium hydroxide bath at 60° C. for 5 minutes. After exposure, these coupons were also rinsed with deionized water and dried prior to testing. The table below summarizes capacitor properties before and after acid and base exposure.
Unencapsulated coupons did not survive the acid and base exposures.
Three inch squares of the encapsulant paste were also printed and cured on 6″ square one oz. copper sheets to yield defect-free coatings suitable for corrosion resistance testing as described above. The coatings were exposed for 12 hours to a 3% NaCl solution under 2V and 3V DC bias. The corrosion resistance remained above 7×109 ohms.cm2 at 0.01 Hz, during the test.
In a water permeation test, the encapsulant film capacitance remained unchanged during an immersion time of >450 minutes. Coupons were prepared according to the procedure outlined in Example 11. Using these test coupons, the adhesion of the encapsulant was measured to be 3.6 lbf/inch over the copper electrode and 3.8 lbf/inch over the capacitor dielectric. The average water uptake as determined by the film moisture absorption test was 0.23% under 85/85 conditions.
Fired-on-foil capacitors were fabricated for use as a test structure using the following process. As shown in
As shown in
As shown in
The first dielectric layer, the second dielectric layer, and the copper paste electrode were then co-fired at 930° C. under copper thick-film firing conditions.
The encapsulant composition as described in Example 6 was double-printed through a 325 mesh screen over capacitors to form encapsulant layer 240 using the pattern as shown in
showing that the adhesion over the capacitor and to the prepreg was quite acceptable over a range of heating conditions.
