Organometallic composition

Abstract

Compositions including germanium compounds suitable for use as vapor phase deposition precursors for germanium-containing films are provided. Methods of depositing films containing germanium using such compositions are also provided. Such germanium-containing films are particularly useful in the manufacture of electronic devices.

Description

Claims

1. A method of depositing a film comprising germanium on a substrate comprising the steps of: a) conveying in a gaseous phase a germanium compound and an additive compound selected from the group consisting of a gas phase modifier and a surface modifier, wherein the germanium compound has the formula GeA4 wherein each A is independently chosen from hydrogen, halogen, alkyl, alkenyl, alkynyl, aryl, amino, dialkylamino, and dialkylaminoalkyl, to a deposition chamber containing the substrate, wherein the additive compound does not comprise germanium, wherein the additive compound is selected from the group consisting of tin compounds, Group IA compounds, Group IIA compounds, aluminum compounds, indium compounds, gallium compounds, Group VA compounds, Group IB compounds, Group IVB compounds, Group VB compounds, Group VIB compounds, Group VIIB compounds, Group VIII compounds, lead compounds, and hydrogen halides, and wherein the additive compound is present in the gaseous phase in an amount of up to 0.25 mole% based on the moles of the germanium compound in the gaseous phase:b) decomposing the germanium compound in the deposition chamber; andc) depositing the film comprising germanium on the substrate.

2. The method of claim 1 wherein germanium compound and additive compound are provided from a single vapor delivery device.

3. The method of claim 1 wherein the germanium compound is provided from a first vapor delivery device and the additive compound is provided from a second vapor delivery device.

4. The method of claim 1 wherein the germanium compound is a halogermane.

5-6. (canceled)

7. A vapor delivery device comprising a vessel having an elongated cylindrical shaped portion having an inner surface, a top closure portion and a bottom closure portion, the top closure portion having an inlet opening for the introduction of a carrier gas and an outlet opening, the elongated cylindrical shaped portion having a chamber containing a germanium compound and an additive compound selected from the group consisting of a gas phase modifier and a surface modifier; the inlet opening being in fluid communication with the chamber and the chamber being in fluid communication with the outlet opening; wherein the germanium compound has the formula GeA4 wherein each A is independently selected from the group consisting of hydrogen, halogen, alkyl, alkenyl, alkynyl, aryl, amino, dialkylamino, and dialkylaminoalkyl, and wherein the additive compound does not comprise germanium, and wherein the additive compound is selected from the group consisting of Group IA compounds, Group IIA compounds, aluminum compounds, indium compounds, gallium compounds, Group VA compounds, Group IB compounds, Group IVB compounds, Group VB compounds, Group VIB compounds, Group VIIB compounds, tin compounds, lead compounds, and hydrogen halides.

8. (canceled)

9. An apparatus for chemical vapor deposition of metal films comprising the vapor delivery device of claim 7.

10. (canceled)

11. The method of claim 1 wherein the film is a germanium-containing layer of the formula MxGey, wherein M is a metal or metalloid, x=0.5-0.99, y=0.01-0.5, x+y=1, wherein the layer has a short range average surface roughness of less than 1 nm, and a long range average surface roughness of less than 5 nm, and wherein M is not germanium.

12. The method of claim 11 wherein y=0.2 and wherein the germanium containing layer has a threading dislocation density of less than 4×104 cm−2.

13. The method of claim 12 wherein the threading dislocation density is less than 1×104 cm−2.

14. The method of claim 11 wherein M is silicon.

15. The method of claim 1 wherein the additive compound is selected from the group consisting of aluminum compounds, indium compounds, gallium compounds, tin compounds, tungsten compounds, titanium compounds, molybdenum compounds, arsenic compounds, phosphorus compounds, antimony compounds and bismuth compounds.

16. The method of claim 1 wherein the additive is present in the gaseous phase in an amount of 0.01-0.25 mole%.