Claims
- 1. An apparatus for clamping a substrate, comprising:a substrate support; a clamp coupled to said substrate support, said clamp configured for moving between a first inactive position, and a second active position, where a substrate is secured to said substrate support; a corrugated shaped seal positioned around a periphery of said substrate support, said seal configured to provide a seal between the substrate support and the substrate, said seal having: a first arm member in communication with said base portion; a first “U” shaped groove intermediate said first arm member and said base portion; a second arm member in communication with said first arm member, said first arm extends inward beyond said second arm; and a second “U” shaped groove intermediate said first arm member and said second arm member, said first “U” shaped groove and said second “U” shaped groove defining said corrugated shape in said seal.
- 2. The apparatus of claim 1, wherein said second arm member includes at least one protrusion.
- 3. The apparatus of claim 1, wherein said protrusion includes at least one edge, said at least one edge in a rounded shape.
- 4. The apparatus of claim 1, wherein said clamp is a mechanical clamp.
- 5. The apparatus of claim 1, wherein said clamp is an electrostatic clamp.
- 6. An apparatus for clamping a substrate within a processing chamber comprising:a clamp configured for holding the substrate to an upper surface of a chuck; a substrate release; and a corrugated shaped seal for sealing the substrate with respect to the chuck, said seal configured for extending around a periphery of the chuck, said seal having: a first arm member in communication with said base portion; a first “U” shaped groove intermediate said first arm member and said base portion; a second arm member in communication with said first arm member, said first arm extends inward beyond said second arm; and a second “U” shaped groove intermediate said first arm member and said second arm member, said first “U” shared groove and said second “U” shaped groove defining said corrugated shape in said seal.
- 7. The apparatus of claim 6, wherein said second arm member includes at least one protrusion.
- 8. The apparatus of claim 7, wherein said protrusion includes at least one edge, said at least one edge in a rounded shape.
- 9. The apparatus of claim 6, wherein said clamp is a mechanical clamp and said chuck is a mechanical chuck.
- 10. The apparatus of claim 6, wherein said clamp is an electrostatic clamp and said chuck is an electrostatic chuck.
- 11. The apparatus of claim 6, wherein said substrate release include lift pins.
CROSS REFERENCES TO RELATED APPLICATIONS
This application claims priority from and is related to commonly owned U.S. Provisional Patent Application Serial No. 60/308,734, filed Jul. 30, 2001, entitled: Perimeter Seal For Backside Cooling Of Substrates, this Provisional Patent Application incorporated by reference herein.
US Referenced Citations (27)
Foreign Referenced Citations (1)
Number |
Date |
Country |
4101441 |
Apr 1992 |
JP |
Non-Patent Literature Citations (2)
Entry |
“Flared Washed Vacuum Pedestal”, IBM Technical Disclosure Bulletin, Oct. 1972, p. 1621. |
“Contamination Free Wafer Transfer Mechanism”, IBM Technical Disclosure Bulletin, Nov. 1977, p. 2202-2203. |
Provisional Applications (1)
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Number |
Date |
Country |
|
60/308734 |
Jul 2001 |
US |