Pattern matching method and pattern matching program

Abstract
It is an object of the invention to provide a suitable method for identifying depression/protrusion information in a design data; and a program and an apparatus for the same; for example, even in the case that similar portions are arranged, to provide a method for enabling a pattern matching with high precision between the design data and an image obtained by an image formation apparatus or the like; and a program and an apparatus for the same. To attain the above object, a pattern matching method, wherein, using information concerning a depression and/or a protrusion of the pattern on the design data, or a pattern portion and/or a non-pattern portion on the design data, pattern matching is executed between the pattern on the design data and the pattern on said image; and a program for the same are provided.
Description

BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a drawing for explaining an outline of a scanning electron microscope.



FIG. 2 is a flowchart for explaining a pattern matching processing between a design data utilizing depression/protrusion information of a pattern, and an image obtained by imaging using a scanning electron microscope, according to one embodiment of the invention.



FIGS. 3A, 3B, 3C, 3D and 3E are drawings for explaining a method for adding depression/protrusion information to a pattern, according to one embodiment of the invention.



FIGS. 4A and 4B are drawings for explaining a technique for center point matching between a pattern prepared from a design data, and a depression, or a protrusion of an image pattern obtained by imaging using a scanning electron microscope, according to one embodiment of the invention.



FIG. 5 is a drawing for explaining a pattern shape comparison for verifying a pattern matching result, according to one embodiment of the invention.



FIGS. 6A, 6B, 6C and 6D are drawings for explaining a pattern matching method utilizing depression/protrusion determination in a striking pattern and a hole pattern, according to one embodiment of the invention.



FIG. 7 is a drawing for explaining an embodiment to cut out a part of a design data of a complicated shape, as a matching pattern.



FIG. 8 is a drawing for explaining an embodiment to display together a design data with low magnification, and a design data with high magnification.


Claims
  • 1. A pattern matching method for executing matching between a pattern on a design data, and a pattern on an image obtained by an image formation apparatus, wherein, using information concerning a depression and/or a protrusion of the pattern on said design data, or a pattern portion and/or a non-pattern portion on said design data, pattern matching is executed between the pattern on the design data, and the pattern on said image.
  • 2. The pattern matching method according to claim 1, wherein the information concerning the depression and/or the protrusion of the pattern on said design data, or the pattern portion and/or the non-pattern portion on said design data is information concerning a direction of lines of said design data.
  • 3. The pattern matching method according to claim 2, wherein, based on the information concerning direction of at least two lines of said design data, whether or not a region defined by the two lines is the depression or the non-pattern portion, or the protrusion or the pattern portion is determined.
  • 4. A computer program product which makes a computer function, so as to execute matching between a pattern on a design data, and a pattern on an image obtained by an image formation apparatus, wherein, using information concerning a depression and/or a protrusion, or a pattern portion and/or a non-pattern portion on said design data, pattern matching is executed between the pattern on the design data, and the pattern on said image.
  • 5. The computer program product according to claim 4, wherein the information concerning the depression and/or the protrusion of the pattern on said design data, or the pattern portion and/or the non-pattern portion on said design data, is information concerning a direction of lines of said design data.
  • 6. The computer program product according to claim 5, wherein, based on the information concerning direction of at least two lines of said design data, whether or not a region defined by the two lines is the depression or the non-pattern portion, or the protrusion or the pattern portion, is determined.
Priority Claims (1)
Number Date Country Kind
2006-077955 Mar 2006 JP national